KR930019858A - 화학증착법에 의한 제품의 제조방법 및 그 제품 - Google Patents

화학증착법에 의한 제품의 제조방법 및 그 제품 Download PDF

Info

Publication number
KR930019858A
KR930019858A KR1019930003126A KR930003126A KR930019858A KR 930019858 A KR930019858 A KR 930019858A KR 1019930003126 A KR1019930003126 A KR 1019930003126A KR 930003126 A KR930003126 A KR 930003126A KR 930019858 A KR930019858 A KR 930019858A
Authority
KR
South Korea
Prior art keywords
support member
product
substrate
insert
depositing
Prior art date
Application number
KR1019930003126A
Other languages
English (en)
Inventor
리챠드 안토니 토마스
풀턴 플레이셔 제임스
Original Assignee
아더 엠 킹
제네랄 일렉트릭 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아더 엠 킹, 제네랄 일렉트릭 캄파니 filed Critical 아더 엠 킹
Publication of KR930019858A publication Critical patent/KR930019858A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49428—Gas and water specific plumbing component making
    • Y10T29/49432—Nozzle making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4981—Utilizing transitory attached element or associated separate material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4998—Combined manufacture including applying or shaping of fluent material
    • Y10T29/49982—Coating
    • Y10T29/49984—Coating and casting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12229—Intermediate article [e.g., blank, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Looms (AREA)

Abstract

본 발명은 화학증착법에 의한 개선된 제품 제조방법과, 그 방법으로부터 제조된 제품에 관한 것으로서, 이 방법은 적당한 기재상에 적당한 형상부를 가공하는 단계와, 상기 형상부내에 삽입물을 배치하는 단계와, 상기 형상부와 상기 삽입물상에 지지부재 재료를 증착하여 지지부재를 형형하는 단계와, 상기 기재에서 상기 지지부재를 분리하는 단계와, 상기 지지부재상에 제품의 재료를 화학적으로 증착하는 단계와, 상기 지지부재를 에칭하여 깔때기 형상의 다이아몬드 물-분사 몬합관과 같은 자립식 제품을 형성하는 단계를 포함한다.

Description

화학증착법에 의한 제품의 제조방법 및 그 제품.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1a도는 및 제1b도는 바람직한 실시예의 가공단계중의 기재의 단면도.
제c도는 기재의 가공된 표면을 따라 삽입물을 배치하는 동안의 기재의단면도.
제1d도는 기재의 가공된 표면과 삽입물상에 지재부재의 화학중착 단계를 완료한 기재의 단면도.
제1e도는 지지부재상에 제품재료의 화학증착 단계를 거치는 동안 지지부재의 단면도.
제1g도는 제품에서 지지부재를 분리한 후 제품의 단면도.

Claims (13)

  1. 표면에 소망하는 형상이 형성되도록 기재를 가공하는 단계와; 상기 기재의 상기 표면상에 삽입물을 배치하는 단계와; 상기 표면과 상기 삽입물의 일부상에 지지부재 재료를 증착하여 그 위에 일지지부재를 형성하는 단계와; 상기 지지부재를 상기 기재에서 분리하는 단계와; 상기 지지부재상에 제품 재료를 화학증착하여 그 위에 상기제품을 형성하는 단계와; 상기 지지부재상에서 상기 제품을 분리하는 단계를 포함하는 제품 제조방법.
  2. 제1항에 있어서, 상기 가공단계는 상기 형상의 드릴로 상기 기재를 드릴링 하는 것을 더 포함하는 방법.
  3. 제1항에 있어서, 상기 증착 단계는 상기 표면과 상기 삽입물의 상기 부분상에 상기 지지부재 재료를 화학증착하는 것을 더 포함하는 방법.
  4. 제1항에 있어서, 상기 삽입물은 텅스텐, 몰리브덴, 레늄, 니오브, 탄탈, 지르코늄, 하프늄, 니켈, 바나듐, 크롬, 또는 티타늄으로 구성되는 방법.
  5. 제1항에 있어서, 상기 삽입물은 상기 지지부재 재료와 같은 동일한 재료로 구성되는 방법.
  6. 제1항에 있어서, 상지 증착 단계는 상기 지지부재 재료를 상기 표면과 상기 삽입물의 상기 부분에 전기 성형하는 것을 더 포함하는 방법.
  7. 제6항에 있어서, 상기 전기 성형 단계는 상기 기재의 상기 표면과 상기 삽입물의 상기 부분상에 제1금속층을 무전해 증착하는 것과; 상기 제1금속층상에 제2금속층을 전해증착하는 것을 더 포함하는 방법.
  8. 제7항에 있어서, 상기 기재는 폴리카보네이트인 방법.
  9. 제7항에 있어서, 상기 제1금속층은 아연이고 상기 제2금속층은 크롬인 방법.
  10. 제1항에 있어서, 상기 기재에서 상기 지지부재를 분리하는 상기 단계는 상기 기재의 상기 표면에 이형제를 가하는 것을 더 포함하는 방법.
  11. 제1항에 있어서, 사이 지지부재에서 상기 제품을 분리하 는 상기 단계는 에칭조내에서 상기 지지부재를 에칭하는 것을 더 포함하는 방법.
  12. 제1항에 있어서, 상기 지지부재는 깔때기 형상의 중공형 맨드릴인 방법.
  13. 제1항에 있어서, 상기 제품은 깔때기 형상의 다이아몬드 물-분사 혼합관인 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930003126A 1992-03-04 1993-03-03 화학증착법에 의한 제품의 제조방법 및 그 제품 KR930019858A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/845,992 US5175929A (en) 1992-03-04 1992-03-04 Method for producing articles by chemical vapor deposition
US845,992 1992-03-04

