JP6534391B2 - 三価クロムを含有する電気めっき浴及びクロムを析出させる方法 - Google Patents

三価クロムを含有する電気めっき浴及びクロムを析出させる方法 Download PDF

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JP6534391B2
JP6534391B2 JP2016548141A JP2016548141A JP6534391B2 JP 6534391 B2 JP6534391 B2 JP 6534391B2 JP 2016548141 A JP2016548141 A JP 2016548141A JP 2016548141 A JP2016548141 A JP 2016548141A JP 6534391 B2 JP6534391 B2 JP 6534391B2
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electroplating bath
chromium
acid
iii
salt
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JP2017503926A (ja
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ツィリオ，ディエゴ ダル
ツィリオ，ディエゴ ダル
スキアボン，ジャンルイージ
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コヴェンツィア ソチエタ ペル アツィオーニ
コヴェンツィア ソチエタ ペル アツィオーニ
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
JP2016548141A 2014-01-24 2015-01-26 三価クロムを含有する電気めっき浴及びクロムを析出させる方法 Active JP6534391B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14152463.7 2014-01-24
EP14152463.7A EP2899299A1 (en) 2014-01-24 2014-01-24 Electroplating bath containing trivalent chromium and process for depositing chromium
PCT/EP2015/051469 WO2015110627A1 (en) 2014-01-24 2015-01-26 Electroplating bath containing trivalent chromium and process for depositing chromium

Publications (2)

Publication Number Publication Date
JP2017503926A JP2017503926A (ja) 2017-02-02
JP6534391B2 true JP6534391B2 (ja) 2019-06-26

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JP2016548141A Active JP6534391B2 (ja) 2014-01-24 2015-01-26 三価クロムを含有する電気めっき浴及びクロムを析出させる方法

Country Status (12)

Country Link
US (2) US10619258B2 (en:Method)
EP (2) EP2899299A1 (en:Method)
JP (1) JP6534391B2 (en:Method)
KR (2) KR20160113610A (en:Method)
CN (2) CN113818053B (en:Method)
BR (1) BR112016016834B1 (en:Method)
CA (1) CA2935934C (en:Method)
ES (1) ES2944135T3 (en:Method)
HU (1) HUE061836T2 (en:Method)
MX (1) MX383305B (en:Method)
PL (1) PL3097222T3 (en:Method)
WO (1) WO2015110627A1 (en:Method)

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CN112226791A (zh) * 2020-10-26 2021-01-15 厦门市金宝源实业有限公司 一种三价铬镀铬液及其制备方法以及三价铬镀铬方法
EP4023793A1 (en) * 2021-01-05 2022-07-06 Coventya SAS Electroplating bath for depositing chromium or chromium alloy from a trivalent chromium bath and process for depositing chromium or chromium alloy
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CN113735172B (zh) * 2021-10-08 2023-04-07 上海良仁化工有限公司 含铬污泥制备细颗粒氢氧化铬的方法
CN114875459A (zh) * 2022-05-10 2022-08-09 成立航空股份有限公司 一种三价铬镀液及黑铬镀层
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Publication number Publication date
US20170009361A1 (en) 2017-01-12
CN113818053A (zh) 2021-12-21
CN105917031A (zh) 2016-08-31
US20200308723A1 (en) 2020-10-01
BR112016016834A2 (en:Method) 2017-08-08
US11905613B2 (en) 2024-02-20
PL3097222T3 (pl) 2023-05-29
KR102430755B1 (ko) 2022-08-10
CA2935934C (en) 2022-03-01
CA2935934A1 (en) 2015-07-30
JP2017503926A (ja) 2017-02-02
US10619258B2 (en) 2020-04-14
HUE061836T2 (hu) 2023-08-28
EP3097222B1 (en) 2023-03-29
CN113818053B (zh) 2024-07-05
MX2016009533A (es) 2016-10-28
KR20210147081A (ko) 2021-12-06
BR112016016834B1 (pt) 2022-02-08
KR20160113610A (ko) 2016-09-30
WO2015110627A1 (en) 2015-07-30
MX383305B (es) 2025-03-13
EP2899299A1 (en) 2015-07-29
ES2944135T3 (es) 2023-06-19
CN105917031B (zh) 2021-11-02
EP3097222A1 (en) 2016-11-30

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