KR20170102256A - 진공 펌핑 장치에 있어서의 또는 그와 관련된 개선 - Google Patents

진공 펌핑 장치에 있어서의 또는 그와 관련된 개선 Download PDF

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Publication number
KR20170102256A
KR20170102256A KR1020177018523A KR20177018523A KR20170102256A KR 20170102256 A KR20170102256 A KR 20170102256A KR 1020177018523 A KR1020177018523 A KR 1020177018523A KR 20177018523 A KR20177018523 A KR 20177018523A KR 20170102256 A KR20170102256 A KR 20170102256A
Authority
KR
South Korea
Prior art keywords
vacuum
fluid communication
common
pumping
pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020177018523A
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English (en)
Korean (ko)
Inventor
니겔 폴 쇼필드
앤드류 시레이
잭 레이몬드 태터살
닐 터너
Original Assignee
에드워즈 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에드워즈 리미티드 filed Critical 에드워즈 리미티드
Publication of KR20170102256A publication Critical patent/KR20170102256A/ko
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F04C23/003—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle having complementary function
    • H01L21/205—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K15/00—Check valves

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Drying Of Semiconductors (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
KR1020177018523A 2015-01-06 2016-01-06 진공 펌핑 장치에 있어서의 또는 그와 관련된 개선 Withdrawn KR20170102256A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB1500133.2 2015-01-06
GB1500133.2A GB2533933A (en) 2015-01-06 2015-01-06 Improvements in or relating to vacuum pumping arrangements
GB1600201.6 2016-01-06
PCT/GB2016/050018 WO2016110694A1 (en) 2015-01-06 2016-01-06 Improvements in or relating to vacuum pumping arrangements
GB1600201.6A GB2536336B (en) 2015-01-06 2016-01-06 Improvements in or relating to vacuum pumping arrangements

Publications (1)

Publication Number Publication Date
KR20170102256A true KR20170102256A (ko) 2017-09-08

Family

ID=55129989

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020177018523A Withdrawn KR20170102256A (ko) 2015-01-06 2016-01-06 진공 펌핑 장치에 있어서의 또는 그와 관련된 개선
KR1020177018524A Active KR102504078B1 (ko) 2015-01-06 2016-01-06 진공 배기 시스템 및 이 진공 배기 시스템에 사용되는 채널 전환 밸브

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020177018524A Active KR102504078B1 (ko) 2015-01-06 2016-01-06 진공 배기 시스템 및 이 진공 배기 시스템에 사용되는 채널 전환 밸브

Country Status (8)

Country Link
US (2) US10309401B2 (cg-RX-API-DMAC7.html)
EP (2) EP3243005B1 (cg-RX-API-DMAC7.html)
JP (2) JP6924147B2 (cg-RX-API-DMAC7.html)
KR (2) KR20170102256A (cg-RX-API-DMAC7.html)
CN (2) CN107110162B (cg-RX-API-DMAC7.html)
GB (2) GB2533933A (cg-RX-API-DMAC7.html)
SG (1) SG11201705287WA (cg-RX-API-DMAC7.html)
WO (2) WO2016110695A1 (cg-RX-API-DMAC7.html)

Cited By (1)

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KR20210045605A (ko) * 2019-10-17 2021-04-27 무진전자 주식회사 챔버 배기량 자동 조절 시스템

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WO2015182699A1 (ja) * 2014-05-30 2015-12-03 株式会社 荏原製作所 真空排気システム
GB201620225D0 (en) 2016-11-29 2017-01-11 Edwards Ltd Vacuum pumping arrangement
GB2561899B (en) * 2017-04-28 2020-11-04 Edwards Ltd Vacuum pumping system
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WO2020069206A1 (en) * 2018-09-28 2020-04-02 Lam Research Corporation Vacuum pump protection against deposition byproduct buildup
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GB2592346B (en) * 2020-01-09 2022-11-02 Edwards Ltd Vacuum pump and vacuum pump set for evacuating a semiconductor processing chamber
GB2592043A (en) * 2020-02-13 2021-08-18 Edwards Ltd Axial flow vacuum pump
FR3112086B1 (fr) * 2020-07-09 2022-07-08 Pfeiffer Vacuum Dispositif de traitement des gaz et ligne de vide
FR3112177B1 (fr) * 2020-07-09 2022-07-08 Pfeiffer Vacuum Ligne de vide et procédé de contrôle d’une ligne de vide
GB2603892A (en) * 2021-02-03 2022-08-24 Edwards Ltd Pump apparatus and system
GB2606193B (en) * 2021-04-29 2023-09-06 Edwards Ltd A valve module for a vacuum pumping system
JP7374158B2 (ja) * 2021-10-15 2023-11-06 株式会社荏原製作所 生成物除去装置、処理システム及び生成物除去方法
US12391011B2 (en) * 2022-11-10 2025-08-19 The Boeing Company Double vacuum debulk processing

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210045605A (ko) * 2019-10-17 2021-04-27 무진전자 주식회사 챔버 배기량 자동 조절 시스템

Also Published As

Publication number Publication date
JP6924147B2 (ja) 2021-08-25
US20170350395A1 (en) 2017-12-07
US10309401B2 (en) 2019-06-04
CN107110162B (zh) 2019-07-16
WO2016110695A1 (en) 2016-07-14
GB201600201D0 (en) 2016-02-17
EP3243005B1 (en) 2019-08-28
GB2536336A (en) 2016-09-14
EP3247907B1 (en) 2019-05-01
JP2018501437A (ja) 2018-01-18
US20180003178A1 (en) 2018-01-04
CN107110161B (zh) 2019-09-13
EP3247907A1 (en) 2017-11-29
GB2533933A (en) 2016-07-13
GB2536336B (en) 2018-06-20
CN107110161A (zh) 2017-08-29
WO2016110694A1 (en) 2016-07-14
JP2018503027A (ja) 2018-02-01
EP3243005A1 (en) 2017-11-15
KR102504078B1 (ko) 2023-02-24
SG11201705287WA (en) 2017-07-28
CN107110162A (zh) 2017-08-29
KR20170102257A (ko) 2017-09-08

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PA0105 International application

Patent event date: 20170704

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination