KR950020964A - 웨이퍼를 부착판에 부착하는 방법 - Google Patents

웨이퍼를 부착판에 부착하는 방법 Download PDF

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Publication number
KR950020964A
KR950020964A KR1019940034121A KR19940034121A KR950020964A KR 950020964 A KR950020964 A KR 950020964A KR 1019940034121 A KR1019940034121 A KR 1019940034121A KR 19940034121 A KR19940034121 A KR 19940034121A KR 950020964 A KR950020964 A KR 950020964A
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KR
South Korea
Prior art keywords
wafer
attachment plate
vacuum
degree
chuck
Prior art date
Application number
KR1019940034121A
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English (en)
Other versions
KR100198967B1 (ko
Inventor
키미와카 오오이주미
코오이치 타나카
Original Assignee
엔야 료오조오
가부시키가이샤 엔야시스템
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Application filed by 엔야 료오조오, 가부시키가이샤 엔야시스템 filed Critical 엔야 료오조오
Publication of KR950020964A publication Critical patent/KR950020964A/ko
Application granted granted Critical
Publication of KR100198967B1 publication Critical patent/KR100198967B1/ko

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25BTOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005Vacuum work holders
    • B25B11/007Vacuum work holders portable, e.g. handheld

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)

Abstract

반도체 웨이퍼(2)의 표면을 평활하게 연마하기 위하여 그 웨이퍼(2)를 연마기의 부착판(5)에 부착하는 방법이다. 하면에 접착제(10)가 칠해진 웨이퍼(2)를 진공척(3)에 흡착 유지시킨다. 그 다음, 그 웨이퍼(2)를 둘러 싸도록 설치된 후드(4)의 하단을 상기한 부착판(5)에 맞닿음시키고, 그 웨이퍼(2)의 주위에 밀봉된 공간을 형성한다. 그리고, 이 공간부(6)를 상기한 진공척(3)의 진공도보다도 높은 진공도에 의해 흡인한다. 상기한 진공척(3)의 진공도를 넘어서는 시점에서 그 척(3)으로부터 낙하해서 부착판(5)에 점착한다. 이렇게 함으로써, 상기한 웨이퍼 (2)와 부착판(5) 사이에 기포를 포함시키지 않고 그 웨이퍼(2)를 부착판(5)에 부착할 수가 있다.

Description

웨이퍼를 부착판에 부착하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명을 적용한 웨이퍼 부착장치의 한가지 실시예를 표시한 단면도.

Claims (3)

  1. 하면에 접착제(10)가 칠해진 웨이퍼(2)를 진공작용에 의해 진공척(3)에 유지시키기고, 그 웨이퍼(2)의 주위에 밀봉된 공간부(6)가 형성되도록 그 웨이퍼(2)를 둘러 싸는 후드(4)를 부착판(5)에 맞닿음시키는 동시에 상기한 웨이퍼(2)의 하면을 그 부착판(5)에 근접시키고, 상기한 공간부(6)를 상기한 진공척(3)의 진공작용보다도 높은 진공도에 의해 흡인하여, 상기한 진공도의 차에 의해 상기한 웨이퍼(2)를 상기한 진공척(3)으로부터 낙하시켜서, 상기한 부착판(5)에 부착하는 것을 특징으로 하는 웨이퍼(2)를 부착판(5)에 부착하는 방법.
  2. 제1항에 있어서, 상기한 공간부(6)의 진공도는 상기한 진공척(3)의 진공도보다 90∼160mmHg 높은 것을 특징으로 하는 웨이퍼 부착방법.
  3. 제1항에 있어서, 상기한 웨이퍼(2)는 부착판(5)의 상면으로부터 0.2∼3mm 떨어진 높이로부터 그 부착판(5)위에 낙하하는 것을 특징으로 하는 웨이퍼 부착방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940034121A 1993-12-21 1994-12-14 웨이퍼를 부착판에 부착하는 방법 KR100198967B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP34466993A JP2534196B2 (ja) 1993-12-21 1993-12-21 ウエ−ハ貼付方法
JP93-344669 1993-12-21

Publications (2)

Publication Number Publication Date
KR950020964A true KR950020964A (ko) 1995-07-26
KR100198967B1 KR100198967B1 (ko) 1999-06-15

