KR850002705A - 반도체 레이저 - Google Patents

반도체 레이저 Download PDF

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Publication number
KR850002705A
KR850002705A KR1019830004536A KR830004536A KR850002705A KR 850002705 A KR850002705 A KR 850002705A KR 1019830004536 A KR1019830004536 A KR 1019830004536A KR 830004536 A KR830004536 A KR 830004536A KR 850002705 A KR850002705 A KR 850002705A
Authority
KR
South Korea
Prior art keywords
light emitting
emitting region
semiconductor laser
laser
semiconductor
Prior art date
Application number
KR1019830004536A
Other languages
English (en)
Inventor
마사미찌 사까모도
Original Assignee
오오가 노리오
쏘니 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오오가 노리오, 쏘니 가부시기 가이샤 filed Critical 오오가 노리오
Publication of KR850002705A publication Critical patent/KR850002705A/ko

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/1053Comprising an active region having a varying composition or cross-section in a specific direction
    • H01S5/1064Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2231Buried stripe structure with inner confining structure only between the active layer and the upper electrode

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

내용 없음

Description

반도체 레이저
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도 및 제4도는 본원 발명에 의한 반도체 레이저의 일례의 확대사시도 및 그 일부를 절단한 확대사시도.

Claims (1)

  1. 대충 평탄한 활성층에 스트라이프상의 발광영역이 형성되며, 이 발광영역의 광단면부에 있어서 굴절율 가이드적으로 동작시키는 수단을 갖는 동시에, 상기 발광영역의 중앙부에 있어서 이득가이드적으로 동작시키는 수단을 구비한 반도체 레이저.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830004536A 1982-09-30 1983-09-28 반도체 레이저 KR850002705A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP82-172201 1982-09-30
JP57172201A JPS5961981A (ja) 1982-09-30 1982-09-30 半導体レ−ザ−

Publications (1)

Publication Number Publication Date
KR850002705A true KR850002705A (ko) 1985-05-15

Family

ID=15937454

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830004536A KR850002705A (ko) 1982-09-30 1983-09-28 반도체 레이저

Country Status (8)

Country Link
US (1) US4606033A (ko)
JP (1) JPS5961981A (ko)
KR (1) KR850002705A (ko)
CA (1) CA1239464A (ko)
DE (1) DE3335372A1 (ko)
FR (1) FR2534078B1 (ko)
GB (1) GB2129212B (ko)
NL (1) NL8303339A (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61121381A (ja) * 1984-11-19 1986-06-09 Hitachi Ltd 半導体レ−ザ装置
US5136601A (en) * 1984-11-19 1992-08-04 Hitachi, Ltd. Semiconductor laser
JPS61289689A (ja) * 1985-06-18 1986-12-19 Mitsubishi Electric Corp 半導体発光装置
JPS6218783A (ja) * 1985-07-17 1987-01-27 Sharp Corp 半導体レ−ザ素子
US4827483A (en) * 1985-08-12 1989-05-02 Hitachi, Ltd. Semiconductor laser device and method of fabricating the same
JPS62130586A (ja) * 1985-12-03 1987-06-12 Matsushita Electric Ind Co Ltd 半導体レ−ザ装置
DE3604293A1 (de) * 1986-02-12 1987-08-13 Telefunken Electronic Gmbh Heterostruktur-halbleiterlaserdiode
DE3604295A1 (de) * 1986-02-12 1987-08-13 Telefunken Electronic Gmbh Heterostruktur-halbleiterlaserdiode
JPS6348888A (ja) * 1986-08-19 1988-03-01 Mitsubishi Electric Corp 半導体レ−ザ装置
US4821278A (en) * 1987-04-02 1989-04-11 Trw Inc. Inverted channel substrate planar semiconductor laser
JPH04155988A (ja) * 1990-10-19 1992-05-28 Rohm Co Ltd 半導体レーザ
JP3714984B2 (ja) * 1995-03-06 2005-11-09 シャープ株式会社 分布帰還型半導体レーザ装置
JP2017050318A (ja) 2015-08-31 2017-03-09 ルネサスエレクトロニクス株式会社 半導体装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3838359A (en) * 1973-11-23 1974-09-24 Bell Telephone Labor Inc Gain asymmetry in heterostructure junction lasers operating in a fundamental transverse mode
US4309668A (en) * 1978-02-20 1982-01-05 Nippon Electric Co., Ltd. Stripe-geometry double heterojunction laser device

Also Published As

Publication number Publication date
GB2129212B (en) 1986-07-16
JPS5961981A (ja) 1984-04-09
DE3335372A1 (de) 1984-07-12
GB2129212A (en) 1984-05-10
FR2534078A1 (fr) 1984-04-06
GB8326054D0 (en) 1983-11-02
US4606033A (en) 1986-08-12
FR2534078B1 (fr) 1987-11-13
NL8303339A (nl) 1984-04-16
CA1239464A (en) 1988-07-19

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application