KR830004650A - 진보된 안정도 및 저항의 온도계수를 갖는 저항기와 그 제조방법 - Google Patents

진보된 안정도 및 저항의 온도계수를 갖는 저항기와 그 제조방법 Download PDF

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Publication number
KR830004650A
KR830004650A KR1019800004223A KR800004223A KR830004650A KR 830004650 A KR830004650 A KR 830004650A KR 1019800004223 A KR1019800004223 A KR 1019800004223A KR 800004223 A KR800004223 A KR 800004223A KR 830004650 A KR830004650 A KR 830004650A
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KR
South Korea
Prior art keywords
resistor
manufacturing
resistance
temperature coefficient
advanced
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Application number
KR1019800004223A
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English (en)
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KR830001873B1 (ko
Inventor
거니 도펠드 윌리암
죤 세트죠 로버트
Original Assignee
클레런스 알. 페니. 쥬니어
코닝 글라스 웍스
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Publication of KR830004650A publication Critical patent/KR830004650A/ko
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Publication of KR830001873B1 publication Critical patent/KR830001873B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/06—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C3/00—Non-adjustable metal resistors made of wire or ribbon, e.g. coiled, woven or formed as grids
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49101—Applying terminal

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음

Description

진보된 안정도 및 저항의 온도계수를 갖는 저항기와 그 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
니켈, 크롬 및 실리콘의 중량퍼센트를 도시하는 삼각 좌표선도.

Claims (2)

  1. 진보된 안정도와 저항의 온도계수를 갖으며, 도면에 도시된 다각형 AB,BD, DC,CA에 의해 구분된 범위 있는 각각의 중량에 의한 농도를 갖는 니켈, 크롬과 실리콘으로 구성되는 것을 특징으로 한 진보된 안정도 및 저항의 온도계수를 갖는 저항기와 제조방법.
  2. 저항기를 제작하는 방법에 있어서, 고순도 실리콘의 첫번째 타케트를 제공하며, 크롬 니켈 합금의 두번째 타게트를 제공하며, 기질을 제공하며, 니켈, 크롬 및 실리콘의 합금을 상기 기질에 침전하기 위해 스퍼터링 가스와 전위차에 상기 첫번째 타게트와 상기 두번째 타게트를 노출하며,
    상기 합금에 있는 니켈, 크롬 및 실리콘의 중량에 의한 농도가 각각 도면에 도시된 다각형 AB,BD,DC,CA에 의해 구분된 범위인 상기 전위차에 의해 적응된 스퍼터링 힘을 조절하는 단계를 포함하는 것으로 특징된 진보된 안정도 및 저항의 온도계수를 갖는 저항기와 그 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019800004223A 1979-11-05 1980-11-04 저항체 조성물 KR830001873B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US91375 1979-11-05
US06/091,375 US4298505A (en) 1979-11-05 1979-11-05 Resistor composition and method of manufacture thereof

Publications (2)

Publication Number Publication Date
KR830004650A true KR830004650A (ko) 1983-07-16
KR830001873B1 KR830001873B1 (ko) 1983-09-15

Family

ID=22227440

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019800004223A KR830001873B1 (ko) 1979-11-05 1980-11-04 저항체 조성물

Country Status (8)

Country Link
US (1) US4298505A (ko)
JP (2) JPS606521B2 (ko)
KR (1) KR830001873B1 (ko)
CA (1) CA1157298A (ko)
DE (1) DE3039927A1 (ko)
FR (1) FR2468981A1 (ko)
GB (1) GB2062676B (ko)
NL (1) NL8006025A (ko)

