KR900016814A - 포토레지스트 조성물 - Google Patents

포토레지스트 조성물

Info

Publication number
KR900016814A
KR900016814A KR1019900004931A KR900004931A KR900016814A KR 900016814 A KR900016814 A KR 900016814A KR 1019900004931 A KR1019900004931 A KR 1019900004931A KR 900004931 A KR900004931 A KR 900004931A KR 900016814 A KR900016814 A KR 900016814A
Authority
KR
South Korea
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Application number
KR1019900004931A
Other languages
English (en)
Other versions
KR100214733B1 (ko
Inventor
나오끼 다께야마
야스노리 우에따니
히로또시 나까니시
따로 하나와료
Original Assignee
스미또모 가가꾸 고오교오 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미또모 가가꾸 고오교오 가부시끼가이샤 filed Critical 스미또모 가가꾸 고오교오 가부시끼가이샤
Publication of KR900016814A publication Critical patent/KR900016814A/ko
Application granted granted Critical
Publication of KR100214733B1 publication Critical patent/KR100214733B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
KR1019900004931A 1989-04-10 1990-04-10 포토레지스트 조성물 KR100214733B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1091551A JP2682126B2 (ja) 1989-04-10 1989-04-10 フォトレジスト組成物
JP91551-1989 1989-04-10

Publications (2)

Publication Number Publication Date
KR900016814A true KR900016814A (ko) 1990-11-14
KR100214733B1 KR100214733B1 (ko) 1999-08-02

Family

ID=14029636

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900004931A KR100214733B1 (ko) 1989-04-10 1990-04-10 포토레지스트 조성물

Country Status (5)

Country Link
EP (1) EP0392409B1 (ko)
JP (1) JP2682126B2 (ko)
KR (1) KR100214733B1 (ko)
CA (1) CA2014287A1 (ko)
DE (1) DE69033790T2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2625206B2 (ja) * 1989-04-18 1997-07-02 富士写真フイルム株式会社 フオトレジスト組成物
JP2921023B2 (ja) * 1990-05-02 1999-07-19 住友化学工業株式会社 レジスト用の組成物
JP2921022B2 (ja) * 1990-05-02 1999-07-19 住友化学工業株式会社 レジスト組成物
CA2041434A1 (en) * 1990-05-02 1991-11-03 Teijiro Kitao Resist composition
US5719004A (en) * 1996-08-07 1998-02-17 Clariant Finance (Bvi) Limited Positive photoresist composition containing a 2,4-dinitro-1-naphthol
US5763135A (en) * 1996-09-30 1998-06-09 Clariant Finance (Bvi) Limited Light sensitive composition containing an arylhydrazo dye

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4135007A (en) * 1977-12-29 1979-01-16 Gaf Corporation Radiation curable coating composition comprising an acryl urethane oligomer, and an ultra-violet absorber
JPS6193445A (ja) * 1984-10-12 1986-05-12 Fuji Photo Film Co Ltd 新規なフオトレジスト組成物
JPS6280640A (ja) * 1985-10-04 1987-04-14 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS63286843A (ja) * 1987-05-19 1988-11-24 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
EP0303967A3 (de) * 1987-08-20 1990-10-31 Hoechst Celanese Corporation Aufzeichnungsmaterial mit einer Kontrastverstärkungsschicht sowie Verfahren zur Herstellung eines Aufzeichnungsmaterials mit einer darauf aufgebrachten Maske
MX169489B (es) * 1987-12-28 1993-07-07 Sumitomo Chemical Co Procedimiento para preparar compuestos de estirilo

Also Published As

Publication number Publication date
EP0392409A1 (en) 1990-10-17
JP2682126B2 (ja) 1997-11-26
JPH02269346A (ja) 1990-11-02
DE69033790T2 (de) 2002-05-23
DE69033790D1 (de) 2001-10-11
KR100214733B1 (ko) 1999-08-02
EP0392409B1 (en) 2001-09-05
CA2014287A1 (en) 1990-10-10

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
J201 Request for trial against refusal decision
S901 Examination by remand of revocation
GRNO Decision to grant (after opposition)
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120503

Year of fee payment: 14

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Year of fee payment: 15

EXPY Expiration of term