AR095879A1 - Procedimiento para recubrir un sustrato mediante vaporización catódica de chispas - Google Patents

Procedimiento para recubrir un sustrato mediante vaporización catódica de chispas

Info

Publication number
AR095879A1
AR095879A1 ARP140101617A ARP140101617A AR095879A1 AR 095879 A1 AR095879 A1 AR 095879A1 AR P140101617 A ARP140101617 A AR P140101617A AR P140101617 A ARP140101617 A AR P140101617A AR 095879 A1 AR095879 A1 AR 095879A1
Authority
AR
Argentina
Prior art keywords
sparks
vaporization
cathodic
procedure
substrate
Prior art date
Application number
ARP140101617A
Other languages
English (en)
Spanish (es)
Inventor
Arndt Mirjam
Rachbauer Richard
Paulitsch Joerg
Polcik Peter
Sabitzer Corinna
Heinz Mayrhofer Paul
Original Assignee
Oerlikon Surface Solutions Ag Trubbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Trubbach filed Critical Oerlikon Surface Solutions Ag Trubbach
Publication of AR095879A1 publication Critical patent/AR095879A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Ceramic Products (AREA)
ARP140101617A 2013-04-18 2014-04-16 Procedimiento para recubrir un sustrato mediante vaporización catódica de chispas AR095879A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102013006633.6A DE102013006633A1 (de) 2013-04-18 2013-04-18 Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen

Publications (1)

Publication Number Publication Date
AR095879A1 true AR095879A1 (es) 2015-11-18

Family

ID=50513881

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP140101617A AR095879A1 (es) 2013-04-18 2014-04-16 Procedimiento para recubrir un sustrato mediante vaporización catódica de chispas

Country Status (8)

Country Link
US (1) US20160053364A1 (enExample)
EP (1) EP2986753B8 (enExample)
JP (1) JP2016519218A (enExample)
KR (1) KR20150143783A (enExample)
CN (1) CN105164306A (enExample)
AR (1) AR095879A1 (enExample)
DE (1) DE102013006633A1 (enExample)
WO (1) WO2014170003A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102877458B1 (ko) * 2023-03-09 2025-10-29 주식회사 이엠엘 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2275585A (en) * 1937-10-08 1942-03-10 Clad Metals Ind Inc Method of making composite metal
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
LU78204A1 (de) * 1977-09-29 1979-05-25 Bleichert Foerderanlagen Gmbh Einschienenfoerderanlage
US5342571A (en) * 1992-02-19 1994-08-30 Tosoh Smd, Inc. Method for producing sputtering target for deposition of titanium, aluminum and nitrogen coatings, sputtering target made thereby, and method of sputtering with said targets
CH693035A5 (de) * 1994-06-24 2003-01-31 Unaxis Balzers Ag Verfahren zur Herstellung eines Targets, nach dem Verfahren hergestelltes Target und Verwendung desselben.
JPH09249966A (ja) * 1996-03-13 1997-09-22 Mitsubishi Materials Corp 金属間化合物分散型焼結Ａｌ合金製スパッタリングターゲット
JP2001226764A (ja) * 2000-02-10 2001-08-21 Shin Etsu Chem Co Ltd スパッタリングのターゲット材用焼結体、その製造方法、及びスパッタリング用ターゲット
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
US6759005B2 (en) * 2002-07-23 2004-07-06 Heraeus, Inc. Fabrication of B/C/N/O/Si doped sputtering targets
KR101047630B1 (ko) * 2003-04-28 2011-07-07 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 Ａｌｃｒ-함유 경질 재료 층을 포함하는 공작물 및 제조방법
US7575039B2 (en) * 2003-10-15 2009-08-18 United Technologies Corporation Refractory metal core coatings
JP5192642B2 (ja) * 2005-11-11 2013-05-08 三菱重工業株式会社 表面被覆部材及びその製造方法ならびに工具及び工作装置
JP2008179853A (ja) * 2007-01-24 2008-08-07 Hitachi Tool Engineering Ltd ホウ化物含有ターゲット材
SE531749C2 (sv) * 2007-09-17 2009-07-28 Seco Tools Ab Metod att utfälla slitstarka skikt på hårdmetall med bågförångning och katod med Ti3SiC2 som huvudbeståndsdel
EP2166128B1 (de) * 2008-09-19 2011-11-09 Oerlikon Trading AG, Trübbach Verfahren zum Herstellen von Metalloxidschichten durch Funkenverdampfung
RU2501885C2 (ru) * 2008-08-17 2013-12-20 Эрликон Трейдинг Аг, Трюббах Применение мишени для искрового напыления и способ получения подходящей для этого применения мишени
JP5051168B2 (ja) * 2009-03-31 2012-10-17 日立ツール株式会社 窒化物分散Ｔｉ−Ａｌ系ターゲット及びその製造方法
EP2363509A1 (en) * 2010-02-28 2011-09-07 Oerlikon Trading AG, Trübbach Synthesis of metal oxides by reactive cathodic arc evaporation
DE102010042828A1 (de) * 2010-10-22 2012-04-26 Walter Ag Target für Lichtbogenverfahren

Also Published As

Publication number Publication date
EP2986753B1 (de) 2019-03-20
WO2014170003A1 (de) 2014-10-23
JP2016519218A (ja) 2016-06-30
DE102013006633A1 (de) 2014-10-23
KR20150143783A (ko) 2015-12-23
CN105164306A (zh) 2015-12-16
US20160053364A1 (en) 2016-02-25
EP2986753B8 (de) 2019-06-19
EP2986753A1 (de) 2016-02-24

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