JP2016519218A - Al−Cr−Nコーティングを生成するための金属、金属間化合物及びセラミックターゲット材料のアーク蒸着 - Google Patents
Al−Cr−Nコーティングを生成するための金属、金属間化合物及びセラミックターゲット材料のアーク蒸着 Download PDFInfo
- Publication number
- JP2016519218A JP2016519218A JP2016508033A JP2016508033A JP2016519218A JP 2016519218 A JP2016519218 A JP 2016519218A JP 2016508033 A JP2016508033 A JP 2016508033A JP 2016508033 A JP2016508033 A JP 2016508033A JP 2016519218 A JP2016519218 A JP 2016519218A
- Authority
- JP
- Japan
- Prior art keywords
- produce
- target
- arc deposition
- compound
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013006633.6 | 2013-04-18 | ||
| DE102013006633.6A DE102013006633A1 (de) | 2013-04-18 | 2013-04-18 | Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen |
| PCT/EP2014/000989 WO2014170003A1 (de) | 2013-04-18 | 2014-04-14 | Funkenverdampfen von metallischen, intermetallischen und keramischen targetmaterialien um al-cr-n beschichtungen herzustellen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016519218A true JP2016519218A (ja) | 2016-06-30 |
| JP2016519218A5 JP2016519218A5 (enExample) | 2017-05-25 |
Family
ID=50513881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016508033A Pending JP2016519218A (ja) | 2013-04-18 | 2014-04-14 | Al−Cr−Nコーティングを生成するための金属、金属間化合物及びセラミックターゲット材料のアーク蒸着 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20160053364A1 (enExample) |
| EP (1) | EP2986753B8 (enExample) |
| JP (1) | JP2016519218A (enExample) |
| KR (1) | KR20150143783A (enExample) |
| CN (1) | CN105164306A (enExample) |
| AR (1) | AR095879A1 (enExample) |
| DE (1) | DE102013006633A1 (enExample) |
| WO (1) | WO2014170003A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102877458B1 (ko) * | 2023-03-09 | 2025-10-29 | 주식회사 이엠엘 | 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재 |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09249966A (ja) * | 1996-03-13 | 1997-09-22 | Mitsubishi Materials Corp | 金属間化合物分散型焼結Al合金製スパッタリングターゲット |
| JP2001226764A (ja) * | 2000-02-10 | 2001-08-21 | Shin Etsu Chem Co Ltd | スパッタリングのターゲット材用焼結体、その製造方法、及びスパッタリング用ターゲット |
| JP2005533182A (ja) * | 2002-07-23 | 2005-11-04 | ヘラエウス インコーポレーテッド | ホウ素/炭素/窒素/酸素/ケイ素でドープ処理したスパッタリングターゲットの製造方法 |
| JP2006524748A (ja) * | 2003-04-28 | 2006-11-02 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | AlCr含有の硬質材料層を有する工作物および製造方法 |
| JP2007131927A (ja) * | 2005-11-11 | 2007-05-31 | Mitsubishi Heavy Ind Ltd | 表面被覆部材及びその製造方法ならびに工具及び工作装置 |
| JP2008169464A (ja) * | 2007-01-08 | 2008-07-24 | Heraeus Inc | スパッタターゲット及びその製造方法 |
| JP2008179853A (ja) * | 2007-01-24 | 2008-08-07 | Hitachi Tool Engineering Ltd | ホウ化物含有ターゲット材 |
| JP2010236060A (ja) * | 2009-03-31 | 2010-10-21 | Hitachi Tool Engineering Ltd | 窒化物分散Ti−Al系ターゲット及びその製造方法 |
| US20100322840A1 (en) * | 2007-09-17 | 2010-12-23 | Seco Tools Ab | Method of producing a layer by arc-evaporation from ceramic cathodes |
| JP2011518949A (ja) * | 2008-04-24 | 2011-06-30 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | アーク蒸着による金属酸化物層の製造方法 |
| WO2011103955A1 (en) * | 2010-02-28 | 2011-09-01 | Oerlikon Trading Ag, Trübbach | Synthesis of metal oxides by reactive cathodic arc evaporation |
| WO2012052437A1 (de) * | 2010-10-22 | 2012-04-26 | Walter Ag | Target für lichtbogenverfahren |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2275585A (en) * | 1937-10-08 | 1942-03-10 | Clad Metals Ind Inc | Method of making composite metal |
| US3836451A (en) * | 1968-12-26 | 1974-09-17 | A Snaper | Arc deposition apparatus |
| US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| LU78204A1 (de) * | 1977-09-29 | 1979-05-25 | Bleichert Foerderanlagen Gmbh | Einschienenfoerderanlage |
| US5342571A (en) * | 1992-02-19 | 1994-08-30 | Tosoh Smd, Inc. | Method for producing sputtering target for deposition of titanium, aluminum and nitrogen coatings, sputtering target made thereby, and method of sputtering with said targets |
| CH693035A5 (de) * | 1994-06-24 | 2003-01-31 | Unaxis Balzers Ag | Verfahren zur Herstellung eines Targets, nach dem Verfahren hergestelltes Target und Verwendung desselben. |
| US7575039B2 (en) * | 2003-10-15 | 2009-08-18 | United Technologies Corporation | Refractory metal core coatings |
| RU2501885C2 (ru) * | 2008-08-17 | 2013-12-20 | Эрликон Трейдинг Аг, Трюббах | Применение мишени для искрового напыления и способ получения подходящей для этого применения мишени |
-
2013
- 2013-04-18 DE DE102013006633.6A patent/DE102013006633A1/de not_active Withdrawn
-
2014
- 2014-04-14 WO PCT/EP2014/000989 patent/WO2014170003A1/de not_active Ceased
- 2014-04-14 CN CN201480021672.9A patent/CN105164306A/zh active Pending
- 2014-04-14 EP EP14718326.3A patent/EP2986753B8/de active Active
- 2014-04-14 JP JP2016508033A patent/JP2016519218A/ja active Pending
- 2014-04-14 US US14/785,357 patent/US20160053364A1/en not_active Abandoned
- 2014-04-14 KR KR1020157032710A patent/KR20150143783A/ko not_active Withdrawn
- 2014-04-16 AR ARP140101617A patent/AR095879A1/es unknown
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09249966A (ja) * | 1996-03-13 | 1997-09-22 | Mitsubishi Materials Corp | 金属間化合物分散型焼結Al合金製スパッタリングターゲット |
| JP2001226764A (ja) * | 2000-02-10 | 2001-08-21 | Shin Etsu Chem Co Ltd | スパッタリングのターゲット材用焼結体、その製造方法、及びスパッタリング用ターゲット |
| JP2005533182A (ja) * | 2002-07-23 | 2005-11-04 | ヘラエウス インコーポレーテッド | ホウ素/炭素/窒素/酸素/ケイ素でドープ処理したスパッタリングターゲットの製造方法 |
| JP2006524748A (ja) * | 2003-04-28 | 2006-11-02 | ユナキス・バルツェルス・アクチェンゲゼルシャフト | AlCr含有の硬質材料層を有する工作物および製造方法 |
| JP2007131927A (ja) * | 2005-11-11 | 2007-05-31 | Mitsubishi Heavy Ind Ltd | 表面被覆部材及びその製造方法ならびに工具及び工作装置 |
| JP2008169464A (ja) * | 2007-01-08 | 2008-07-24 | Heraeus Inc | スパッタターゲット及びその製造方法 |
| JP2008179853A (ja) * | 2007-01-24 | 2008-08-07 | Hitachi Tool Engineering Ltd | ホウ化物含有ターゲット材 |
| US20100322840A1 (en) * | 2007-09-17 | 2010-12-23 | Seco Tools Ab | Method of producing a layer by arc-evaporation from ceramic cathodes |
| JP2011518949A (ja) * | 2008-04-24 | 2011-06-30 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | アーク蒸着による金属酸化物層の製造方法 |
| JP2011522960A (ja) * | 2008-04-24 | 2011-08-04 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | アーク蒸着による所定の構造を有する金属酸化物層の製造方法 |
| JP2010236060A (ja) * | 2009-03-31 | 2010-10-21 | Hitachi Tool Engineering Ltd | 窒化物分散Ti−Al系ターゲット及びその製造方法 |
| WO2011103955A1 (en) * | 2010-02-28 | 2011-09-01 | Oerlikon Trading Ag, Trübbach | Synthesis of metal oxides by reactive cathodic arc evaporation |
| WO2012052437A1 (de) * | 2010-10-22 | 2012-04-26 | Walter Ag | Target für lichtbogenverfahren |
Also Published As
| Publication number | Publication date |
|---|---|
| AR095879A1 (es) | 2015-11-18 |
| EP2986753B1 (de) | 2019-03-20 |
| WO2014170003A1 (de) | 2014-10-23 |
| DE102013006633A1 (de) | 2014-10-23 |
| KR20150143783A (ko) | 2015-12-23 |
| CN105164306A (zh) | 2015-12-16 |
| US20160053364A1 (en) | 2016-02-25 |
| EP2986753B8 (de) | 2019-06-19 |
| EP2986753A1 (de) | 2016-02-24 |
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