JPWO2015087505A1 - インライン式成膜装置の成膜準備方法及びインライン式成膜装置並びにキャリア - Google Patents
インライン式成膜装置の成膜準備方法及びインライン式成膜装置並びにキャリア Download PDFInfo
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- JPWO2015087505A1 JPWO2015087505A1 JP2015552306A JP2015552306A JPWO2015087505A1 JP WO2015087505 A1 JPWO2015087505 A1 JP WO2015087505A1 JP 2015552306 A JP2015552306 A JP 2015552306A JP 2015552306 A JP2015552306 A JP 2015552306A JP WO2015087505 A1 JPWO2015087505 A1 JP WO2015087505A1
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- 238000002360 preparation method Methods 0.000 title claims abstract description 25
- 230000008021 deposition Effects 0.000 title description 6
- 239000000758 substrate Substances 0.000 claims abstract description 139
- 238000001704 evaporation Methods 0.000 claims abstract description 127
- 230000008020 evaporation Effects 0.000 claims abstract description 126
- 239000000463 material Substances 0.000 claims abstract description 36
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 22
- 239000002356 single layer Substances 0.000 claims abstract description 13
- 238000005259 measurement Methods 0.000 claims abstract description 7
- 238000012546 transfer Methods 0.000 claims description 23
- 238000012986 modification Methods 0.000 abstract description 6
- 230000004048 modification Effects 0.000 abstract description 6
- 238000004904 shortening Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 71
- 230000015572 biosynthetic process Effects 0.000 description 17
- 238000000034 method Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (6)
- 複数個の蒸発源が列設される真空チャンバ内に、各蒸発源が列設された方向に沿って処理すべき基板を移送し、基板に多層膜を形成するのに先立って、基板に各蒸発源から供給される蒸発材料の単層膜を成膜して測定用試料を作製する工程を含むインライン式成膜装置の成膜準備方法であって、
基板がキャリアにセットされて上流側の蒸発源に対向した位置から下流側の蒸発源に対向した位置まで連続または断続して移送されるものとし、キャリアとして、基板の片面の所定範囲を夫々選択的に遮蔽できる複数個の遮蔽手段を備えるものを用い、上流側から下流側に向けてキャリアで基板を移送する際に、各遮蔽手段により夫々遮蔽される所定範囲を順次変更して単一の基板の面内に各蒸発源から供給される蒸発材料の単層膜が夫々成膜されることを特徴とするインライン式成膜装置の成膜準備方法。 - 真空雰囲気の形成が可能な真空チャンバを備え、真空チャンバ内に、複数個の蒸発源が列設されると共に、各蒸発源が列設された方向に沿って処理すべき基板を移送する基板移送手段が設けられるインライン式成膜装置であって、
基板移送手段が、各蒸発源に対向する基板の片面を開放して保持するキャリアと、キャリアを上流側の蒸発源に対向した位置から下流側の蒸発源に対向した位置まで連続または断続して駆動する駆動手段とを備えるものにおいて、
キャリアは、基板の片面の所定範囲を選択的に遮蔽できる遮蔽手段を備え、基板の片面の所定範囲を遮蔽する遮蔽位置と当該所定範囲が蒸発源を臨む開放位置との間で遮蔽手段を移動する移動手段を設けることを特徴とするインライン式成膜装置。 - 前記遮蔽手段は、その下面に開設される複数のスリット孔と各スリット孔を夫々塞ぐ遮蔽板とで構成され、前記移動手段により遮蔽板が遮蔽位置と開放位置との間で移動されるように構成したことを特徴とする請求項2記載のインライン式成膜装置。
- 前記遮蔽手段は、複数個のローラとキャリアの下面を覆って各ローラに巻き掛けられた単一の遮蔽板を有し、遮蔽板にキャリアにセットされた基板の所定範囲を露出する開口が形成され、前記移動手段により前記開口の位置を基板面内でずらすように構成したことを特徴とする請求項2記載のインライン式成膜装置。
- インライン式成膜装置にて処理すべき基板の片面を開放して当該基板を移送するのに用いられるキャリアであって、
基板の片面の所定範囲を選択的に遮蔽できる遮蔽手段を備え、外部からの動力が伝達されて、基板の片面の所定範囲を遮蔽する遮蔽位置と当該所定範囲を開放する開放位置との間で遮蔽手段を移動させるための被駆動部を更に有することを特徴とするキャリア。 - インライン式成膜装置にて処理すべき基板の片面を開放して当該基板を移送するのに用いられるキャリアであって、
基板の片面の所定範囲を選択的に遮蔽できる遮蔽手段を備え、基板の片面の所定範囲を遮蔽する遮蔽位置と当該所定範囲を開放する開放位置との間で遮蔽手段を移動させる駆動部を更に有することを特徴とするキャリア。
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Application Number | Priority Date | Filing Date | Title |