Family

ID=18371068

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940034121A KR100198967B1 (ko) 1993-12-21 1994-12-14 웨이퍼를 부착판에 부착하는 방법

Country Status (6)

Country Link
US (1) US5602058A (ko)
EP (1) EP0660377B1 (ko)
JP (1) JP2534196B2 (ko)
KR (1) KR100198967B1 (ko)
DE (1) DE69405369T2 (ko)
TW (1) TW289842B (ko)

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US6746565B1 (en) * 1995-08-17 2004-06-08 Semitool, Inc. Semiconductor processor with wafer face protection
DE19616073A1 (de) * 1996-04-23 1997-10-30 Teves Gmbh Alfred Vorrichtung zum blasenfreien Fixieren von zu klebenden Komponenten
US6080050A (en) 1997-12-31 2000-06-27 Applied Materials, Inc. Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
US5993302A (en) * 1997-12-31 1999-11-30 Applied Materials, Inc. Carrier head with a removable retaining ring for a chemical mechanical polishing apparatus
DE19806306A1 (de) * 1998-02-16 1999-09-09 Siemens Ag Vorrichtung zum berührungslosen Greifen und Halten eines Gegenstandes und Anwendungen der Vorrichtung
US5985094A (en) * 1998-05-12 1999-11-16 Speedfam-Ipec Corporation Semiconductor wafer carrier
US6106379A (en) * 1998-05-12 2000-08-22 Speedfam-Ipec Corporation Semiconductor wafer carrier with automatic ring extension
DE19929617A1 (de) * 1999-06-28 2001-01-25 Siemens Ag Vorrichtung und Verfahren zum Haltern eines Werkstücks sowie Anwendung des Verfahrens
DE19961106C2 (de) * 1999-12-17 2003-01-30 Siemens Ag Haltevorrichtung zum mechanischen Bearbeiten einer ebenen Platte, Verwendung der Haltevorrichtung und ebene Platte
DE10209615A1 (de) * 2002-03-05 2003-09-18 Bosch Gmbh Robert Vorrichtung und Verfahren zur Fixierung eines Sensormittels
DE10242402A1 (de) * 2002-09-12 2004-04-01 Süss MicroTec Laboratory Equipment GmbH Vorrichtung und Verfahren für das Verbinden von Objekten
KR100652416B1 (ko) * 2005-07-07 2006-12-01 삼성전자주식회사 멀티-스택 집적회로 패키지를 테스트하는 장치 및 방법
JP5074125B2 (ja) * 2007-08-09 2012-11-14 リンテック株式会社 固定治具並びにワークの処理方法
DE102007042694A1 (de) * 2007-09-07 2009-03-12 Magna Electronics Europe Gmbh & Co.Kg Sensormodul
KR20210022403A (ko) * 2019-08-20 2021-03-03 삼성전자주식회사 기판 본딩 장치 및 이를 이용한 반도체 소자 제조 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0725463B2 (ja) * 1986-07-02 1995-03-22 富士通株式会社 半導体装置の製造方法
DE3670178D1 (de) * 1986-08-13 1990-05-10 Toshiba Kawasaki Kk Apparat zum zusammenfuegen von halbleiterscheiben.
JPS63198351A (ja) * 1987-02-13 1988-08-17 Mitsubishi Electric Corp 半導体ウエハ貼付け方法
ES2043970T3 (es) * 1988-07-15 1994-01-01 Balzers Hochvakuum Dispositivo de fijacion para un disco, asi como su aplicacion.
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US5303938A (en) * 1993-03-25 1994-04-19 Miller Donald C Kelvin chuck apparatus and method of manufacture
US5410791A (en) * 1993-07-01 1995-05-02 General Electric Company Fabrication chuck

Also Published As

Publication number Publication date
TW289842B (ko) 1996-11-01
JPH07183261A (ja) 1995-07-21
DE69405369T2 (de) 1998-04-02
US5602058A (en) 1997-02-11
JP2534196B2 (ja) 1996-09-11
KR100198967B1 (ko) 1999-06-15
DE69405369D1 (de) 1997-10-09
EP0660377B1 (en) 1997-09-03
EP0660377A1 (en) 1995-06-28

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