KR20160113610A - 3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 - Google Patents
3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 Download PDFInfo
- Publication number
- KR20160113610A KR20160113610A KR1020167020060A KR20167020060A KR20160113610A KR 20160113610 A KR20160113610 A KR 20160113610A KR 1020167020060 A KR1020167020060 A KR 1020167020060A KR 20167020060 A KR20167020060 A KR 20167020060A KR 20160113610 A KR20160113610 A KR 20160113610A
- Authority
- KR
- South Korea
- Prior art keywords
- chromium
- acid
- electroplating bath
- salt
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000011651 chromium Substances 0.000 title claims abstract description 47
- 238000009713 electroplating Methods 0.000 title claims abstract description 45
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 39
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000000151 deposition Methods 0.000 title claims abstract description 19
- 230000008569 process Effects 0.000 title description 3
- -1 halogen salt Chemical class 0.000 claims abstract description 18
- 150000001844 chromium Chemical class 0.000 claims abstract description 17
- 239000008139 complexing agent Substances 0.000 claims abstract description 16
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000000654 additive Substances 0.000 claims abstract description 7
- 239000012528 membrane Substances 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 15
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 8
- 239000011696 chromium(III) sulphate Substances 0.000 claims description 8
- 235000015217 chromium(III) sulphate Nutrition 0.000 claims description 8
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 8
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 150000001450 anions Chemical class 0.000 claims description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 6
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical class [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000004327 boric acid Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 238000005341 cation exchange Methods 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 4
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 235000015165 citric acid Nutrition 0.000 claims description 4
- 235000019253 formic acid Nutrition 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims description 4
- 239000000080 wetting agent Substances 0.000 claims description 4
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 claims description 3
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 3
- 235000011054 acetic acid Nutrition 0.000 claims description 3
- 239000002280 amphoteric surfactant Substances 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 150000003842 bromide salts Chemical class 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 239000000788 chromium alloy Substances 0.000 claims description 3
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 claims description 3
- 239000011636 chromium(III) chloride Substances 0.000 claims description 3
- 235000007831 chromium(III) chloride Nutrition 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 235000019260 propionic acid Nutrition 0.000 claims description 3
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims description 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims description 2
- 239000004471 Glycine Substances 0.000 claims description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 claims description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 claims description 2
- 125000000129 anionic group Chemical group 0.000 claims description 2
- 235000003704 aspartic acid Nutrition 0.000 claims description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 claims description 2
- 150000001642 boronic acid derivatives Chemical class 0.000 claims description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 2