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US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof
US4392992A (en) * 1981-06-30 1983-07-12 Motorola, Inc. Chromium-silicon-nitrogen resistor material
US4510178A (en) * 1981-06-30 1985-04-09 Motorola, Inc. Thin film resistor material and method
US4591821A (en) * 1981-06-30 1986-05-27 Motorola, Inc. Chromium-silicon-nitrogen thin film resistor and apparatus
JPS5884406A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 薄膜抵抗体の製造方法
JPS5884401A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 抵抗体
JPS58119601A (ja) * 1982-01-08 1983-07-16 株式会社東芝 抵抗体
JPS58153752A (ja) * 1982-03-08 1983-09-12 Takeshi Masumoto Ｎｉ−Ｃｒ系合金材料
JPS597234A (ja) * 1982-07-05 1984-01-14 Aisin Seiki Co Ltd 圧力センサ
US4433269A (en) * 1982-11-22 1984-02-21 Burroughs Corporation Air fireable ink
JPS6212325U (ko) * 1985-07-08 1987-01-26
JPH03148945A (ja) * 1989-11-06 1991-06-25 Nitsuko Corp コードレス電話機
DE4207220A1 (de) * 1992-03-07 1993-09-09 Philips Patentverwaltung Festkoerperelement fuer eine thermionische kathode
US5354509A (en) * 1993-10-26 1994-10-11 Cts Corporation Base metal resistors
US5518521A (en) * 1993-11-08 1996-05-21 Cts Corporation Process of producing a low TCR surge resistor using a nickel chromium alloy
WO1998011567A1 (en) * 1996-09-13 1998-03-19 Philips Electronics N.V. Thin-film resistor and resistance material for a thin-film resistor
DE10153217B4 (de) * 2001-10-31 2007-01-18 Heraeus Sensor Technology Gmbh Manteldraht, insbesondere Anschlussdraht für elektrische Temperatursensoren
US20040091255A1 (en) * 2002-11-11 2004-05-13 Eastman Kodak Company Camera flash circuit with adjustable flash illumination intensity
JP4760177B2 (ja) * 2005-07-14 2011-08-31 パナソニック株式会社 薄膜チップ形電子部品およびその製造方法
US10427277B2 (en) 2011-04-05 2019-10-01 Ingersoll-Rand Company Impact wrench having dynamically tuned drive components and method thereof
US9879339B2 (en) * 2012-03-20 2018-01-30 Southwest Research Institute Nickel-chromium-silicon based coatings
WO2016027692A1 (ja) * 2014-08-18 2016-02-25 株式会社村田製作所 電子部品および電子部品の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462723A (en) * 1966-03-23 1969-08-19 Mallory & Co Inc P R Metal-alloy film resistor and method of making same
US3477935A (en) * 1966-06-07 1969-11-11 Union Carbide Corp Method of forming thin film resistors by cathodic sputtering
DE1765091C3 (de) * 1968-04-01 1974-06-06 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung eines hochkonstanten Metallschichtwiderstandselementes
US3591479A (en) * 1969-05-08 1971-07-06 Ibm Sputtering process for preparing stable thin film resistors
NL7102290A (ko) * 1971-02-20 1972-08-22
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
US4073971A (en) * 1973-07-31 1978-02-14 Nobuo Yasujima Process of manufacturing terminals of a heat-proof metallic thin film resistor
US4204935A (en) * 1976-02-10 1980-05-27 Resista Fabrik Elektrischer Widerstande G.M.B.H. Thin-film resistor and process for the production thereof
US4100524A (en) * 1976-05-06 1978-07-11 Gould Inc. Electrical transducer and method of making
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof

Also Published As

Publication number Publication date
GB2062676B (en) 1983-11-09
DE3039927A1 (de) 1981-05-14
NL8006025A (nl) 1981-06-01
CA1157298A (en) 1983-11-22
JPS606521B2 (ja) 1985-02-19
KR830001873B1 (ko) 1983-09-15
FR2468981B1 (ko) 1985-02-08
JPS647483B2 (ko) 1989-02-09
JPS5693303A (en) 1981-07-28
US4298505A (en) 1981-11-03
FR2468981A1 (fr) 1981-05-08
JPS61179501A (ja) 1986-08-12
GB2062676A (en) 1981-05-28

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