KR890004959B1 - 전계효과 반도체 장치 - Google Patents
전계효과 반도체 장치 Download PDFInfo
- Publication number
- KR890004959B1 KR890004959B1 KR1019860001428A KR860001428A KR890004959B1 KR 890004959 B1 KR890004959 B1 KR 890004959B1 KR 1019860001428 A KR1019860001428 A KR 1019860001428A KR 860001428 A KR860001428 A KR 860001428A KR 890004959 B1 KR890004959 B1 KR 890004959B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- gaas
- type
- doped
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
- H10D30/4755—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/60—Impurity distributions or concentrations
- H10D62/605—Planar doped, e.g. atomic-plane doped or delta-doped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
Landscapes
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60037433A JPS61198784A (ja) | 1985-02-28 | 1985-02-28 | 電界効果型半導体装置 |
| JP37433 | 1985-02-28 | ||
| JP60-37433 | 1985-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR860006843A KR860006843A (ko) | 1986-09-15 |
| KR890004959B1 true KR890004959B1 (ko) | 1989-12-02 |
Family
ID=12497377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019860001428A Expired KR890004959B1 (ko) | 1985-02-28 | 1986-02-28 | 전계효과 반도체 장치 |
Country Status (5)
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5216260A (en) * | 1984-11-19 | 1993-06-01 | Max-Planck Gesellschaft Zur Foerderung Der Wissenschaften E.V. | Optically bistable semiconductor device with pairs of monoatomic layers separated by intrinsic layers |
| US4827320A (en) * | 1986-09-19 | 1989-05-02 | University Of Illinois | Semiconductor device with strained InGaAs layer |
| JPS63316484A (ja) * | 1987-06-19 | 1988-12-23 | Fujitsu Ltd | 量子効果半導体装置 |
| DE3828885A1 (de) * | 1988-08-26 | 1990-03-01 | Mitsubishi Electric Corp | Feldeffekttransistor |
| EP0391380B1 (en) * | 1989-04-04 | 1997-12-17 | Siemens Aktiengesellschaft | HEMT Structure |
| US5436470A (en) * | 1991-01-14 | 1995-07-25 | Sumitomo Electric Industries, Ltd. | Field effect transistor |
| JP3173080B2 (ja) * | 1991-12-05 | 2001-06-04 | 日本電気株式会社 | 電界効果トランジスタ |
| US5488237A (en) * | 1992-02-14 | 1996-01-30 | Sumitomo Electric Industries, Ltd. | Semiconductor device with delta-doped layer in channel region |
| US5278444A (en) * | 1992-02-26 | 1994-01-11 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Planar varactor frequency multiplier devices with blocking barrier |
| DE4216030A1 (de) * | 1992-05-15 | 1993-11-18 | Forschungszentrum Juelich Gmbh | Elektronisches Bauelement mit wenigstens einem Stromkanal, der ein zweidimensionales Ladungsträgergas enthält |
| JP2914049B2 (ja) * | 1992-10-27 | 1999-06-28 | 株式会社デンソー | ヘテロ接合を有する化合物半導体基板およびそれを用いた電界効果トランジスタ |
| US5686737A (en) * | 1994-09-16 | 1997-11-11 | Cree Research, Inc. | Self-aligned field-effect transistor for high frequency applications |
| JP3458349B2 (ja) * | 1996-11-19 | 2003-10-20 | 株式会社デンソー | 半導体装置 |
| JP3429700B2 (ja) | 1999-03-19 | 2003-07-22 | 富士通カンタムデバイス株式会社 | 高電子移動度トランジスタ |
| TWI222750B (en) * | 2003-04-25 | 2004-10-21 | Univ Nat Cheng Kung | Voltage adjustable multi-stage extrinsic transconductance amplification HEMT |
| US20050104087A1 (en) * | 2003-11-19 | 2005-05-19 | Lan Ellen Y. | InGaP pHEMT device for power amplifier operation over wide temperature range |
| FR2875337A1 (fr) * | 2004-09-13 | 2006-03-17 | Picogiga Internat Soc Par Acti | Structures hemt piezoelectriques a desordre d'alliage nul |
| FR2875338B1 (fr) * | 2004-09-13 | 2007-01-05 | Picogiga Internat Soc Par Acti | Methode d'elaboration de structures hemt piezoelectriques a desordre d'alliage nul |
| US7821030B2 (en) * | 2005-03-02 | 2010-10-26 | Panasonic Corporation | Semiconductor device and method for manufacturing the same |
| US7253455B2 (en) * | 2005-04-05 | 2007-08-07 | Freescale Semiconductor, Inc. | pHEMT with barrier optimized for low temperature operation |
| JP5762049B2 (ja) * | 2011-02-28 | 2015-08-12 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4205329A (en) * | 1976-03-29 | 1980-05-27 | Bell Telephone Laboratories, Incorporated | Periodic monolayer semiconductor structures grown by molecular beam epitaxy |
| US4194935A (en) * | 1978-04-24 | 1980-03-25 | Bell Telephone Laboratories, Incorporated | Method of making high mobility multilayered heterojunction devices employing modulated doping |
| US4410902A (en) * | 1981-03-23 | 1983-10-18 | The United States Of America As Represented By The Secretary Of The Army | Planar doped barrier semiconductor device |
| US4695857A (en) * | 1983-06-24 | 1987-09-22 | Nec Corporation | Superlattice semiconductor having high carrier density |
| US4882609A (en) * | 1984-11-19 | 1989-11-21 | Max-Planck Gesellschaft Zur Forderung Der Wissenschafter E.V. | Semiconductor devices with at least one monoatomic layer of doping atoms |
| JPS61271874A (ja) * | 1985-05-27 | 1986-12-02 | Fujitsu Ltd | 半導体装置 |
| JPH0628273A (ja) * | 1991-01-09 | 1994-02-04 | Nec Corp | 入力電文振分方式 |
-
1985
- 1985-02-28 JP JP60037433A patent/JPS61198784A/ja active Granted
-
1986
- 1986-02-27 DE DE8686301407T patent/DE3682421D1/de not_active Expired - Lifetime
- 1986-02-27 EP EP86301407A patent/EP0199435B1/en not_active Expired - Lifetime
- 1986-02-28 KR KR1019860001428A patent/KR890004959B1/ko not_active Expired
-
1987
- 1987-12-07 US US07/131,232 patent/US4833508A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0156543B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-11-30 |
| EP0199435A2 (en) | 1986-10-29 |
| EP0199435A3 (en) | 1988-03-02 |
| KR860006843A (ko) | 1986-09-15 |
| US4833508A (en) | 1989-05-23 |
| EP0199435B1 (en) | 1991-11-13 |
| DE3682421D1 (de) | 1991-12-19 |
| JPS61198784A (ja) | 1986-09-03 |
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| KR890004959B1 (ko) | 전계효과 반도체 장치 | |
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| JP3716906B2 (ja) | 電界効果トランジスタ | |
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| US5225895A (en) | Velocity-modulation transistor with quantum well wire layer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| G160 | Decision to publish patent application | ||
| PG1605 | Publication of application before grant of patent |
St.27 status event code: A-2-2-Q10-Q13-nap-PG1605 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
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| FPAY | Annual fee payment |
Payment date: 19921201 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 19931203 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 19931203 |
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| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
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| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |