KR830001873B1 - 저항체 조성물 - Google Patents

저항체 조성물 Download PDF

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Publication number
KR830001873B1
KR830001873B1 KR1019800004223A KR800004223A KR830001873B1 KR 830001873 B1 KR830001873 B1 KR 830001873B1 KR 1019800004223 A KR1019800004223 A KR 1019800004223A KR 800004223 A KR800004223 A KR 800004223A KR 830001873 B1 KR830001873 B1 KR 830001873B1
Authority
KR
South Korea
Prior art keywords
weight percent
nickel
chromium
composition
stability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019800004223A
Other languages
English (en)
Korean (ko)
Other versions
KR830004650A (ko
Inventor
거니 도펠드 윌리암
존 세트죠 로버트
Original Assignee
코닝 글라스 웍스
클레런스 알. 패니, 쥬니어
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코닝 글라스 웍스, 클레런스 알. 패니, 쥬니어 filed Critical 코닝 글라스 웍스
Publication of KR830004650A publication Critical patent/KR830004650A/ko
Application granted granted Critical
Publication of KR830001873B1 publication Critical patent/KR830001873B1/ko
Expired legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/06—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C3/00—Non-adjustable metal resistors made of wire or ribbon, e.g. coiled, woven or formed as grids
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49101—Applying terminal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Physical Vapour Deposition (AREA)
KR1019800004223A 1979-11-05 1980-11-04 저항체 조성물 Expired KR830001873B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/091,375 US4298505A (en) 1979-11-05 1979-11-05 Resistor composition and method of manufacture thereof
US91375 1979-11-05

Publications (2)

Publication Number Publication Date
KR830004650A KR830004650A (ko) 1983-07-16
KR830001873B1 true KR830001873B1 (ko) 1983-09-15

Family

ID=22227440

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019800004223A Expired KR830001873B1 (ko) 1979-11-05 1980-11-04 저항체 조성물

Country Status (8)

Country Link
US (1) US4298505A (https=)
JP (2) JPS606521B2 (https=)
KR (1) KR830001873B1 (https=)
CA (1) CA1157298A (https=)
DE (1) DE3039927A1 (https=)
FR (1) FR2468981A1 (https=)
GB (1) GB2062676B (https=)
NL (1) NL8006025A (https=)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof
US4591821A (en) * 1981-06-30 1986-05-27 Motorola, Inc. Chromium-silicon-nitrogen thin film resistor and apparatus
US4510178A (en) * 1981-06-30 1985-04-09 Motorola, Inc. Thin film resistor material and method
US4392992A (en) * 1981-06-30 1983-07-12 Motorola, Inc. Chromium-silicon-nitrogen resistor material
JPS5884401A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 抵抗体
JPS5884406A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 薄膜抵抗体の製造方法
JPS58119601A (ja) * 1982-01-08 1983-07-16 株式会社東芝 抵抗体
JPS58153752A (ja) * 1982-03-08 1983-09-12 Takeshi Masumoto Ｎｉ−Ｃｒ系合金材料
JPS597234A (ja) * 1982-07-05 1984-01-14 Aisin Seiki Co Ltd 圧力センサ
US4433269A (en) * 1982-11-22 1984-02-21 Burroughs Corporation Air fireable ink
JPS6212325U (https=) * 1985-07-08 1987-01-26
JPH03148945A (ja) * 1989-11-06 1991-06-25 Nitsuko Corp コードレス電話機
DE4207220A1 (de) * 1992-03-07 1993-09-09 Philips Patentverwaltung Festkoerperelement fuer eine thermionische kathode
US5354509A (en) * 1993-10-26 1994-10-11 Cts Corporation Base metal resistors
US5518521A (en) * 1993-11-08 1996-05-21 Cts Corporation Process of producing a low TCR surge resistor using a nickel chromium alloy
EP0861492A1 (en) * 1996-09-13 1998-09-02 Koninklijke Philips Electronics N.V. Thin-film resistor and resistance material for a thin-film resistor
DE10153217B4 (de) * 2001-10-31 2007-01-18 Heraeus Sensor Technology Gmbh Manteldraht, insbesondere Anschlussdraht für elektrische Temperatursensoren
US20040091255A1 (en) * 2002-11-11 2004-05-13 Eastman Kodak Company Camera flash circuit with adjustable flash illumination intensity
JP4760177B2 (ja) * 2005-07-14 2011-08-31 パナソニック株式会社 薄膜チップ形電子部品およびその製造方法
US10427277B2 (en) 2011-04-05 2019-10-01 Ingersoll-Rand Company Impact wrench having dynamically tuned drive components and method thereof
US9879339B2 (en) * 2012-03-20 2018-01-30 Southwest Research Institute Nickel-chromium-silicon based coatings
CN106575555B (zh) * 2014-08-18 2018-11-23 株式会社村田制作所 电子部件以及电子部件的制造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462723A (en) * 1966-03-23 1969-08-19 Mallory & Co Inc P R Metal-alloy film resistor and method of making same
US3477935A (en) * 1966-06-07 1969-11-11 Union Carbide Corp Method of forming thin film resistors by cathodic sputtering
DE1765091C3 (de) * 1968-04-01 1974-06-06 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung eines hochkonstanten Metallschichtwiderstandselementes
US3591479A (en) * 1969-05-08 1971-07-06 Ibm Sputtering process for preparing stable thin film resistors
NL7102290A (https=) * 1971-02-20 1972-08-22
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
US4073971A (en) * 1973-07-31 1978-02-14 Nobuo Yasujima Process of manufacturing terminals of a heat-proof metallic thin film resistor
US4204935A (en) * 1976-02-10 1980-05-27 Resista Fabrik Elektrischer Widerstande G.M.B.H. Thin-film resistor and process for the production thereof
US4100524A (en) * 1976-05-06 1978-07-11 Gould Inc. Electrical transducer and method of making
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof

Also Published As

Publication number Publication date
CA1157298A (en) 1983-11-22
FR2468981B1 (https=) 1985-02-08
FR2468981A1 (fr) 1981-05-08
JPS647483B2 (https=) 1989-02-09
JPS61179501A (ja) 1986-08-12
GB2062676B (en) 1983-11-09
KR830004650A (ko) 1983-07-16
GB2062676A (en) 1981-05-28
JPS5693303A (en) 1981-07-28
JPS606521B2 (ja) 1985-02-19
NL8006025A (nl) 1981-06-01
DE3039927A1 (de) 1981-05-14
US4298505A (en) 1981-11-03

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19801104

PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 19830416

Patent event code: PE09021S01D

PG1501 Laying open of application
PG1605 Publication of application before grant of patent

Comment text: Decision on Publication of Application

Patent event code: PG16051S01I

Patent event date: 19830817

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 19831123