KR890015349A - 기상성장장치 - Google Patents

기상성장장치 Download PDF

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Publication number
KR890015349A
KR890015349A KR1019890002688A KR890002688A KR890015349A KR 890015349 A KR890015349 A KR 890015349A KR 1019890002688 A KR1019890002688 A KR 1019890002688A KR 890002688 A KR890002688 A KR 890002688A KR 890015349 A KR890015349 A KR 890015349A
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KR
South Korea
Prior art keywords
cassette
vapor phase
phase growth
lead
wafer
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KR1019890002688A
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English (en)
Other versions
KR930003135B1 (ko
Inventor
요시나리 마쯔시다
켄지 후꾸모또
사또시 다께다
Original Assignee
다니이 아끼오
마쯔시다덴기산교 가부시기가이샤
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Application filed by 다니이 아끼오, 마쯔시다덴기산교 가부시기가이샤 filed Critical 다니이 아끼오
Publication of KR890015349A publication Critical patent/KR890015349A/ko
Application granted granted Critical
Publication of KR930003135B1 publication Critical patent/KR930003135B1/ko

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    • H01L21/205—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Robotics (AREA)

Abstract

내용 없음

Description

기상성장장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도 ~3도는 본 발명의 일실시예를 나타내고, 제 1 도는 전체평면도. 제 2 도는 예비실의 종단측면도. 제 3 도는 예비실의 종단정면도.

Claims (9)

  1. 반응실과, 이 반응실에 대한 로우드와 언로우드겸용의 예비실을 구비하고, 예비실에는, 반응실에 대한 웨이퍼의 급배부와 그 양쪽에 등 간격으로 배설한 미가공웨이퍼의 인입부와 가공완료 웨이퍼의 인출부를 형성하고, 복수의 웨이퍼를 장전가능한 1쌍의 카세트가 양쪽에 설치되며 또한 이들 1쌍의 카세트를 인입부와 급배부 또는 급배부와 인출부에 위치시키도록 이동가능한 가동대를 배설한것을 특징으로 하는 기상성장장치.
  2. 제 1 항에 있어서, 가동대상의 카세트를 웨이퍼의 배열방향으로 이동시키는 이동수단을 구비한것을 특징으로 하는 기상성장장치.
  3. 제 1 항 또는 제 2 항에 있어서, 가동대상의 1쌍의 카세트는, 웨이퍼를 한방향으로 삽입하고, 그 연장방향으로 인출하도록한 로우드전용카세트와 언로우드전용카세트로 이루어진것을 특징으로 하는 기상성장장치.
  4. 제 3 항에 있어서, 로우드전용카세트 및 언로우드전용카세트를, 제품용카세트의 웨이퍼 장전매수보다 많은 매수의 웨이퍼를 장전가능하도록 구성한것을 특징으로 하는 기상성장장치.
  5. 제 3 항 또는 제 4 항에 있어서, 언로우드전용카세트를, 내열재료로 형성하고, 적어도 웨이퍼지지부의 표면을 미끄럼성이 뛰어난 표면으로 한것을 특징으로 하는 기상성장장치.
  6. 제 1 항 또는 제 4 항에 있어서, 예비실의 외부에, 인입부와 인출부에 대응시켜셔 로우드용의 케세트설치부와 언로우드용의 카세트설치부를 배설하고, 이들 카세트설치부와 인입부와 인출부의 사이에 웨이퍼의 이재수단을 배설한것을 특징으로 하는 기상성장장치.
  7. 제 6 항에 있어서, 각 카세트설치부는, 제품용카세트와 막두께평가용모니터카세트를 별렬로 설치가능하도록 구성한것을 특징으로 하는 기상성장장치.
  8. 제 1 항에 있어서, 예비실의 인입부에, 예열수단을 배설한것을 특징으로 하는 기상성장장치.
  9. 제 1 항에 있어서, 예비실의 인출부에, 냉각수단을 배설한것을 특징으로 하는 기상성장장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890002688A 1988-03-04 1989-03-04 화학적 기상 성장장치 KR930003135B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP88-51923 1988-03-04
JP63051923A JP2502661B2 (ja) 1988-03-04 1988-03-04 気相成長装置
JP63-51923 1988-03-04

Publications (2)

Publication Number Publication Date
KR890015349A true KR890015349A (ko) 1989-10-30
KR930003135B1 KR930003135B1 (ko) 1993-04-22

Family

ID=12900395

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890002688A KR930003135B1 (ko) 1988-03-04 1989-03-04 화학적 기상 성장장치

Country Status (3)

Country Link
US (1) US5058526A (ko)
JP (1) JP2502661B2 (ko)
KR (1) KR930003135B1 (ko)

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JP2892170B2 (ja) * 1990-07-20 1999-05-17 株式会社東芝 熱処理成膜方法
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Also Published As

Publication number Publication date
JP2502661B2 (ja) 1996-05-29
JPH01225311A (ja) 1989-09-08
US5058526A (en) 1991-10-22
KR930003135B1 (ko) 1993-04-22

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