KR20150143783A - Al­Cr­N 코팅을 제조하기 위한 금속, 금속간 및 세라믹 표적 재료들의 아크 증착 - Google Patents

Al­Cr­N 코팅을 제조하기 위한 금속, 금속간 및 세라믹 표적 재료들의 아크 증착 Download PDF

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Publication number
KR20150143783A
KR20150143783A KR1020157032710A KR20157032710A KR20150143783A KR 20150143783 A KR20150143783 A KR 20150143783A KR 1020157032710 A KR1020157032710 A KR 1020157032710A KR 20157032710 A KR20157032710 A KR 20157032710A KR 20150143783 A KR20150143783 A KR 20150143783A
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KR
South Korea
Prior art keywords
intermetallic
target
arc deposition
produce
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020157032710A
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English (en)
Korean (ko)
Inventor
코린나 사빗쳐
요르그 폴잇쉬
피터 폴칙
폴 헤인즈 마이로퍼
리차드 라흐바우어
미리잠 아른트
Original Assignee
오엘리콘 썰피스 솔루션즈 아게, 츠르바크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 오엘리콘 썰피스 솔루션즈 아게, 츠르바크 filed Critical 오엘리콘 썰피스 솔루션즈 아게, 츠르바크
Publication of KR20150143783A publication Critical patent/KR20150143783A/ko
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Ceramic Products (AREA)
KR1020157032710A 2013-04-18 2014-04-14 Al­Cr­N 코팅을 제조하기 위한 금속, 금속간 및 세라믹 표적 재료들의 아크 증착 Withdrawn KR20150143783A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013006633.6 2013-04-18
DE102013006633.6A DE102013006633A1 (de) 2013-04-18 2013-04-18 Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen
PCT/EP2014/000989 WO2014170003A1 (de) 2013-04-18 2014-04-14 Funkenverdampfen von metallischen, intermetallischen und keramischen targetmaterialien um al-cr-n beschichtungen herzustellen

Publications (1)

Publication Number Publication Date
KR20150143783A true KR20150143783A (ko) 2015-12-23

Family

ID=50513881

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157032710A Withdrawn KR20150143783A (ko) 2013-04-18 2014-04-14 Al­Cr­N 코팅을 제조하기 위한 금속, 금속간 및 세라믹 표적 재료들의 아크 증착

Country Status (8)

Country Link
US (1) US20160053364A1 (enExample)
EP (1) EP2986753B8 (enExample)
JP (1) JP2016519218A (enExample)
KR (1) KR20150143783A (enExample)
CN (1) CN105164306A (enExample)
AR (1) AR095879A1 (enExample)
DE (1) DE102013006633A1 (enExample)
WO (1) WO2014170003A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240137975A (ko) * 2023-03-09 2024-09-20 주식회사 이엠엘 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재

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US2275585A (en) * 1937-10-08 1942-03-10 Clad Metals Ind Inc Method of making composite metal
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
LU78204A1 (de) * 1977-09-29 1979-05-25 Bleichert Foerderanlagen Gmbh Einschienenfoerderanlage
US5342571A (en) * 1992-02-19 1994-08-30 Tosoh Smd, Inc. Method for producing sputtering target for deposition of titanium, aluminum and nitrogen coatings, sputtering target made thereby, and method of sputtering with said targets
CH693035A5 (de) * 1994-06-24 2003-01-31 Unaxis Balzers Ag Verfahren zur Herstellung eines Targets, nach dem Verfahren hergestelltes Target und Verwendung desselben.
JPH09249966A (ja) * 1996-03-13 1997-09-22 Mitsubishi Materials Corp 金属間化合物分散型焼結Ａｌ合金製スパッタリングターゲット
JP2001226764A (ja) * 2000-02-10 2001-08-21 Shin Etsu Chem Co Ltd スパッタリングのターゲット材用焼結体、その製造方法、及びスパッタリング用ターゲット
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
US6759005B2 (en) * 2002-07-23 2004-07-06 Heraeus, Inc. Fabrication of B/C/N/O/Si doped sputtering targets
KR101047630B1 (ko) * 2003-04-28 2011-07-07 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 Ａｌｃｒ-함유 경질 재료 층을 포함하는 공작물 및 제조방법
US7575039B2 (en) * 2003-10-15 2009-08-18 United Technologies Corporation Refractory metal core coatings
JP5192642B2 (ja) * 2005-11-11 2013-05-08 三菱重工業株式会社 表面被覆部材及びその製造方法ならびに工具及び工作装置
JP2008179853A (ja) * 2007-01-24 2008-08-07 Hitachi Tool Engineering Ltd ホウ化物含有ターゲット材
SE531749C2 (sv) * 2007-09-17 2009-07-28 Seco Tools Ab Metod att utfälla slitstarka skikt på hårdmetall med bågförångning och katod med Ti3SiC2 som huvudbeståndsdel
EP2166128B1 (de) * 2008-09-19 2011-11-09 Oerlikon Trading AG, Trübbach Verfahren zum Herstellen von Metalloxidschichten durch Funkenverdampfung
RU2501885C2 (ru) * 2008-08-17 2013-12-20 Эрликон Трейдинг Аг, Трюббах Применение мишени для искрового напыления и способ получения подходящей для этого применения мишени
JP5051168B2 (ja) * 2009-03-31 2012-10-17 日立ツール株式会社 窒化物分散Ｔｉ−Ａｌ系ターゲット及びその製造方法
EP2363509A1 (en) * 2010-02-28 2011-09-07 Oerlikon Trading AG, Trübbach Synthesis of metal oxides by reactive cathodic arc evaporation
DE102010042828A1 (de) * 2010-10-22 2012-04-26 Walter Ag Target für Lichtbogenverfahren

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240137975A (ko) * 2023-03-09 2024-09-20 주식회사 이엠엘 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재

Also Published As

Publication number Publication date
AR095879A1 (es) 2015-11-18
EP2986753B1 (de) 2019-03-20
WO2014170003A1 (de) 2014-10-23
JP2016519218A (ja) 2016-06-30
DE102013006633A1 (de) 2014-10-23
CN105164306A (zh) 2015-12-16
US20160053364A1 (en) 2016-02-25
EP2986753B8 (de) 2019-06-19
EP2986753A1 (de) 2016-02-24

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Date Code Title Description
PA0105 International application

Patent event date: 20151116

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid