KR910005382A - 반도체기판의 접착방법 및 접착장치 - Google Patents

반도체기판의 접착방법 및 접착장치 Download PDF

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Publication number
KR910005382A
KR910005382A KR1019900013287A KR900013287A KR910005382A KR 910005382 A KR910005382 A KR 910005382A KR 1019900013287 A KR1019900013287 A KR 1019900013287A KR 900013287 A KR900013287 A KR 900013287A KR 910005382 A KR910005382 A KR 910005382A
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South Korea
Prior art keywords
semiconductor substrate
mirror
semiconductor
holding
bonding
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KR1019900013287A
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English (en)
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KR940009993B1 (en
Inventor
다다히데 호시
기요시 요시카와
Original Assignee
아오이 죠이치
가부시키가이샤 도시바
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Publication of KR910005382A publication Critical patent/KR910005382A/ko
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Publication of KR940009993B1 publication Critical patent/KR940009993B1/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/012Bonding, e.g. electrostatic for strain gauges

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

내용 없음

Description

반도체기판의 접착방법 및 접착장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도는 본 발명의 실시예에 따른 반도체기판 접착용 장치의 개략을 나타낸 단면도.

Claims (2)

  1. 경면연마된 2장의 반도체기판(23,23,25)을 청정한 대기중에서 접착시키는데 있어서, 적어도 한쪽 반도체기판의 경면 연마면을 휘어지게 해서 중앙부분에 형성한 볼록한 부분과 다른쪽 반도체기판의 경면연마면의 중앙부분을 접촉시킨후에 양반도체기판을 둘러싼 대기를 감압상태로 하는 것을 특징으로 하는 반도체기판의 접착방법.
  2. 대기중에 배치된 반도체기판(23)의 경면연마면을 휘어지게 해서 중앙부분이 볼록한 상태로 되도록 유지하는 제1유지기구(27,41)와 다른쪽 반도체기판(24,25)을 유지하는 제2유지기구(27,41), 볼록한 상태로 변형시킨 반도체기판의 경면연마면의 중앙부분에 다른 반도체기판의 경면연마면의 중앙부분을 접촉시키는 기구, 제1 및 제2 유지기구(26 및 24,25)에 부착되어 일정한 분위기를 형성하는 덮개부(38,39), 이 덮개부(38,39)에 설치된 배기구멍(32,33) 및 이 배기구멍(32,33)에 연결된 감압기구가 구비된 것을 특징으로 하는 반도체 기판의 접착장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR90013287A 1989-08-28 1990-08-28 Method and apparatus for bonding semiconductor substrates KR940009993B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1221337A JPH0744135B2 (ja) 1989-08-28 1989-08-28 半導体基板の接着方法及び接着装置
JP1-221337 1989-08-28

Publications (2)

Publication Number Publication Date
KR910005382A true KR910005382A (ko) 1991-03-30
KR940009993B1 KR940009993B1 (en) 1994-10-19

Family

ID=16765225

Family Applications (1)

Application Number Title Priority Date Filing Date
KR90013287A KR940009993B1 (en) 1989-08-28 1990-08-28 Method and apparatus for bonding semiconductor substrates

Country Status (5)

Country Link
US (1) US5129827A (ko)
EP (1) EP0415340B1 (ko)
JP (1) JPH0744135B2 (ko)
KR (1) KR940009993B1 (ko)
DE (1) DE69015511T2 (ko)

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Also Published As

Publication number Publication date
DE69015511T2 (de) 1995-05-24
JPH0384919A (ja) 1991-04-10
KR940009993B1 (en) 1994-10-19
DE69015511D1 (de) 1995-02-09
US5129827A (en) 1992-07-14
EP0415340A1 (en) 1991-03-06
EP0415340B1 (en) 1994-12-28
JPH0744135B2 (ja) 1995-05-15

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