Publications (1)

Publication Number Publication Date
KR930019858A true KR930019858A (ko) 1993-10-19

Family

ID=25296632

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930003126A KR930019858A (ko) 1992-03-04 1993-03-03 화학증착법에 의한 제품의 제조방법 및 그 제품

Country Status (6)

Country Link
US (1) US5175929A (ko)
EP (1) EP0569117A2 (ko)
JP (1) JPH0610145A (ko)
KR (1) KR930019858A (ko)
CA (1) CA2089280A1 (ko)
ZA (1) ZA931111B (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0613963A1 (en) * 1993-03-05 1994-09-07 General Electric Company Production of crack-free CVD diamond articles
US5468934A (en) * 1994-06-15 1995-11-21 General Electric Company Apparatus for annealing diamond water jet mixing tubes
CN1035049C (zh) * 1994-06-24 1997-06-04 宗贵升 变长线扫描快速自动成型方法和装置
US5635008A (en) * 1995-08-07 1997-06-03 Trw Inc. High precision replication system
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
US6065203A (en) * 1998-04-03 2000-05-23 Advanced Energy Systems, Inc. Method of manufacturing very small diameter deep passages
US6180952B1 (en) 1998-04-03 2001-01-30 Advanced Energy Systems, Inc. Holder assembly system and method in an emitted energy system for photolithography
US6105885A (en) * 1998-04-03 2000-08-22 Advanced Energy Systems, Inc. Fluid nozzle system and method in an emitted energy system for photolithography
US6194733B1 (en) 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
US6042758A (en) * 1998-05-05 2000-03-28 Cvd, Inc. Precision replication by chemical vapor deposition
FR2831892B1 (fr) * 2001-11-06 2004-02-06 Snecma Moteurs Procede de realisation d'un revetement continu a la surface d'une piece
JP4064315B2 (ja) * 2003-08-20 2008-03-19 信越化学工業株式会社 誘導結合プラズマトーチ及び元素分析装置
CN103556209B (zh) 2005-01-24 2018-11-09 坦塔莱恩化学气相沉积控股有限公司 涂敷物体的方法
US7872292B2 (en) * 2006-02-21 2011-01-18 United Microelectronics Corp. Capacitance dielectric layer and capacitor
US8578966B2 (en) * 2006-07-28 2013-11-12 Masco Corporation Of Indiana Mixing valve
US7753074B2 (en) 2006-07-28 2010-07-13 Masco Corporation Of Indiana Mixing valve
US8137747B2 (en) * 2008-07-30 2012-03-20 Honeywell International Inc. Components, turbochargers, and methods of forming the components
US20100088894A1 (en) * 2008-10-10 2010-04-15 Stark Roger M Method for preparing abrasive waterjet mixing tubes
GB2486941C (en) * 2010-12-08 2014-07-30 Oc Oerlikon Balters Ag Apparatus and method for depositing a layer onto asubstrate
GB201401265D0 (en) 2014-01-26 2014-03-12 Miller Donald S Composite focus tubes

