KR910010782A - 회절을 이용하는 비임 정형 시스템 - Google Patents

회절을 이용하는 비임 정형 시스템 Download PDF

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Publication number
KR910010782A
KR910010782A KR1019900018630A KR900018630A KR910010782A KR 910010782 A KR910010782 A KR 910010782A KR 1019900018630 A KR1019900018630 A KR 1019900018630A KR 900018630 A KR900018630 A KR 900018630A KR 910010782 A KR910010782 A KR 910010782A
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KR
South Korea
Prior art keywords
diffraction
optical
beam shaping
zone
lens means
Prior art date
Application number
KR1019900018630A
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English (en)
Inventor
게리 삭스 스티븐
Original Assignee
찰톤 헨리 디에츠
미네소타 마이닝 앤드 메뉴팩츄어링 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 찰톤 헨리 디에츠, 미네소타 마이닝 앤드 메뉴팩츄어링 캄파니 filed Critical 찰톤 헨리 디에츠
Publication of KR910010782A publication Critical patent/KR910010782A/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/101—Lasers provided with means to change the location from which, or the direction in which, laser radiation is emitted
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/08—Anamorphotic objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0911—Anamorphotic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0972—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
    • G02B27/4277—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path being separated by an air space
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4206—Optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lenses (AREA)

Abstract

내용 없음

Description

회절을 이용하는 비임 정형 시스템
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제4도는 본 발명에 따른 비임 정형 시스템의 사시도
제5도는 회절 배율을 갖는 렌즈의 일부분에 대한 측면도
제6도는 회절 배율을 가지며 초구역을 이용하는 랜즈의 일부분에 대한 측면도.

Claims (7)

  1. 비임이 진행하는 광학 축을 갖는 다이오드 레이저의 비임 정형 시스템으로, 상기 시스템이 , 회절 배율을 가지며, 상기 광학 축과 교차하며, 상기 비임율 제1의 차원로 정형하는 제1렌즈 수단과; 회절 배율을 가지며, 상기 광학 축과 교차하며, 상기 비임을 상기 제1의 차원과 직각인 제2의 차원으로 정형하는 제2렌즈수단을 포함하는 비임 정형 시스템.
  2. 제1항에 있어서, 상기 각각의 렌즈수단의 상기 회절 배율은 복수의 직선형 회절 구역에 의해 제공되며, 상기 제1렌즈 수단의 상기 회절구역은 상기 제2렌즈수단의 상기 회절구역과 직각인 비임 정형 시스템.
  3. 제2항에 있어서, 상기 회절 구역은 광학 계단에 의해 분리되며, 각각의 상기 광학계단을 상기 비임에 대하여 λ와 동일한 광학경로 길이의 변화를 제공하며 λ는 상기 시스템의 설계 파장인 비임 정형 시스템
  4. 제2항에 있어서, 상기 회절 구역은 광학 계단에 의해 분리되며, 각각의 렌즈의 상기 광학 계단중의 몇개는 상기 비임에 대하여 λ와 동일한 광학 경로 길이의 변화를 제공하고 각각의 렌즈의 상기 광학 계단중의 몇개는 λ와 동일한 광학 경로 길이의 변화를 제공하며, λ는 상기 시스템의 설계파장이고, J 및 K는 동일하지 않는 정수인 비임 정형 시스템.
  5. 제2항에 있어서, 상기 구역은 직선의 외형을 갖는 비임 정형 시스템.
  6. 제2항에 있어서, 상기 구역은 쌍곡선의 외형을 갖는 비임 정형 시스템.
  7. 제2항에 있어서, 상기 구역은 계단형의 외형을 갖는 비임 정형 시스템.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900018630A 1989-11-17 1990-11-16 회절을 이용하는 비임 정형 시스템 KR910010782A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43909489A 1989-11-17 1989-11-17
US439094 1989-11-17

Publications (1)

Publication Number Publication Date
KR910010782A true KR910010782A (ko) 1991-06-29

Family

ID=23743267

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900018630A KR910010782A (ko) 1989-11-17 1990-11-16 회절을 이용하는 비임 정형 시스템

Country Status (4)

Country Link
EP (1) EP0429243A3 (ko)
JP (1) JPH03210521A (ko)
KR (1) KR910010782A (ko)
CA (1) CA2029805A1 (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2056842A1 (en) * 1991-02-07 1992-08-08 Jay M. Eastman System for scanning and reading symbols, such as bar codes, which is adapted to be configured in a hand held unit and can automatically read symbols on objects which are placed inthe detection zone of the unit
US5206878A (en) * 1991-10-11 1993-04-27 At&T Bell Laboratories Wide strip diode laser employing a lens
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
DE4412254A1 (de) * 1994-04-07 1995-10-12 Hertz Inst Heinrich Optisches Koppelglied und Verfahren zu dessen Herstellung
DE19524936C1 (de) * 1995-07-08 1996-11-21 Leica Ag Vorrichtung zur Darstellung einer rotationssymmetrischen, gaußförmigen Intensitätsverteilung im Strahlenquerschnitt eines Strahlenbündels
US5718496A (en) * 1996-06-25 1998-02-17 Digital Optics Corporation Projection pointer
US6008941A (en) * 1996-06-25 1999-12-28 Digital Optics Corporation Optical soft aperture and use thereof
KR100288967B1 (ko) * 1997-01-28 2001-05-02 윤종용 빔정형을 위한 광학계 및 이를 채용한 광픽업
EP1033597A4 (en) * 1998-09-17 2005-09-28 Matsushita Electric Ind Co Ltd COUPLING LENS AND SEMICONDUCTOR LASER MODULE
DE10057666A1 (de) * 2000-11-21 2002-06-06 Stn Atlas Elektronik Gmbh Lasersender
DE50207722D1 (de) * 2001-03-20 2006-09-14 Thomson Licensing Element zur kombinierten symmetrisierung und homogenisierung eines strahlenbündels
CN104272180B (zh) 2012-02-27 2017-12-29 E-视觉智能光学公司 具有多个深度衍射结构的电活性透镜
EP3425268B1 (en) 2016-03-04 2020-01-01 Panasonic Intellectual Property Management Co., Ltd. Wavelength conversion device and illuminating device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4521075A (en) * 1983-03-07 1985-06-04 Obenschain Stephen P Controllable spatial incoherence echelon for laser
US4936666A (en) * 1989-08-08 1990-06-26 Minnesota Mining And Manufacturing Company Diffractive lens

Also Published As

Publication number Publication date
JPH03210521A (ja) 1991-09-13
CA2029805A1 (en) 1991-05-18
EP0429243A3 (en) 1991-12-27
EP0429243A2 (en) 1991-05-29

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