KR920010596B1 - Npn 트랜지스터의 래치전압을 이용한 정전내력향상 래터럴 pnp 트랜지스터 - Google Patents
Npn 트랜지스터의 래치전압을 이용한 정전내력향상 래터럴 pnp 트랜지스터 Download PDFInfo
- Publication number
- KR920010596B1 KR920010596B1 KR1019890018743A KR890018743A KR920010596B1 KR 920010596 B1 KR920010596 B1 KR 920010596B1 KR 1019890018743 A KR1019890018743 A KR 1019890018743A KR 890018743 A KR890018743 A KR 890018743A KR 920010596 B1 KR920010596 B1 KR 920010596B1
- Authority
- KR
- South Korea
- Prior art keywords
- emitter
- collector
- transistor
- pnp transistor
- lateral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/711—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements
- H10D89/713—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements including a PNP transistor and a NPN transistor, wherein each of said transistors has its base region coupled to the collector region of the other transistor, e.g. silicon controlled rectifier [SCR] devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02293—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process formation of epitaxial layers by a deposition process
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/52—Circuit arrangements for protecting such amplifiers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/60—Lateral BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/63—Combinations of vertical and lateral BJTs
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890018743A KR920010596B1 (ko) | 1989-12-16 | 1989-12-16 | Npn 트랜지스터의 래치전압을 이용한 정전내력향상 래터럴 pnp 트랜지스터 |
TW079110351A TW198136B (enrdf_load_stackoverflow) | 1989-12-16 | 1990-12-08 | |
DE4040070A DE4040070C2 (de) | 1989-12-16 | 1990-12-14 | PNP-Transistor mit einem Schutzelement zum Schutz vor statischer Elektrizität |
JP2402505A JP2597753B2 (ja) | 1989-12-16 | 1990-12-14 | Npnトランジスターのラッチ電圧を利用した静電耐力向上ラテラルpnpトランジスター |
CN90109971A CN1020027C (zh) | 1989-12-16 | 1990-12-15 | 一种利用npn晶体管锁闩电压的横向pnp晶体管 |
US07/860,271 US5237198A (en) | 1989-12-16 | 1992-04-01 | Lateral PNP transistor using a latch voltage of NPN transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890018743A KR920010596B1 (ko) | 1989-12-16 | 1989-12-16 | Npn 트랜지스터의 래치전압을 이용한 정전내력향상 래터럴 pnp 트랜지스터 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910013586A KR910013586A (ko) | 1991-08-08 |
KR920010596B1 true KR920010596B1 (ko) | 1992-12-10 |
Family
ID=19293038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890018743A Expired KR920010596B1 (ko) | 1989-12-16 | 1989-12-16 | Npn 트랜지스터의 래치전압을 이용한 정전내력향상 래터럴 pnp 트랜지스터 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2597753B2 (enrdf_load_stackoverflow) |
KR (1) | KR920010596B1 (enrdf_load_stackoverflow) |
CN (1) | CN1020027C (enrdf_load_stackoverflow) |
DE (1) | DE4040070C2 (enrdf_load_stackoverflow) |
TW (1) | TW198136B (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10343681B4 (de) * | 2003-09-18 | 2007-08-09 | Atmel Germany Gmbh | Halbleiterstruktur und deren Verwendung, insbesondere zum Begrenzen von Überspannungen |
CN102280484B (zh) * | 2011-08-06 | 2015-06-03 | 深圳市稳先微电子有限公司 | 一种栅源和栅漏过压保护的晶体管功率器件及其制造方法 |
JP6077692B1 (ja) * | 2016-03-04 | 2017-02-08 | 伸興化成株式会社 | リサイクル可能な合成樹脂タイル及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4291319A (en) * | 1976-05-19 | 1981-09-22 | National Semiconductor Corporation | Open base bipolar transistor protective device |
JPS6068721A (ja) * | 1983-09-22 | 1985-04-19 | Fujitsu Ltd | Ecl回路 |
JPS60253257A (ja) * | 1984-05-29 | 1985-12-13 | Sanyo Electric Co Ltd | 半導体集積回路装置 |
JPS6364058A (ja) * | 1986-09-05 | 1988-03-22 | Canon Inc | 画像形成装置 |
-
1989
- 1989-12-16 KR KR1019890018743A patent/KR920010596B1/ko not_active Expired
-
1990
- 1990-12-08 TW TW079110351A patent/TW198136B/zh active
- 1990-12-14 DE DE4040070A patent/DE4040070C2/de not_active Expired - Lifetime
- 1990-12-14 JP JP2402505A patent/JP2597753B2/ja not_active Expired - Lifetime
- 1990-12-15 CN CN90109971A patent/CN1020027C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
TW198136B (enrdf_load_stackoverflow) | 1993-01-11 |
DE4040070A1 (de) | 1991-06-20 |
DE4040070C2 (de) | 1997-01-23 |
JP2597753B2 (ja) | 1997-04-09 |
CN1052573A (zh) | 1991-06-26 |
JPH0483374A (ja) | 1992-03-17 |
KR910013586A (ko) | 1991-08-08 |
CN1020027C (zh) | 1993-03-03 |
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A201 | Request for examination | ||
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Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19891216 |
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PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19891216 Comment text: Request for Examination of Application |
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E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 19920422 Patent event code: PE09021S01D |
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PG1605 | Publication of application before grant of patent |
Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19921111 |
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Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19930303 |
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