KR20160098347A - 인라인식 성막장치의 성막 준비방법, 인라인식 성막장치 및 캐리어 - Google Patents

인라인식 성막장치의 성막 준비방법, 인라인식 성막장치 및 캐리어 Download PDF

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Publication number
KR20160098347A
KR20160098347A KR1020167018576A KR20167018576A KR20160098347A KR 20160098347 A KR20160098347 A KR 20160098347A KR 1020167018576 A KR1020167018576 A KR 1020167018576A KR 20167018576 A KR20167018576 A KR 20167018576A KR 20160098347 A KR20160098347 A KR 20160098347A
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KR
South Korea
Prior art keywords
substrate
shielding
carrier
evaporation
evaporation source
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KR1020167018576A
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English (en)
Korean (ko)
Inventor
마사토 후카오
Original Assignee
가부시키가이샤 알박
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Application filed by 가부시키가이샤 알박 filed Critical 가부시키가이샤 알박
Publication of KR20160098347A publication Critical patent/KR20160098347A/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020167018576A 2013-12-12 2014-11-26 인라인식 성막장치의 성막 준비방법, 인라인식 성막장치 및 캐리어 KR20160098347A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013257388 2013-12-12
JPJP-P-2013-257388 2013-12-12
PCT/JP2014/005919 WO2015087505A1 (ja) 2013-12-12 2014-11-26 インライン式成膜装置の成膜準備方法及びインライン式成膜装置並びにキャリア

Publications (1)

Publication Number Publication Date
KR20160098347A true KR20160098347A (ko) 2016-08-18

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167018576A KR20160098347A (ko) 2013-12-12 2014-11-26 인라인식 성막장치의 성막 준비방법, 인라인식 성막장치 및 캐리어

Country Status (5)

Country Link
JP (1) JP6179908B2 (ja)
KR (1) KR20160098347A (ja)
CN (1) CN105874098B (ja)
TW (1) TWI573886B (ja)
WO (1) WO2015087505A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109609922B (zh) * 2019-01-02 2021-04-20 京东方科技集团股份有限公司 薄膜制备装置、方法及系统
KR102184356B1 (ko) * 2019-02-27 2020-11-30 캐논 톡키 가부시키가이샤 성막장치, 성막방법, 및 전자 디바이스 제조방법
JP7239549B2 (ja) * 2020-12-10 2023-03-14 キヤノントッキ株式会社 成膜装置、成膜方法及び電子デバイスの製造方法
JP7216064B2 (ja) * 2020-12-10 2023-01-31 キヤノントッキ株式会社 成膜装置、成膜方法及び電子デバイスの製造方法
CN115537753A (zh) * 2021-06-29 2022-12-30 鑫天虹(厦门)科技有限公司 开合式遮蔽构件及具有开合式遮蔽构件的薄膜沉积机台

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008231446A (ja) 2007-03-16 2008-10-02 Seiko Epson Corp インライン式蒸着装置および成膜方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09143721A (ja) * 1995-11-17 1997-06-03 Ishikawajima Harima Heavy Ind Co Ltd 多層膜用シャッターを有する連続真空蒸着装置
TWI320059B (en) * 2006-07-05 2010-02-01 Evaporation equipment and convey device thereof
WO2011136075A1 (ja) * 2010-04-28 2011-11-03 株式会社アルバック 真空処理装置並びに基板とアラインメントマスクの移動方法及び位置合わせ方法並びに成膜方法
DE102010052761A1 (de) * 2010-11-30 2012-05-31 Leybold Optics Gmbh Vorrichtung zum Beschichten eines Substrats
KR101938365B1 (ko) * 2012-07-31 2019-04-12 삼성디스플레이 주식회사 증착 장치 및 이를 이용한 증착량 측정 방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008231446A (ja) 2007-03-16 2008-10-02 Seiko Epson Corp インライン式蒸着装置および成膜方法

Also Published As

Publication number Publication date
CN105874098A (zh) 2016-08-17
TWI573886B (zh) 2017-03-11
JPWO2015087505A1 (ja) 2017-03-16
TW201534745A (zh) 2015-09-16
JP6179908B2 (ja) 2017-08-16
WO2015087505A1 (ja) 2015-06-18
CN105874098B (zh) 2018-06-29

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