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3138434A (en) * 1961-04-26 1964-06-23 Gen Electric Deposition method of forming a pyrolytic graphite article
US3399969A (en) * 1966-02-10 1968-09-03 Gulf General Atomic Inc Deposition of massive pyrolytic carbon
DE2618293A1 (de) * 1976-04-27 1977-11-17 Papst Motoren Kg Kollektorloser gleichstrommotor
US4220618A (en) * 1978-07-26 1980-09-02 M & T Manufacturing Company Method of making a mold with a core supporting bushing
US4292342A (en) * 1980-05-09 1981-09-29 Motorola, Inc. High pressure plasma deposition of silicon
SE442305B (sv) * 1984-06-27 1985-12-16 Santrade Ltd Forfarande for kemisk gasutfellning (cvd) for framstellning av en diamantbelagd sammansatt kropp samt anvendning av kroppen
CH664768A5 (de) * 1985-06-20 1988-03-31 Balzers Hochvakuum Verfahren zur beschichtung von substraten in einer vakuumkammer.
US4830702A (en) * 1987-07-02 1989-05-16 General Electric Company Hollow cathode plasma assisted apparatus and method of diamond synthesis
JPH01138110A (ja) * 1987-11-25 1989-05-31 Showa Denko Kk ダイヤモンド製パイプおよびその製造法
JPH0757039B2 (ja) * 1988-05-09 1995-06-14 株式会社ケンウッド 音響用振動板及びその製造法
JPH03141110A (ja) * 1989-10-24 1991-06-17 Showa Denko Kk ダイヤモンド製立体形状製品の製造方法
GB9015609D0 (en) * 1990-07-16 1990-09-05 De Beers Ind Diamond Tool insert

Also Published As

Publication number Publication date
JPH0610145A (ja) 1994-01-18
EP0569117A2 (en) 1993-11-10
CA2089280A1 (en) 1993-09-05
ZA931111B (en) 1993-12-07
EP0569117A3 (ko) 1994-03-02
US5175929A (en) 1993-01-05

Similar Documents

Publication Publication Date Title
KR930019858A (ko) 화학증착법에 의한 제품의 제조방법 및 그 제품
EP0400947B1 (en) Diamond growth
US6203732B1 (en) Method for manufacturing intraluminal device
KR920002821A (ko) 다수 피복층을 포함하는 다이아몬드 및 이의 제조방법
DE602006006006D1 (de) Beschichtete Schneidplatte und Verfahren zu deren Herstellung
DE3664460D1 (en) Improved process for adhering an oxide coating on a cobalt-enriched zone, and articles made from said process
BR9501144A (pt) Corpo de carboneto cementado revestido e processo para a produção do mesmo
ATE114265T1 (de) Mehrschichtiger schleifkörper.
ZA898486B (en) Multiple metal coated superabrasive grit and methods for their manufacture
CH667361GA3 (ko)
ATE155176T1 (de) Verbundkörper und dessen verwendung
KR940005819A (ko) 피복 초경합금부재 및 이의 제조방법
MX166021B (es) Metodo para producir un cuerpo de ceramica autoportante
US4020543A (en) Two-piece capillary tip bonding tool
EP1096026A3 (en) Method of manufacturing thin metal alloy foils
KR930019856A (ko) 다층 씨브이디(cvd) 다이아몬드 필름
DE59008302D1 (de) Verfahren zur Herstellung einer Beschichtung und Werkstück beschichtet nach dem Verfahren.
FR2508932B1 (fr) Composition a base de palladium, de silicium et de zinc pour activer le depot chimique de nickel, condensateur ceramique obtenu avec cette composition et procede de fabrication de ce condensateur
JPH09507043A (ja) ストランド又は繊維構造を有する金属スクリーン材料、及び該材料の製造法
KR960007477A (ko) 유리성형용 금형, 유리성형용 금형의 제조방법 및 음극선관용 유리제품의 성형방법
EP1273675A3 (de) Verfahren zur Herstellung einer räumlich geformten, folienartig ausgebildeten Trägerschicht aus sprödhartem Material
EP0368517A3 (en) A method of producing silicon carbide-based bodies
IT1216135B (it) Dielettrico mediante deposizioni in processo per la realizzazione di vuoto di metalli, e relativo fori metallizzati in un substrato prodotto ottenuto.
JPH0679503A (ja) 超硬質膜付工具及びその製造方法
JPS6462213A (en) Diamond coated die for wire drawing

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid