JP6534391B2 - 三価クロムを含有する電気めっき浴及びクロムを析出させる方法 - Google Patents
三価クロムを含有する電気めっき浴及びクロムを析出させる方法 Download PDFInfo
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- JP6534391B2 JP6534391B2 JP2016548141A JP2016548141A JP6534391B2 JP 6534391 B2 JP6534391 B2 JP 6534391B2 JP 2016548141 A JP2016548141 A JP 2016548141A JP 2016548141 A JP2016548141 A JP 2016548141A JP 6534391 B2 JP6534391 B2 JP 6534391B2
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- electroplating bath
- chromium
- acid
- iii
- salt
- Prior art date
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- 238000009713 electroplating Methods 0.000 title claims description 58
- 239000011651 chromium Substances 0.000 title claims description 45
- 229910052804 chromium Inorganic materials 0.000 title claims description 39
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 38
- 238000000034 method Methods 0.000 title claims description 14
- 238000000151 deposition Methods 0.000 title claims description 12
- 150000001844 chromium Chemical class 0.000 claims description 18
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 18
- 239000008139 complexing agent Substances 0.000 claims description 17
- -1 halogen salt Chemical class 0.000 claims description 17
- 239000012528 membrane Substances 0.000 claims description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 15
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 12
- 229910052736 halogen Inorganic materials 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 10
- 150000001450 anions Chemical class 0.000 claims description 10
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 10
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 10
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 claims description 9
- 238000005341 cation exchange Methods 0.000 claims description 7
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 claims description 7
- 239000011696 chromium(III) sulphate Substances 0.000 claims description 7
- 235000015217 chromium(III) sulphate Nutrition 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 6
- 235000015165 citric acid Nutrition 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 5
- 235000011054 acetic acid Nutrition 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 235000019253 formic acid Nutrition 0.000 claims description 5
- 235000019260 propionic acid Nutrition 0.000 claims description 5
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 4
- 239000004327 boric acid Substances 0.000 claims description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims description 4
- 239000000080 wetting agent Substances 0.000 claims description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 3
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 claims description 3
- 239000011636 chromium(III) chloride Substances 0.000 claims description 3
- 235000007831 chromium(III) chloride Nutrition 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 2
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 2
- 239000004471 Glycine Substances 0.000 claims description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- 238000005275 alloying Methods 0.000 claims description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 claims description 2
- 239000002280 amphoteric surfactant Substances 0.000 claims description 2
- 238000005349 anion exchange Methods 0.000 claims description 2
- 235000003704 aspartic acid Nutrition 0.000 claims description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 2
- 125000002091 cationic group Chemical group 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 239000000788 chromium alloy Substances 0.000 claims description 2