- 125000002091 cationic group Chemical group 0.000 claims description 2
- 239000003093 cationic surfactant Substances 0.000 claims description 2
- 150000003841 chloride salts Chemical class 0.000 claims description 2
- OIDPCXKPHYRNKH-UHFFFAOYSA-J chrome alum Chemical compound [K]OS(=O)(=O)O[Cr]1OS(=O)(=O)O1 OIDPCXKPHYRNKH-UHFFFAOYSA-J 0.000 claims description 2
- MURRHPKQJKICNT-UHFFFAOYSA-K chromium(3+) methanesulfonate Chemical compound [Cr+3].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O MURRHPKQJKICNT-UHFFFAOYSA-K 0.000 claims description 2
- QYHKPQCMTYXLIA-UHFFFAOYSA-K chromium(3+);2-hydroxyacetate Chemical compound [Cr+3].OCC([O-])=O.OCC([O-])=O.OCC([O-])=O QYHKPQCMTYXLIA-UHFFFAOYSA-K 0.000 claims description 2
- XHFVDZNDZCNTLT-UHFFFAOYSA-H chromium(3+);tricarbonate Chemical compound [Cr+3].[Cr+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O XHFVDZNDZCNTLT-UHFFFAOYSA-H 0.000 claims description 2
- QOWZHEWZFLTYQP-UHFFFAOYSA-K chromium(3+);triformate Chemical compound [Cr+3].[O-]C=O.[O-]C=O.[O-]C=O QOWZHEWZFLTYQP-UHFFFAOYSA-K 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 150000004673 fluoride salts Chemical class 0.000 claims description 2
- 239000000174 gluconic acid Substances 0.000 claims description 2
- 235000012208 gluconic acid Nutrition 0.000 claims description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 239000001630 malic acid Substances 0.000 claims description 2
- 235000011090 malic acid Nutrition 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 235000006408 oxalic acid Nutrition 0.000 claims description 2
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 1
- ZGDGIUMTVRHHKI-UHFFFAOYSA-K chromium(3+);hydrogen carbonate Chemical compound [Cr+3].OC([O-])=O.OC([O-])=O.OC([O-])=O ZGDGIUMTVRHHKI-UHFFFAOYSA-K 0.000 claims 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 claims 1
- 239000004310 lactic acid Substances 0.000 claims 1
- 235000014655 lactic acid Nutrition 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 claims 1
- 239000001384 succinic acid Substances 0.000 claims 1
- 239000003792 electrolyte Substances 0.000 description 12
- 238000007747 plating Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 9
- 238000004070 electrodeposition Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 6
- 230000008901 benefit Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000003014 ion exchange membrane Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- BFGKITSFLPAWGI-UHFFFAOYSA-N chromium(3+) Chemical compound [Cr+3] BFGKITSFLPAWGI-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002659 electrodeposit Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229920000557 Nafion® Polymers 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 239000003011 anion exchange membrane Substances 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000002159 nanocrystal Substances 0.000 description 2
- XBBVURRQGJPTHH-UHFFFAOYSA-N 2-hydroxyacetic acid;2-hydroxypropanoic acid Chemical compound OCC(O)=O.CC(O)C(O)=O XBBVURRQGJPTHH-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- GJJSXZANHOOBIW-UHFFFAOYSA-H C(C)(=O)[O-].[Cr+3].[Cr+3].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-] Chemical compound C(C)(=O)[O-].[Cr+3].[Cr+3].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-] GJJSXZANHOOBIW-UHFFFAOYSA-H 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052500 inorganic mineral Chemical class 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000011707 mineral Chemical class 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 description 1
- 229920002113 octoxynol Polymers 0.000 description 1
- JLFNLZLINWHATN-UHFFFAOYSA-N pentaethylene glycol Chemical compound OCCOCCOCCOCCOCCO JLFNLZLINWHATN-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- MKWYFZFMAMBPQK-UHFFFAOYSA-J sodium feredetate Chemical compound [Na+].[Fe+3].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O MKWYFZFMAMBPQK-UHFFFAOYSA-J 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020217037970A KR102430755B1 (ko) | 2014-01-24 | 2015-01-26 | 3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14152463.7 | 2014-01-24 | ||
EP14152463.7A EP2899299A1 (en) | 2014-01-24 | 2014-01-24 | Electroplating bath containing trivalent chromium and process for depositing chromium |
PCT/EP2015/051469 WO2015110627A1 (en) | 2014-01-24 | 2015-01-26 | Electroplating bath containing trivalent chromium and process for depositing chromium |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020217037970A Division KR102430755B1 (ko) | 2014-01-24 | 2015-01-26 | 3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20160113610A true KR20160113610A (ko) | 2016-09-30 |
Family
ID=49989624
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167020060A Ceased KR20160113610A (ko) | 2014-01-24 | 2015-01-26 | 3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 |
KR1020217037970A Active KR102430755B1 (ko) | 2014-01-24 | 2015-01-26 | 3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020217037970A Active KR102430755B1 (ko) | 2014-01-24 | 2015-01-26 | 3가 크롬을 포함하는 전기도금배스 및 크롬 증착 공정 |
Country Status (12)
Country | Link |
---|---|
US (2) | US10619258B2 (en:Method) |
EP (2) | EP2899299A1 (en:Method) |
JP (1) | JP6534391B2 (en:Method) |
KR (2) | KR20160113610A (en:Method) |
CN (2) | CN113818053B (en:Method) |
BR (1) | BR112016016834B1 (en:Method) |
CA (1) | CA2935934C (en:Method) |
ES (1) | ES2944135T3 (en:Method) |
HU (1) | HUE061836T2 (en:Method) |
MX (1) | MX383305B (en:Method) |
PL (1) | PL3097222T3 (en:Method) |
WO (1) | WO2015110627A1 (en:Method) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102350114B1 (ko) * | 2020-08-03 | 2022-01-10 | 김근호 | 친환경 알루미늄 전해 크로메이트 처리방법 |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2899299A1 (en) | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Electroplating bath containing trivalent chromium and process for depositing chromium |
GB2534883A (en) * | 2015-02-03 | 2016-08-10 | Univ Leicester | Electrolyte for electroplating |
WO2017042420A1 (en) * | 2015-09-09 | 2017-03-16 | Savroc Ltd | Chromium-based coating, a method for producing a chromium-based coating and a coated object |
US10270691B2 (en) * | 2016-02-29 | 2019-04-23 | Cisco Technology, Inc. | System and method for dataplane-signaled packet capture in a segment routing environment |
FR3051806B1 (fr) * | 2016-05-31 | 2018-06-01 | Safran Aircraft Engines | Procede de chromage par voie electrolytique d'un substrat a partir d'un bain de chrome trivalent |
EP3382062A1 (en) | 2017-03-31 | 2018-10-03 | COVENTYA S.p.A. | Method for increasing the corrosion resistance of a chrome-plated substrate |
FI3607116T3 (fi) * | 2017-04-04 | 2023-03-30 | Atotech Deutschland Gmbh & Co Kg | Menetelmä kromi- tai kromiseoskerroksen pinnoittamiseksi elektrolyyttisesti ainakin yhdelle alustalle |
PL3607115T3 (pl) * | 2017-04-04 | 2022-10-03 | Atotech Deutschland GmbH & Co. KG | Kontrolowany sposób osadzania warstwy chromu albo stopu chromu na co najmniej jednym podłożu |
CN108130570A (zh) * | 2017-12-15 | 2018-06-08 | 北京科技大学 | 一种复合三价电镀铬工艺 |
CN109056005A (zh) * | 2018-09-11 | 2018-12-21 | 沈阳飞机工业(集团)有限公司 | 一种应用电沉积技术制备铬硼合金的方法 |
FR3087209B1 (fr) | 2018-10-12 | 2022-11-04 | Mecaprotec Ind | Composition pour le chromage d’un substrat et procede de chromage mettant en œuvre une telle composition |
WO2020079215A1 (en) * | 2018-10-19 | 2020-04-23 | Atotech Deutschland Gmbh | A method for electrolytically passivating a surface of silver, silver alloy, gold, or gold alloy |
WO2020120537A1 (en) * | 2018-12-11 | 2020-06-18 | Atotech Deutschland Gmbh | A method for depositing a chromium or chromium alloy layer and plating apparatus |
EP3744874A1 (en) | 2019-05-29 | 2020-12-02 | Coventya SAS | Electroplated product with corrosion-resistant coating |
CN114829677A (zh) * | 2019-12-18 | 2022-07-29 | 德国艾托特克有限两合公司 | 电镀组合物和在衬底上沉积铬涂层的方法 |
WO2021123059A1 (en) | 2019-12-18 | 2021-06-24 | Atotech Deutschland Gmbh | Method for reducing the concentration of iron ions in a trivalent chromium eletroplating bath |
RU2734986C1 (ru) * | 2020-03-23 | 2020-10-27 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д. И. Менделеева" (РХТУ им. Д. И. Менделеева) | Способ электрохимического нанесения хромовых покрытий из саморегулирующегося электролита на основе соединений трехвалентного хрома |
FI129420B (en) * | 2020-04-23 | 2022-02-15 | Savroc Ltd | AQUATIC ELECTRIC COATING BATH |
EP4182495B1 (en) | 2020-07-15 | 2024-09-04 | Tata Steel Nederland Technology B.V. | Method for electrodepositing a functional or decorative chromium layer from a trivalent chromium electrolyte |
CN112226791A (zh) * | 2020-10-26 | 2021-01-15 | 厦门市金宝源实业有限公司 | 一种三价铬镀铬液及其制备方法以及三价铬镀铬方法 |
EP4023793A1 (en) * | 2021-01-05 | 2022-07-06 | Coventya SAS | Electroplating bath for depositing chromium or chromium alloy from a trivalent chromium bath and process for depositing chromium or chromium alloy |
EP4151779A1 (de) * | 2021-09-15 | 2023-03-22 | Trivalent Oberflächentechnik GmbH | Chrom-indium-, chrom-bismut- und chrom-antimon-beschichtung, verfahren zur herstellung und verwendung |
CN113735172B (zh) * | 2021-10-08 | 2023-04-07 | 上海良仁化工有限公司 | 含铬污泥制备细颗粒氢氧化铬的方法 |
CN114875459A (zh) * | 2022-05-10 | 2022-08-09 | 成立航空股份有限公司 | 一种三价铬镀液及黑铬镀层 |
DE102022129788A1 (de) * | 2022-11-10 | 2024-05-16 | Dornbracht AG & Co. KG. | Sanitärgegenstand, insbesondere Sanitärarmatur oder -garnitur |
CN115928108B (zh) * | 2022-12-23 | 2023-08-01 | 中国科学院青海盐湖研究所 | 电化学氧化铬铁直接制备三价铬化合物的方法 |
EP4570965A1 (de) * | 2023-12-15 | 2025-06-18 | topocrom systems AG | Vorrichtung und verfahren zur galvanischen chrom-abscheidung |
DE102024105074A1 (de) * | 2024-02-22 | 2025-08-28 | Trivalent Oberflächentechnik Gmbh | Verfahren zur wenigstens teilweisen Beschichtung eines Substrats mit einer dreiwertigen Chromschicht |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1247803C2 (de) * | 1959-10-07 | 1973-03-29 | Du Pont | Verfahren zur herstellung von selbsttragenden metallverbundfalmen durch galvaniscles abscheiden |
GB1368747A (en) * | 1971-11-23 | 1974-10-02 | British Non Ferrous Metals Res | Electrodeposition of chromium |
US4062737A (en) * | 1974-12-11 | 1977-12-13 | International Business Machines Corporation | Electrodeposition of chromium |
US4107004A (en) * | 1975-03-26 | 1978-08-15 | International Lead Zinc Research Organization, Inc. | Trivalent chromium electroplating baths and method |
GB1488381A (en) * | 1975-09-01 | 1977-10-12 | Bnf Metals Tech Centre | Trivalent chromium plating bath |
US4093521A (en) * | 1975-12-18 | 1978-06-06 | Stanley Renton | Chromium electroplating |
JPS53106348A (en) * | 1977-02-28 | 1978-09-16 | Toyo Soda Mfg Co Ltd | Electrolytic bath for chromium plating |
GB1580137A (en) * | 1977-05-24 | 1980-11-26 | Bnf Metals Tech Centre | Electrolytic deposition of protective chromite-containing coatings |
AU513298B2 (en) * | 1978-06-02 | 1980-11-27 | International Lead Zinc Research Organization Inc. | Electrodeposition of black chromium |
US4477318A (en) * | 1980-11-10 | 1984-10-16 | Omi International Corporation | Trivalent chromium electrolyte and process employing metal ion reducing agents |
US4392922A (en) * | 1980-11-10 | 1983-07-12 | Occidental Chemical Corporation | Trivalent chromium electrolyte and process employing vanadium reducing agent |
GB2109816B (en) * | 1981-11-18 | 1985-01-23 | Ibm | Electrodeposition of chromium |
GB2109817B (en) * | 1981-11-18 | 1985-07-03 | Ibm | Electrodeposition of chromium |
US4466865A (en) * | 1982-01-11 | 1984-08-21 | Omi International Corporation | Trivalent chromium electroplating process |
US4806446A (en) * | 1986-04-09 | 1989-02-21 | Brother Kogyo Kabushiki Kaisha | Photosensitive recording medium capable of image contrast adjustment |
US4804446A (en) | 1986-09-19 | 1989-02-14 | The United States Of America As Represented By The Secretary Of Commerce | Electrodeposition of chromium from a trivalent electrolyte |
US5196109A (en) * | 1991-08-01 | 1993-03-23 | Geoffrey Scott | Trivalent chromium electrolytes and plating processes employing same |
US5415763A (en) * | 1993-08-18 | 1995-05-16 | The United States Of America As Represented By The Secretary Of Commerce | Methods and electrolyte compositions for electrodepositing chromium coatings |
US6004448A (en) * | 1995-06-06 | 1999-12-21 | Atotech Usa, Inc. | Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer |
SG53086A1 (en) * | 1997-09-29 | 1998-09-28 | Univ Singapore | A novel method of decorative chromium plating from trivalent chromium |
US6663700B1 (en) * | 2000-10-31 | 2003-12-16 | The United States Of America As Represented By The Secretary Of The Navy | Post-treatment for metal coated substrates |
KR100572486B1 (ko) * | 2003-11-29 | 2006-04-19 | 테크앤라이프 주식회사 | 3가 크롬도금액 조성물과 그 제조방법 |
FR2864553B1 (fr) | 2003-12-31 | 2006-09-01 | Coventya | Installation de depot de zinc ou d'alliages de zinc |
EP2111484B1 (en) | 2004-03-04 | 2017-12-06 | Taskem Inc. | Polyamine brightening agent |
CA2647571C (en) * | 2006-03-31 | 2015-02-17 | Atotech Deutschland Gmbh | Crystalline chromium deposit |
DE102006035871B3 (de) | 2006-08-01 | 2008-03-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Abscheidung von Chromschichten als Hartverchromung, Galvanisierungsbad sowie hartverchromte Oberflächen und deren Verwendung |
US20080169199A1 (en) * | 2007-01-17 | 2008-07-17 | Chang Gung University | Trivalent chromium electroplating solution and an electroplating process with the solution |
WO2009046181A1 (en) | 2007-10-02 | 2009-04-09 | Atotech Deutschland Gmbh | Crystalline chromium alloy deposit |
CN101565827A (zh) * | 2009-05-31 | 2009-10-28 | 广州民航职业技术学院 | 一种适用于镀锌层表面的高耐蚀有机三价铬钝化方法 |
CN101665960A (zh) * | 2009-09-04 | 2010-03-10 | 厦门大学 | 一种硫酸盐三价铬电镀液与制备方法 |
CN101748449A (zh) * | 2010-01-19 | 2010-06-23 | 上海应用技术学院 | 一种用三价铬镀铬的方法 |
EP2492372A1 (en) * | 2011-02-23 | 2012-08-29 | Enthone, Inc. | Aqueous solution and method for the formation of a passivation layer |
CN102383150B (zh) * | 2011-11-09 | 2014-08-20 | 广东达志环保科技股份有限公司 | 一种高耐蚀环保三价铬电镀液及其电镀方法 |
US9758884B2 (en) * | 2012-02-16 | 2017-09-12 | Stacey Hingley | Color control of trivalent chromium deposits |
US20130220819A1 (en) | 2012-02-27 | 2013-08-29 | Faraday Technology, Inc. | Electrodeposition of chromium from trivalent chromium using modulated electric fields |
CN103993303A (zh) * | 2013-02-17 | 2014-08-20 | 武汉风帆电镀技术股份有限公司 | 铝及铝合金的三价铬耐蚀性钝化液 |
EP2899299A1 (en) | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Electroplating bath containing trivalent chromium and process for depositing chromium |
GB2534883A (en) * | 2015-02-03 | 2016-08-10 | Univ Leicester | Electrolyte for electroplating |
-
2014
- 2014-01-24 EP EP14152463.7A patent/EP2899299A1/en not_active Withdrawn
-
2015
- 2015-01-26 PL PL15701521.5T patent/PL3097222T3/pl unknown
- 2015-01-26 ES ES15701521T patent/ES2944135T3/es active Active
- 2015-01-26 HU HUE15701521A patent/HUE061836T2/hu unknown
- 2015-01-26 KR KR1020167020060A patent/KR20160113610A/ko not_active Ceased
- 2015-01-26 US US15/113,682 patent/US10619258B2/en active Active
- 2015-01-26 BR BR112016016834-8A patent/BR112016016834B1/pt active IP Right Grant
- 2015-01-26 JP JP2016548141A patent/JP6534391B2/ja active Active
- 2015-01-26 CA CA2935934A patent/CA2935934C/en active Active
- 2015-01-26 CN CN202111217662.0A patent/CN113818053B/zh active Active
- 2015-01-26 EP EP15701521.5A patent/EP3097222B1/en active Active
- 2015-01-26 CN CN201580004384.7A patent/CN105917031B/zh active Active
- 2015-01-26 MX MX2016009533A patent/MX383305B/es unknown
- 2015-01-26 WO PCT/EP2015/051469 patent/WO2015110627A1/en active Application Filing
- 2015-01-26 KR KR1020217037970A patent/KR102430755B1/ko active Active
