JPWO2021053773A1 - - Google Patents

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Publication number
JPWO2021053773A1
JPWO2021053773A1 JP2021546122A JP2021546122A JPWO2021053773A1 JP WO2021053773 A1 JPWO2021053773 A1 JP WO2021053773A1 JP 2021546122 A JP2021546122 A JP 2021546122A JP 2021546122 A JP2021546122 A JP 2021546122A JP WO2021053773 A1 JPWO2021053773 A1 JP WO2021053773A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021546122A
Other languages
Japanese (ja)
Other versions
JP7420821B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021053773A1 publication Critical patent/JPWO2021053773A1/ja
Application granted granted Critical
Publication of JP7420821B2 publication Critical patent/JP7420821B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials For Photolithography (AREA)
JP2021546122A 2019-09-18 2019-09-18 感光性硬化性組成物、ドライフィルム、硬化物、および電子部品 Active JP7420821B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/036648 WO2021053773A1 (ja) 2019-09-18 2019-09-18 感光性硬化性組成物、ドライフィルム、硬化物、および電子部品

Publications (2)

Publication Number Publication Date
JPWO2021053773A1 true JPWO2021053773A1 (zh) 2021-03-25
JP7420821B2 JP7420821B2 (ja) 2024-01-23

Family

ID=74884418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021546122A Active JP7420821B2 (ja) 2019-09-18 2019-09-18 感光性硬化性組成物、ドライフィルム、硬化物、および電子部品

Country Status (4)

Country Link
JP (1) JP7420821B2 (zh)
KR (1) KR20220064957A (zh)
CN (1) CN114364717A (zh)
WO (1) WO2021053773A1 (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04217250A (ja) * 1990-03-02 1992-08-07 Union Carbide Chem & Plast Co Inc ノボラックフォトレジストとカルボジイミドを用いた二色調像
JPH08314141A (ja) * 1995-05-22 1996-11-29 Nitto Denko Corp 耐熱性フォトレジスト組成物および感光性基材、並びにネガ型パターン形成方法
JP2001345537A (ja) * 2000-03-31 2001-12-14 Toshiba Corp 複合部材の製造方法、感光性組成物、複合部材製造用の絶縁体、複合部材、多層配線基板及び電子パッケージ
JP2009222923A (ja) * 2008-03-14 2009-10-01 Nagase Chemtex Corp 感放射線性樹脂組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5303854B2 (ja) 2006-10-24 2013-10-02 日立化成株式会社 新規なセミｉｐｎ型複合体の熱硬化性樹脂組成物並びにこれを用いたワニス、プリプレグ及び金属張積層板
JP5334755B2 (ja) 2009-08-31 2013-11-06 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の形成方法、有機ｅｌ表示装置、及び、液晶表示装置
JP7007792B2 (ja) * 2015-09-30 2022-01-25 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
JP2017179307A (ja) 2016-03-31 2017-10-05 日立化成株式会社 カルボジイミド化合物、樹脂組成物、プリプレグ、樹脂シート及び積層板
JP2019028316A (ja) 2017-07-31 2019-02-21 太陽ホールディングス株式会社 感光性樹脂組成物、ドライフィルム、硬化物、プリント配線板および半導体素子

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04217250A (ja) * 1990-03-02 1992-08-07 Union Carbide Chem & Plast Co Inc ノボラックフォトレジストとカルボジイミドを用いた二色調像
JPH08314141A (ja) * 1995-05-22 1996-11-29 Nitto Denko Corp 耐熱性フォトレジスト組成物および感光性基材、並びにネガ型パターン形成方法
JP2001345537A (ja) * 2000-03-31 2001-12-14 Toshiba Corp 複合部材の製造方法、感光性組成物、複合部材製造用の絶縁体、複合部材、多層配線基板及び電子パッケージ
JP2009222923A (ja) * 2008-03-14 2009-10-01 Nagase Chemtex Corp 感放射線性樹脂組成物

Also Published As

Publication number Publication date
CN114364717A (zh) 2022-04-15
JP7420821B2 (ja) 2024-01-23
WO2021053773A1 (ja) 2021-03-25
KR20220064957A (ko) 2022-05-19

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