- MURRHPKQJKICNT-UHFFFAOYSA-K chromium(3+) methanesulfonate Chemical compound [Cr+3].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O MURRHPKQJKICNT-UHFFFAOYSA-K 0.000 claims description 2
- QYHKPQCMTYXLIA-UHFFFAOYSA-K chromium(3+);2-hydroxyacetate Chemical compound [Cr+3].OCC([O-])=O.OCC([O-])=O.OCC([O-])=O QYHKPQCMTYXLIA-UHFFFAOYSA-K 0.000 claims description 2
- ZGDGIUMTVRHHKI-UHFFFAOYSA-K chromium(3+);hydrogen carbonate Chemical compound [Cr+3].OC([O-])=O.OC([O-])=O.OC([O-])=O ZGDGIUMTVRHHKI-UHFFFAOYSA-K 0.000 claims description 2
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 claims description 2
- XHFVDZNDZCNTLT-UHFFFAOYSA-H chromium(3+);tricarbonate Chemical compound [Cr+3].[Cr+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O XHFVDZNDZCNTLT-UHFFFAOYSA-H 0.000 claims description 2
- QOWZHEWZFLTYQP-UHFFFAOYSA-K chromium(3+);triformate Chemical compound [Cr+3].[O-]C=O.[O-]C=O.[O-]C=O QOWZHEWZFLTYQP-UHFFFAOYSA-K 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 150000004673 fluoride salts Chemical class 0.000 claims description 2
- 239000000174 gluconic acid Substances 0.000 claims description 2
- 235000012208 gluconic acid Nutrition 0.000 claims description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 239000004310 lactic acid Substances 0.000 claims description 2
- 235000014655 lactic acid Nutrition 0.000 claims description 2
- 239000001630 malic acid Substances 0.000 claims description 2
- 235000011090 malic acid Nutrition 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 2
- 150000003464 sulfur compounds Chemical class 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 2
- 150000007942 carboxylates Chemical class 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 239000003792 electrolyte Substances 0.000 description 11
- 238000007747 plating Methods 0.000 description 10
- 238000004070 electrodeposition Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229920000557 Nafion® Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- BFGKITSFLPAWGI-UHFFFAOYSA-N chromium(3+) Chemical compound [Cr+3] BFGKITSFLPAWGI-UHFFFAOYSA-N 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000002659 electrodeposit Substances 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000002159 nanocrystal Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003011 anion exchange membrane Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000007857 degradation product Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000011707 mineral Chemical class 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 description 1
- 229920002113 octoxynol Polymers 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- MKWYFZFMAMBPQK-UHFFFAOYSA-J sodium feredetate Chemical compound [Na+].[Fe+3].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O MKWYFZFMAMBPQK-UHFFFAOYSA-J 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
a)100〜400g/Lの少なくとも1種の三価クロム塩
b)100〜400g/Lの少なくとも1種の錯化剤
c)1〜50g/Lの少なくとも1種のハロゲン塩
d)0〜10g/Lの添加剤
・上述の電気めっき浴を準備する、
・前記電気めっき浴中に基材を浸漬させる、及び
・電流を流し、前記基材上にクロムを析出させる
Claims (23)
- クロム又はクロム合金を析出させるための電気めっき浴であって、
a)100〜400g/Lの少なくとも1種の三価クロム塩、
b)100〜400g/Lの少なくとも1種の錯化剤、
c)1〜50g/Lの少なくとも1種のハロゲン塩、
d)0〜10g/Lの添加剤、
を含み、ここで、当該電気めっき浴は、4〜7のpHを有し、二価の硫黄化合物及びホウ酸、その塩及び/又は誘導体を実質的に含まず、且つ、錯化剤と三価クロム塩のモル比が、8:1〜15:1である、電気めっき浴。 - 前記三価クロム塩が、酸性又はアルカリ性形態の硫酸クロム(III)、塩化クロム(III)、酢酸クロム(III)、ヒドロキシ酢酸クロム(III)、ギ酸クロム(III)、ヒドロキシギ酸クロム(III)、炭酸クロム(III)、メタンスルホン酸クロム(III)、硫酸クロムカリウム(III)、及びそれらの混合物からなる群より選択される、請求項1に記載の電気めっき浴。
- 前記三価クロム塩が120〜160g/Lの量で存在する、請求項1または2に記載の電気めっき浴。
- 前記三価クロム塩のアニオンが、揮発性又は電気化学的に消費される酸のアニオンである、請求項1〜3のいずれか1項に記載の電気めっき浴。
- 前記三価クロム塩のアニオンが、ギ酸、酢酸、プロピオン酸、グリコール酸、シュウ酸、炭酸、クエン酸、又はそれらの混合物からなる群より選択される、請求項4に記載の電気めっき浴。
- 電気めっき浴が、バナジウム、マンガン、鉄、コバルト、ニッケル、モリブデン、及びタングステン、及びそれらの混合物からなる群より選択される合金形成剤を含む、請求項1〜5のいずれか1項に記載の電気めっき浴。