-
2020
- 2020-03-04 US US16/808,948 patent/US11905613B2/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102350114B1 (ko) * | 2020-08-03 | 2022-01-10 | 김근호 | 친환경 알루미늄 전해 크로메이트 처리방법 |
Also Published As
Publication number | Publication date |
---|---|
US20170009361A1 (en) | 2017-01-12 |
CN113818053A (zh) | 2021-12-21 |
CN105917031A (zh) | 2016-08-31 |
US20200308723A1 (en) | 2020-10-01 |
BR112016016834A2 (en:Method) | 2017-08-08 |
US11905613B2 (en) | 2024-02-20 |
PL3097222T3 (pl) | 2023-05-29 |
KR102430755B1 (ko) | 2022-08-10 |
JP6534391B2 (ja) | 2019-06-26 |
CA2935934C (en) | 2022-03-01 |
CA2935934A1 (en) | 2015-07-30 |
JP2017503926A (ja) | 2017-02-02 |
US10619258B2 (en) | 2020-04-14 |
HUE061836T2 (hu) | 2023-08-28 |
EP3097222B1 (en) | 2023-03-29 |
CN113818053B (zh) | 2024-07-05 |
MX2016009533A (es) | 2016-10-28 |
KR20210147081A (ko) | 2021-12-06 |
BR112016016834B1 (pt) | 2022-02-08 |
WO2015110627A1 (en) | 2015-07-30 |
MX383305B (es) | 2025-03-13 |
EP2899299A1 (en) | 2015-07-29 |
ES2944135T3 (es) | 2023-06-19 |
CN105917031B (zh) | 2021-11-02 |
EP3097222A1 (en) | 2016-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11905613B2 (en) | Electroplating bath containing trivalent chromium and process for depositing chromium | |
CN106661753B (zh) | 离子液体电解质和电沉积金属的方法 | |
EP3253906B1 (en) | Electrolyte for electroplating | |
JP2011520037A (ja) | 改良された銅−錫電解液及び青銅層の析出方法 | |
HUP0103906A2 (hu) | Alakíthatóságot javító szerek nikkel-wolfram ötvözetekhez | |
US2693444A (en) | Electrodeposition of chromium and alloys thereof | |
US20170314153A1 (en) | Trivalent chromium plating formulations and processes | |
US11732375B2 (en) | Iron tungsten coating formulations and processes | |
EP3607116B1 (en) | Method for electrolytically depositing a chromium or chromium alloy layer on at least one substrate | |
JP2009149978A (ja) | 銅−亜鉛合金電気めっき浴およびこれを用いためっき方法 | |
JPH1060683A (ja) | 電気めっき三元系亜鉛合金とその方法 | |
US1590170A (en) | Process of plating with chromium | |
KR20230121097A (ko) | 경질 은 층의 침착을 위한 은-비스무트 전해질 | |
US3920527A (en) | Self-regulating plating bath and method for electrodepositing chromium | |
US20230160083A1 (en) | Electrolyte and method for producing chromium layers | |
JP4993858B2 (ja) | タングステン−リン系合金電気めっき皮膜 | |
US4428804A (en) | High speed bright silver electroplating bath and process | |
EP2405034A1 (en) | Copper-zinc alloy electroplating bath and method of plating using same | |
RU2379381C1 (ru) | Электролит железнения | |
BR102017008137B1 (pt) | Método para cromar um substrato, e, solução eletrolítica para cromar um substrato |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0105 | International application |
Patent event date: 20160721 Patent event code: PA01051R01D Comment text: International Patent Application |
|
PG1501 | Laying open of application | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20191203 Comment text: Request for Examination of Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20210304 Patent event code: PE09021S01D |
|
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20210908 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20210304 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
|
E601 | Decision to refuse application | ||
E801 | Decision on dismissal of amendment | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20211022 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20210304 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
|
PE0801 | Dismissal of amendment |
Patent event code: PE08012E01D Comment text: Decision on Dismissal of Amendment Patent event date: 20211022 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20211008 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20210503 |
|
PA0104 | Divisional application for international application |
Comment text: Divisional Application for International Patent Patent event code: PA01041R01D Patent event date: 20211122 |