KR920021736A - 화학증착에 의한 제품의 개선된 제조방법 및 그 방법에 사용되는 지지 맨드렐 - Google Patents

화학증착에 의한 제품의 개선된 제조방법 및 그 방법에 사용되는 지지 맨드렐 Download PDF

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Publication number
KR920021736A
KR920021736A KR1019920007371A KR920007371A KR920021736A KR 920021736 A KR920021736 A KR 920021736A KR 1019920007371 A KR1019920007371 A KR 1019920007371A KR 920007371 A KR920007371 A KR 920007371A KR 920021736 A KR920021736 A KR 920021736A
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South Korea
Prior art keywords
substrate
mixture
product
components
vapor deposition
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KR1019920007371A
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English (en)
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리챠드 안토니 토마스
헬무트 에팅거 로버트
플튼 플레이셔 제임스
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제이 엘. 채스킨
제네랄 일렉트릭 캄파니
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Publication of KR920021736A publication Critical patent/KR920021736A/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/12—Gaseous compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

내용 없음.

Description

화학증착에 의한 제품의 개선된 제조방법 및 그 방법에 사용되는 지지 맨드렐
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 제1도의 종래 기술에 사용된 맨드렐의 2-2선 단면도이며,
제3도는 본 발명의 바람직한 실시태양의 단면도이고,
제4도는 제3도의 바람직한 실시태양의 4-4선 단면도이다.

Claims (10)

  1. 내표면 및 외표면을 갖는 중공 구조를 포함하며, 그 표면상에서 화학증착 공정에 의해 제품을 생산하는데 사용되는 개선된 지지부재.
  2. 제1항에 있어서, 그의 내표면이 매끄러운 튜브이거나, 내표면이 톱니 형상 또는 다각형 형상을 가진 개선된 지지부재.
  3. 제1항에 있어서, 상기 부재가 몰리브덴으로 제조된 개선된 지지부재.
  4. 수소 및 탄소 화합물의 개스상 혼합물을 CVD 반응 챔버내로 이송하고, 상기 혼합물에 에너지를 가하여 활성화시켜 성분들을 분해시키고, 상기 분해된 성분들을 내표면 및 제품의 형상과 거의 유사한 형상의 외표면을 가진 열안정성 중공 기재의 표면상에 증착시키고, 상기 성분들은 상기 표면상에서 응축시키고, 표면상에 제품이 형성된 상기 기재를 에칭욕내에 위치시키고, 상기 에칭욕을 교반하여 기재의 내표면을 따라 가재를 에칭시켜 제품을 제조함을 포함하는, 화학증착에 의한 제품의 개선된 제조방법.
  5. 제4항에 있어서, 상기 개스상 혼합물을 불활성 개스로 희석시킴을 또한 포함하는 방법.
  6. 제4항에 있어서, 상기 혼합물을 상기 성분들로 열분해시키기에 충분간 온도로 가열된 비반응성 필라멘트상으로 상기 혼합물을 통과시킴으로써 상기 혼합물에 에너지를 가하여 활성화시키는 방법.
  7. 제4항에 있어서, 상기 성분들을 상기 기재상에 증착시키는 동안 상기 기재를 지지시켜 상기 기재의 변형을 방지함을 또한 포함하는 방법.
  8. 제7항에 있어서, 상기 기재가 그를 관통하는 봉에 의해 지지된 몰리브덴 튜브인 방법.
  9. 제4항에 있어서, 상기 내표면을 따라 기포를 퍼콜레이팅하여 상기 에칭액이 상기 내표면을 따라 대류되도록 하기 위하여 상기 제품을 상기 애칭욕내에 수직으로 침지시키는 방법.
  10. 제4항에 있어서, 상기 에칭욕을 초음파 교반하여 상기 기재의 상기 내표면을 따라 형성된 기포를 제거하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920007371A 1991-05-01 1992-04-30 화학증착에 의한 제품의 개선된 제조방법 및 그 방법에 사용되는 지지 맨드렐 KR920021736A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69417091A 1991-05-01 1991-05-01
US694,170 1991-05-01

Publications (1)

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KR920021736A true KR920021736A (ko) 1992-12-18

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Country Status (9)

Country Link
US (1) US5869133A (ko)
EP (1) EP0511874B1 (ko)
JP (1) JPH05117854A (ko)
KR (1) KR920021736A (ko)
CA (1) CA2065724A1 (ko)
DE (1) DE69208509D1 (ko)
ES (1) ES2084280T3 (ko)
IE (1) IE921371A1 (ko)
ZA (1) ZA922837B (ko)

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Also Published As

Publication number Publication date
US5869133A (en) 1999-02-09
CA2065724A1 (en) 1992-11-02
ZA922837B (en) 1993-04-28
DE69208509D1 (de) 1996-04-04
IE921371A1 (en) 1992-11-04
ES2084280T3 (es) 1996-05-01
JPH05117854A (ja) 1993-05-14
EP0511874B1 (en) 1996-02-28
EP0511874A1 (en) 1992-11-04

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