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JP2013257388 | 2013-12-12 | ||
JP2013257388 | 2013-12-12 | ||
PCT/JP2014/005919 WO2015087505A1 (ja) | 2013-12-12 | 2014-11-26 | インライン式成膜装置の成膜準備方法及びインライン式成膜装置並びにキャリア |
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JPWO2015087505A1 true JPWO2015087505A1 (ja) | 2017-03-16 |
JP6179908B2 JP6179908B2 (ja) | 2017-08-16 |
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JP (1) | JP6179908B2 (ja) |
KR (1) | KR20160098347A (ja) |
CN (1) | CN105874098B (ja) |
TW (1) | TWI573886B (ja) |
WO (1) | WO2015087505A1 (ja) |
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CN109609922B (zh) * | 2019-01-02 | 2021-04-20 | 京东方科技集团股份有限公司 | 薄膜制备装置、方法及系统 |
KR102184356B1 (ko) * | 2019-02-27 | 2020-11-30 | 캐논 톡키 가부시키가이샤 | 성막장치, 성막방법, 및 전자 디바이스 제조방법 |
JP7216064B2 (ja) * | 2020-12-10 | 2023-01-31 | キヤノントッキ株式会社 | 成膜装置、成膜方法及び電子デバイスの製造方法 |
JP7239549B2 (ja) * | 2020-12-10 | 2023-03-14 | キヤノントッキ株式会社 | 成膜装置、成膜方法及び電子デバイスの製造方法 |
CN115537753A (zh) * | 2021-06-29 | 2022-12-30 | 鑫天虹(厦门)科技有限公司 | 开合式遮蔽构件及具有开合式遮蔽构件的薄膜沉积机台 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09143721A (ja) * | 1995-11-17 | 1997-06-03 | Ishikawajima Harima Heavy Ind Co Ltd | 多層膜用シャッターを有する連続真空蒸着装置 |
JP2014031581A (ja) * | 2012-07-31 | 2014-02-20 | Samsung Display Co Ltd | 蒸着装置およびこれを用いた蒸着量測定方法 |
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TWI320059B (en) * | 2006-07-05 | 2010-02-01 | Evaporation equipment and convey device thereof | |
JP2008231446A (ja) | 2007-03-16 | 2008-10-02 | Seiko Epson Corp | インライン式蒸着装置および成膜方法 |
KR101321690B1 (ko) * | 2010-04-28 | 2013-10-23 | 가부시키가이샤 알박 | 진공 처리 장치, 기판과 얼라인먼트 마스크의 이동 방법 및 위치 맞춤 방법 그리고 성막 방법 |
DE102010052761A1 (de) * | 2010-11-30 | 2012-05-31 | Leybold Optics Gmbh | Vorrichtung zum Beschichten eines Substrats |
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- 2014-11-26 WO PCT/JP2014/005919 patent/WO2015087505A1/ja active Application Filing
- 2014-11-26 KR KR1020167018576A patent/KR20160098347A/ko not_active Application Discontinuation
- 2014-11-26 CN CN201480067225.7A patent/CN105874098B/zh active Active
- 2014-11-26 JP JP2015552306A patent/JP6179908B2/ja active Active
- 2014-12-09 TW TW103142849A patent/TWI573886B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09143721A (ja) * | 1995-11-17 | 1997-06-03 | Ishikawajima Harima Heavy Ind Co Ltd | 多層膜用シャッターを有する連続真空蒸着装置 |
JP2014031581A (ja) * | 2012-07-31 | 2014-02-20 | Samsung Display Co Ltd | 蒸着装置およびこれを用いた蒸着量測定方法 |
Also Published As
Publication number | Publication date |
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WO2015087505A1 (ja) | 2015-06-18 |
TW201534745A (zh) | 2015-09-16 |
TWI573886B (zh) | 2017-03-11 |
JP6179908B2 (ja) | 2017-08-16 |
CN105874098A (zh) | 2016-08-17 |
KR20160098347A (ko) | 2016-08-18 |
CN105874098B (zh) | 2018-06-29 |
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