KR930006956A - 125 킬로 헤르쯔 이상에서의 초음파 본딩 방법 - Google Patents
125 킬로 헤르쯔 이상에서의 초음파 본딩 방법 Download PDFInfo
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- KR930006956A KR930006956A KR1019920017767A KR920017767A KR930006956A KR 930006956 A KR930006956 A KR 930006956A KR 1019920017767 A KR1019920017767 A KR 1019920017767A KR 920017767 A KR920017767 A KR 920017767A KR 930006956 A KR930006956 A KR 930006956A
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- bond
- ultrasonic energy
- khz
- bonding
- transducer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/10—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating making use of vibrations, e.g. ultrasonic welding
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- H01L2924/20309—Ultrasonic frequency [f] f>=200 KHz
Abstract
도선(12)를 집적 회로(14)의 결합 위치(28)에 본딩하기 위한 장치(10) 및 방법이 제공된다. 양호한 실시예에 있어서는 도선(12)가 알루미늄 결합 패드(28)에 결합된다. 장치(10)은 약 125KHz이상의 주파수에서 초음파 에너지를 제공하도록 설계된 고주파 초음파 에너지원을 포함한다. 초음파 에너지는 트랜스듀서(18) 및 캐필러리(16)을 경유하여 본딩 경계면(32)에 인가된다. 고주파 초음파 에너지의 파장이 경계면(32)에 인가될 때 그 파복점(antinodal point)에 있게 되어 최적화 되도록, 트랜스듀서는 길이가 변경되고 공구 접속점(40)은 트랜스듀서(18)상에 놓인다. 본 공정의 양호한 실시예에 있어서의 초음파 에너지는 주변 온도에서 약 350KHz로 인가된다.
이러한 형태로 결합 단부(30) 및 결합패드(28) 사이에 형성된 결합은 인장 강도, 결합시간 및 공정 온도의 측면에서 최적화된다.
종래의 기술에서 금속간 결합 및 결합 강도의 측면에서 특히 곤란한 점이었던, 알루미늄과 2% 구리 등과 같은 알루미늄 합금 결합 패드에 관련하여 특히 유익한 결과가 발견된다. 따라서, 본 발명에 따르면 상술한 범위에서 고주파 초음파를 사용할 경우, 큰 공정 파라미터의 유연성을 가진 탁월한 강도의 결합이 형성된다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 마이크로 전자 집적 회로에 도선을 볼-본딩 하기 위해 사용되는 본딩 장치를 도시한 블록도 또는 개략도, 제2도는 본딩 장치에 사용되는 트랜스듀서의 부분 정면도, 제3도 내지 제3C도는 본딩이 이루어지는 경계면에서의 다양한 금속한 결합의 단계를 도시한 단면도, 제4도는 300℃에서 금 도선을 순수 알루미늄에 본딩할 때의 초음파 주파수와 결합 시간 사이의 관계를 도시한 그래프.
Claims (8)
- (a) 도전성 결합 위치를 제공하는 단계, (b) 결합 단부를 갖고 있는 도선을 제공하는 단계, (c) 상기 도선의 결합 단부 및 결합 위치 사이에 경계면이 생기도록 상기 결합 단부를 상기 결합 위치에 접촉시키는 단계 및 (d) 약 125KHz 이상의 주파수에서 상기 경계면에 초음파 에너지를 인가하는 단계를 포함하는 것을 특징으로 하는 마이크로 전자적 결합 형성 방법.
- 제1항에 있어서, 단계 (d)가 주변 온도에서 수행되는 것을 특징으로 하는 방법.
- 제1항에 있어서, 단계 (d)가 약 37℃에서 수행되는 것을 특징으로 하는 방법.
- 제1항에 있어서, 단계 (d)가 약 200℃이하에서 수행되는 것을 특징으로 하는 방법.
- 제1항에 있어서, 단계 (d)가 약125KHz에서 약 2MHz주파수 범위에서 수행되는 것을 특징으로 하는 방법.
- 제1항에 있어서, 단계 (d)가 약 350KHz의 주파수 및 27℃에서 수행되는 것을 특징으로 하는 방법.
- 제1항에 있어서, 단계 (d)가 0.58 밀리초 동안 수행되는 것을 특징으로 하는 방법.
- 제1항의 공정에 의해 형성된 마이크로 전자적 결합을 갖고 있는 집적 회로 디바이스.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/767,740 US5244140A (en) | 1991-09-30 | 1991-09-30 | Ultrasonic bonding process beyond 125 khz |
US767,740 | 1996-12-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR930006956A true KR930006956A (ko) | 1993-04-22 |
Family
ID=25080418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920017767A KR930006956A (ko) | 1991-09-30 | 1992-09-29 | 125 킬로 헤르쯔 이상에서의 초음파 본딩 방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5244140A (ko) |
EP (1) | EP0535433A3 (ko) |
JP (1) | JPH06204298A (ko) |
KR (1) | KR930006956A (ko) |
MY (1) | MY129925A (ko) |
TW (1) | TW222362B (ko) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2527399B2 (ja) * | 1992-09-29 | 1996-08-21 | 完テクノソニックス株式会社 | ワイヤ―・ボンダ―・システム |
US5816476A (en) * | 1994-08-24 | 1998-10-06 | Verity Instruments Inc. | Dual frequency power supply and transducer |
US5660319A (en) * | 1995-01-17 | 1997-08-26 | Texas Instruments Incorporated | Ultrasonic bonding process |
US5614113A (en) * | 1995-05-05 | 1997-03-25 | Texas Instruments Incorporated | Method and apparatus for performing microelectronic bonding using a laser |
CN1119768C (zh) | 1996-02-12 | 2003-08-27 | 大卫·芬恩 | 与导线接触用的方法和设备 |
DE69739065D1 (de) * | 1996-02-26 | 2008-12-11 | Texas Instruments Inc | Verbindungen in integrierten Schaltungen |
US5894983A (en) * | 1997-01-09 | 1999-04-20 | Harris Corporation | High frequency, low temperature thermosonic ribbon bonding process for system-level applications |
US5938105A (en) * | 1997-01-15 | 1999-08-17 | National Semiconductor Corporation | Encapsulated ball bonding apparatus and method |
US6065667A (en) * | 1997-01-15 | 2000-05-23 | National Semiconductor Corporation | Method and apparatus for fine pitch wire bonding |
US6213378B1 (en) * | 1997-01-15 | 2001-04-10 | National Semiconductor Corporation | Method and apparatus for ultra-fine pitch wire bonding |
US6180891B1 (en) | 1997-02-26 | 2001-01-30 | International Business Machines Corporation | Control of size and heat affected zone for fine pitch wire bonding |
JP3215084B2 (ja) * | 1998-04-28 | 2001-10-02 | 株式会社アルテクス | 超音波振動接合用共振器 |
US6135341A (en) * | 1998-05-27 | 2000-10-24 | Texas Instruments Incorporated | Room temperature gold wire wedge bonding process |
US6534327B2 (en) | 2000-04-13 | 2003-03-18 | Texas Instruments Incorporated | Method for reworking metal layers on integrated circuit bond pads |
US6936951B1 (en) | 2000-11-27 | 2005-08-30 | Grq Instruments, Inc. | Smart sonic bearings and method for frictional force reduction and switching |
JP3681676B2 (ja) * | 2001-11-16 | 2005-08-10 | 松下電器産業株式会社 | バンプボンディング方法及び装置 |
JP3943416B2 (ja) * | 2002-03-07 | 2007-07-11 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
JP4562118B2 (ja) * | 2003-12-19 | 2010-10-13 | 日東電工株式会社 | 半導体装置の製造方法 |
US20090001611A1 (en) | 2006-09-08 | 2009-01-01 | Takeshi Matsumura | Adhesive sheet for manufacturing semiconductor device, manufacturing method of semiconductor device using the sheet, and semiconductor device obtained by the method |
IL184260A0 (en) | 2007-06-27 | 2008-03-20 | On Track Innovations Ltd | Mobile telecommunications device having sim/antenna coil interface |
US8028923B2 (en) | 2007-11-14 | 2011-10-04 | Smartrac Ip B.V. | Electronic inlay structure and method of manufacture thereof |
JP6002437B2 (ja) * | 2012-05-17 | 2016-10-05 | 新日本無線株式会社 | 半導体装置及びその製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3054309A (en) * | 1959-02-20 | 1962-09-18 | Aeroprojects Inc | Vibratory device |
US3776447A (en) * | 1969-06-30 | 1973-12-04 | Texas Instruments Inc | Automatic semiconductor bonding machine |
US3641660A (en) * | 1969-06-30 | 1972-02-15 | Texas Instruments Inc | The method of ball bonding with an automatic semiconductor bonding machine |
US4415115A (en) * | 1981-06-08 | 1983-11-15 | Motorola, Inc. | Bonding means and method |
DE3701652A1 (de) * | 1987-01-21 | 1988-08-04 | Siemens Ag | Ueberwachung von bondparametern waehrend des bondvorganges |
US4889274A (en) * | 1988-03-22 | 1989-12-26 | Texas Instruments Incorporated | Gas mixture for use in control and formation of ball bonds |
US4842662A (en) * | 1988-06-01 | 1989-06-27 | Hewlett-Packard Company | Process for bonding integrated circuit components |
JPH02101754A (ja) * | 1988-10-11 | 1990-04-13 | Hitachi Ltd | ボンディング方法及びボンディング装置 |
-
1991
- 1991-09-30 US US07/767,740 patent/US5244140A/en not_active Expired - Lifetime
-
1992
- 1992-09-02 MY MYPI92001565A patent/MY129925A/en unknown
- 1992-09-14 EP EP19920115678 patent/EP0535433A3/en not_active Withdrawn
- 1992-09-29 KR KR1019920017767A patent/KR930006956A/ko not_active Application Discontinuation
- 1992-09-30 JP JP4262341A patent/JPH06204298A/ja active Pending
-
1993
- 1993-02-18 TW TW082101119A patent/TW222362B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP0535433A3 (en) | 1993-06-30 |
US5244140A (en) | 1993-09-14 |
EP0535433A2 (en) | 1993-04-07 |
JPH06204298A (ja) | 1994-07-22 |
TW222362B (ko) | 1994-04-11 |
MY129925A (en) | 2007-05-31 |
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