- 前記電気めっき浴が、さらに、電気めっき浴中の有機成分及びアンモニアから供給される、炭素、酸素、及び窒素を含む、請求項1〜6のいずれか1項に記載の電気めっき浴。
- 前記電気めっき浴が、アンモニアを、前記少なくとも1種の錯化剤のモル濃度以下のモル濃度で含む、請求項7に記載の電気めっき浴。
- 前記錯化剤が、カルボン酸及びカルボン酸塩からなる群より選択される、請求項1〜8のいずれか1項に記載の電気めっき浴。
- 前記錯化剤が、ギ酸、酢酸、プロピオン酸、グリコール酸、乳酸、シュウ酸、リンゴ酸、クエン酸、酒石酸、コハク酸、グルコン酸、グリシン、アスパラギン酸、マロン酸、コハク酸、及びそれらの混合物、又はそれらの塩及びその混合物からなる群より選択される、請求項9に記載の電気めっき浴。
- 前記錯化剤が、100〜300g/Lの量で存在し、及び/又は、前記錯化剤と前記三価クロム塩のモル比が、10:1〜13:1である、請求項1〜10のいずれか1項に記載の電気めっき浴。
- 前記錯化剤が、150〜250g/Lの量で存在する、請求項11に記載の電気めっき浴。
- 前記ハロゲン塩が、臭化物、塩化物、ヨウ化物、及びフッ化物塩からなる群より選択され、及び、前記ハロゲン塩が、5〜50g/Lの量で存在する、請求項1〜12のいずれか1項に記載の電気めっき浴。
- 前記ハロゲン塩が、臭化カリウム、臭化ナトリウム、臭化アンモニウム及びそれらの混合物からなる群より選択される、請求項13に記載の電気めっき浴。
- 前記電気めっき浴が、さらに、少なくとも1種のさらなる錯化剤として及び/又は少なくとも1種のさらなるハロゲン塩として、フッ化物を含む、請求項1〜14のいずれか1項に記載の電気めっき浴。
- 前記添加剤が、光沢剤及び湿潤剤からなる群より選択される、請求項1〜15のいずれか1項に記載の電気めっき浴。
- 前記光沢剤が、四級アンモニウム化合物を含むポリアミン又はポリアミンの混合物からなる群より選択される、請求項16に記載の電気めっき浴。
- 前記湿潤剤が、電気的中性、カチオン性、両性の界面活性剤からなる群より選択される、請求項16に記載の電気めっき浴。
- 前記電気めっき浴が、塩化物イオンを実質的に含まない、及び/又は、アルミニウムイオンを実質的に含まない、請求項1〜18のいずれか1項に記載の電気めっき浴。
- ・請求項1〜19のいずれか1項に記載の電気めっき浴を準備する、
・前記電気めっき浴中に基材を浸漬させる、及び
・電流を流し、前記基材上に三価クロムを析出させる
工程を含む、基材上にクロムを析出させる方法。 - 前記電気めっき浴が、陽極液と陰極液を区別する膜によって、アノードから分離されている、請求項20に記載の方法。
- 前記電気めっき浴が、陰イオンもしくは陽イオン交換膜又は多孔質膜によって、アノードから分離されている、請求項21に記載の方法。
- 前記陽極液が硫酸クロム(III)を含む、請求項21に記載の方法。
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EP14152463.7 | 2014-01-24 | ||
EP14152463.7A EP2899299A1 (en) | 2014-01-24 | 2014-01-24 | Electroplating bath containing trivalent chromium and process for depositing chromium |
PCT/EP2015/051469 WO2015110627A1 (en) | 2014-01-24 | 2015-01-26 | Electroplating bath containing trivalent chromium and process for depositing chromium |
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US (2) | US10619258B2 (ja) |
EP (2) | EP2899299A1 (ja) |
JP (1) | JP6534391B2 (ja) |
KR (2) | KR102430755B1 (ja) |
CN (2) | CN105917031B (ja) |
BR (1) | BR112016016834B1 (ja) |
CA (1) | CA2935934C (ja) |
ES (1) | ES2944135T3 (ja) |
HU (1) | HUE061836T2 (ja) |
MX (1) | MX2016009533A (ja) |
PL (1) | PL3097222T3 (ja) |
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2014
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2015
- 2015-01-26 US US15/113,682 patent/US10619258B2/en active Active
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- 2015-01-26 KR KR1020217037970A patent/KR102430755B1/ko active IP Right Grant
- 2015-01-26 WO PCT/EP2015/051469 patent/WO2015110627A1/en active Application Filing
- 2015-01-26 KR KR1020167020060A patent/KR20160113610A/ko not_active Application Discontinuation
- 2015-01-26 HU HUE15701521A patent/HUE061836T2/hu unknown
- 2015-01-26 ES ES15701521T patent/ES2944135T3/es active Active
- 2015-01-26 PL PL15701521.5T patent/PL3097222T3/pl unknown
- 2015-01-26 CA CA2935934A patent/CA2935934C/en active Active
- 2015-01-26 MX MX2016009533A patent/MX2016009533A/es unknown
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WO2015110627A1 (en) | 2015-07-30 |
CN113818053B (zh) | 2024-07-05 |
EP3097222A1 (en) | 2016-11-30 |
KR102430755B1 (ko) | 2022-08-10 |
CN105917031B (zh) | 2021-11-02 |
MX2016009533A (es) | 2016-10-28 |
JP2017503926A (ja) | 2017-02-02 |
BR112016016834A2 (ja) | 2017-08-08 |
CA2935934C (en) | 2022-03-01 |
EP3097222B1 (en) | 2023-03-29 |
CA2935934A1 (en) | 2015-07-30 |
HUE061836T2 (hu) | 2023-08-28 |
US10619258B2 (en) | 2020-04-14 |
CN105917031A (zh) | 2016-08-31 |
BR112016016834B1 (pt) | 2022-02-08 |
ES2944135T3 (es) | 2023-06-19 |
US11905613B2 (en) | 2024-02-20 |
PL3097222T3 (pl) | 2023-05-29 |
KR20160113610A (ko) | 2016-09-30 |
US20170009361A1 (en) | 2017-01-12 |
EP2899299A1 (en) | 2015-07-29 |
KR20210147081A (ko) | 2021-12-06 |
US20200308723A1 (en) | 2020-10-01 |
CN113818053A (zh) | 2021-12-21 |
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