KR20220064957A - 감광성 경화성 조성물, 드라이 필름, 경화물, 및 전자 부품 - Google Patents

감광성 경화성 조성물, 드라이 필름, 경화물, 및 전자 부품 Download PDF

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Publication number
KR20220064957A
KR20220064957A KR1020227007109A KR20227007109A KR20220064957A KR 20220064957 A KR20220064957 A KR 20220064957A KR 1020227007109 A KR1020227007109 A KR 1020227007109A KR 20227007109 A KR20227007109 A KR 20227007109A KR 20220064957 A KR20220064957 A KR 20220064957A
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South Korea
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compound
composition
curable composition
group
film
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KR1020227007109A
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English (en)
Korean (ko)
Inventor
마코토 하야시
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다이요 홀딩스 가부시키가이샤
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Publication of KR20220064957A publication Critical patent/KR20220064957A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials For Photolithography (AREA)
KR1020227007109A 2019-09-18 2019-09-18 감광성 경화성 조성물, 드라이 필름, 경화물, 및 전자 부품 KR20220064957A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/036648 WO2021053773A1 (ja) 2019-09-18 2019-09-18 感光性硬化性組成物、ドライフィルム、硬化物、および電子部品

Publications (1)

Publication Number Publication Date
KR20220064957A true KR20220064957A (ko) 2022-05-19

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Family Applications (1)

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KR1020227007109A KR20220064957A (ko) 2019-09-18 2019-09-18 감광성 경화성 조성물, 드라이 필름, 경화물, 및 전자 부품

Country Status (4)

Country Link
JP (1) JP7420821B2 (zh)
KR (1) KR20220064957A (zh)
CN (1) CN114364717A (zh)
WO (1) WO2021053773A1 (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017179307A (ja) 2016-03-31 2017-10-05 日立化成株式会社 カルボジイミド化合物、樹脂組成物、プリプレグ、樹脂シート及び積層板

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5087547A (en) * 1990-03-02 1992-02-11 Union Carbide Chemicals & Plastics Technology Corporation Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer
JPH08314141A (ja) * 1995-05-22 1996-11-29 Nitto Denko Corp 耐熱性フォトレジスト組成物および感光性基材、並びにネガ型パターン形成方法
JP3766288B2 (ja) * 2000-03-31 2006-04-12 株式会社東芝 複合部材の製造方法及び電子パッケージ
JP5303854B2 (ja) 2006-10-24 2013-10-02 日立化成株式会社 新規なセミｉｐｎ型複合体の熱硬化性樹脂組成物並びにこれを用いたワニス、プリプレグ及び金属張積層板
JP4849362B2 (ja) 2008-03-14 2012-01-11 ナガセケムテックス株式会社 感放射線性樹脂組成物
JP5334755B2 (ja) 2009-08-31 2013-11-06 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の形成方法、有機ｅｌ表示装置、及び、液晶表示装置
JP7007792B2 (ja) * 2015-09-30 2022-01-25 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP2019028316A (ja) 2017-07-31 2019-02-21 太陽ホールディングス株式会社 感光性樹脂組成物、ドライフィルム、硬化物、プリント配線板および半導体素子

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017179307A (ja) 2016-03-31 2017-10-05 日立化成株式会社 カルボジイミド化合物、樹脂組成物、プリプレグ、樹脂シート及び積層板

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WO2021053773A1 (ja) 2021-03-25
CN114364717A (zh) 2022-04-15
JPWO2021053773A1 (zh) 2021-03-25
JP7420821B2 (ja) 2024-01-23

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