JP2017155263A - 成膜システム及び表示装置の製造方法 - Google Patents
成膜システム及び表示装置の製造方法 Download PDFInfo
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- JP2017155263A JP2017155263A JP2016037906A JP2016037906A JP2017155263A JP 2017155263 A JP2017155263 A JP 2017155263A JP 2016037906 A JP2016037906 A JP 2016037906A JP 2016037906 A JP2016037906 A JP 2016037906A JP 2017155263 A JP2017155263 A JP 2017155263A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 230000008021 deposition Effects 0.000 title abstract description 10
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 16
- 230000032258 transport Effects 0.000 claims description 20
- 238000012546 transfer Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 abstract description 25
- 239000011521 glass Substances 0.000 description 12
- 238000000151 deposition Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】成膜対象物を搬送する搬送装置100と、成膜する膜の形状に応じた開口部を有し、搬送装置100の搬送速度に応じた速度で回転するロール状のシャドーマスク102と、堆積させる成膜材料を基板108に向かって射出する成膜源106とを含む成膜システム。成膜源106はロール上のシャドーマスク102
【選択図】図1
Description
Claims (4)
- 成膜対象物を搬送する搬送装置と、
形成する膜の形状に応じた開口部を有し、前記搬送装置の搬送速度に応じた速度で回転するロール状のシャドーマスクと、
堆積させる成膜材料を前記成膜対象物に向かって射出する成膜源と、
を含むことを特徴とする成膜システム。 - 前記成膜源は前記ロール状のシャドーマスクの内側に配置されることを特徴とする請求項1に記載の成膜システム。
- 前記搬送装置の搬送速度と、前記ロール状のシャドーマスクの回転速度は同じであることを特徴とする請求項1又は2に記載の成膜システム。
- 表示パネルを搬送する工程と、
成膜する膜の形状に応じた開口部を有するロール状のシャドーマスクを、成膜対象物を搬送する搬送装置の搬送速度に応じた速度で回転させる工程と、
堆積させる成膜材料を前記成膜対象物に向かって射出し、前記成膜対象物上に膜を形成する工程と、
を含むことを特徴とする表示装置の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016037906A JP2017155263A (ja) | 2016-02-29 | 2016-02-29 | 成膜システム及び表示装置の製造方法 |
US15/425,224 US9976210B2 (en) | 2016-02-29 | 2017-02-06 | Shadow mask, film forming system using shadow mask and method of manufacturing a display device |
US15/956,528 US10443120B2 (en) | 2016-02-29 | 2018-04-18 | Shadow mask |
Applications Claiming Priority (1)
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JP2016037906A JP2017155263A (ja) | 2016-02-29 | 2016-02-29 | 成膜システム及び表示装置の製造方法 |
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JP2017155263A true JP2017155263A (ja) | 2017-09-07 |
JP2017155263A5 JP2017155263A5 (ja) | 2019-04-04 |
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JP2016037906A Pending JP2017155263A (ja) | 2016-02-29 | 2016-02-29 | 成膜システム及び表示装置の製造方法 |
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US (2) | US9976210B2 (ja) |
JP (1) | JP2017155263A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200023995A (ko) * | 2018-08-27 | 2020-03-06 | 지제이엠 주식회사 | 롤투롤 진공 증착시스템의 셔터장치 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107829065B (zh) * | 2017-10-27 | 2020-06-12 | 京东方科技集团股份有限公司 | 一种开口掩膜板、母板及其制备方法、基板、显示装置 |
CN113286916B (zh) * | 2019-03-11 | 2023-05-30 | 寰采星科技(宁波)有限公司 | 微型精密掩膜板及其制作方法和amoled显示器件 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4303489A (en) * | 1978-08-21 | 1981-12-01 | Vac-Tec Systems, Inc. | Method and apparatus for producing a variable intensity pattern of sputtering material on a substrate |
JP2003041361A (ja) * | 2001-08-02 | 2003-02-13 | Sony Corp | 成膜装置 |
JP2008226689A (ja) * | 2007-03-14 | 2008-09-25 | Konica Minolta Holdings Inc | 可撓性基板への透明導電膜の形成装置、マスク部材、及び有機エレクトロルミネッセンス素子用透明導電膜樹脂基板 |
JP2014216191A (ja) * | 2013-04-25 | 2014-11-17 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子の製造方法及び製造装置 |
WO2016047349A1 (ja) * | 2014-09-25 | 2016-03-31 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子の製造方法 |
Family Cites Families (6)
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JPS6044776B2 (ja) * | 1981-06-05 | 1985-10-05 | 株式会社日立製作所 | シヤドウマスク取り外し装置 |
JPH05114358A (ja) * | 1991-10-24 | 1993-05-07 | Toshiba Corp | シヤドウマスクの製造方法 |
JP2010196126A (ja) * | 2009-02-26 | 2010-09-09 | Canon Inc | 真空蒸着装置の重石板およびそれを用いた真空蒸着装置 |
JP5323041B2 (ja) * | 2010-12-22 | 2013-10-23 | 日東電工株式会社 | 有機el素子の製造方法及び製造装置 |
KR20140110971A (ko) * | 2011-12-23 | 2014-09-17 | 솔렉셀, 인크. | 반도체 금속화와 상호접속부를 위한 고 생산성 스프레이 처리 |
TWI575330B (zh) | 2012-03-27 | 2017-03-21 | 尼康股份有限公司 | 光罩搬送裝置、光罩保持裝置、基板處理裝置、及元件製造方法 |
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2016
- 2016-02-29 JP JP2016037906A patent/JP2017155263A/ja active Pending
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2017
- 2017-02-06 US US15/425,224 patent/US9976210B2/en active Active
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2018
- 2018-04-18 US US15/956,528 patent/US10443120B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4303489A (en) * | 1978-08-21 | 1981-12-01 | Vac-Tec Systems, Inc. | Method and apparatus for producing a variable intensity pattern of sputtering material on a substrate |
JP2003041361A (ja) * | 2001-08-02 | 2003-02-13 | Sony Corp | 成膜装置 |
JP2008226689A (ja) * | 2007-03-14 | 2008-09-25 | Konica Minolta Holdings Inc | 可撓性基板への透明導電膜の形成装置、マスク部材、及び有機エレクトロルミネッセンス素子用透明導電膜樹脂基板 |
JP2014216191A (ja) * | 2013-04-25 | 2014-11-17 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子の製造方法及び製造装置 |
WO2016047349A1 (ja) * | 2014-09-25 | 2016-03-31 | コニカミノルタ株式会社 | 有機エレクトロルミネッセンス素子の製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200023995A (ko) * | 2018-08-27 | 2020-03-06 | 지제이엠 주식회사 | 롤투롤 진공 증착시스템의 셔터장치 |
KR102087979B1 (ko) | 2018-08-27 | 2020-03-11 | 지제이엠 주식회사 | 롤투롤 진공 증착시스템의 셔터장치 |
Also Published As
Publication number | Publication date |
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US9976210B2 (en) | 2018-05-22 |
US20180237898A1 (en) | 2018-08-23 |
US20170247788A1 (en) | 2017-08-31 |
US10443120B2 (en) | 2019-10-15 |
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