KR102877458B1 - 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재 - Google Patents
다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재Info
- Publication number
- KR102877458B1 KR102877458B1 KR1020230031428A KR20230031428A KR102877458B1 KR 102877458 B1 KR102877458 B1 KR 102877458B1 KR 1020230031428 A KR1020230031428 A KR 1020230031428A KR 20230031428 A KR20230031428 A KR 20230031428A KR 102877458 B1 KR102877458 B1 KR 102877458B1
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- coating
- alcrn
- crn
- heater rod
- target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/3442—Applying energy to the substrate during sputtering using an ion beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
본 발명은 Mo 소재의 표면에 CrN 코팅의 특성인 우수한 밀착력, 내산화성, 고경도, 고온 및 고압의 가혹 조건에서의 뛰어난 성질을 부여하고 더불어 AlCrN 코팅의 향상된 내산화성 및 고온경도 유지 특성을 결합시켜 두 가지 특성을 동시에 갖는 코팅재를 제공한다.
Description
도 2는 멀티 타겟과 단일 합금 타겟을 사용할 경우를 대비하여 장단점을 대비한 설명도이다.
도 3은 본 발명에서 사용한 아크이온플레이팅 장비의 사진이다.
도 4는 본 발명에서 사용한 ArCr 타겟과 Cr 타겟 그리고 코팅에 의해 코팅재를 포함한 Mo 히터로드를 보여주는 사진이다.
도 5는 본 발명의 코팅재를 포함한 샘플에 대한 나노인텐더에 의한 표면경도 분석 결과를 보여준다.
도 6은 본 발명의 코팅재를 포함한 샘플에 대한 스크래치 테스트 결과를 보여준다.
도 7은 본 발명의 코팅재를 포함한 샘플에 대한 SEM 표면분석 결과를 보여준다.
도 8은 본 발명의 코팅재를 포함한 샘플에 대한 EDS 표면분석 결과를 보여준다.
도 9는 본 발명의 코팅재를 포함한 샘플에 대한 SEM 단면분석 결과를 보여준다.
도 10은 본 발명의 코팅재를 포함한 샘플에 대한 내열 특성 테스트 결과를 보여준다.
Claims (7)
- 히터 로드의 고온내구성을 향상시키기 위해,
히터 로드로서의 모재를 Mo으로 하고,
상기 모재 표면에 AlCrN과 CrN을 동시에 코팅하여 서로 다른 상 구조의 믹싱이 이루어지고 서로 다른 격자상수 크기를 가지는 AlCrN-FCC와 CrN-FCC의 FCC 구조의 상들이 혼합 된 나노 복합 코팅재를 형성하는 것을 특징으로 하는 히터 로드에 대한 코팅 방법. - 제1항에 있어서, AlCrN 코팅층의 형성을 위해, AlCr 합금 타겟을 사용하고, CrN 코팅을 위해 Cr100 단일 타겟을 사용하며, 모재가 장입된 챔버에 N2와 Ar을 포함한 비활성 가스를 공급하고, 타겟 표면에 아크 방전을 일으켜 모재에 AlCrN과 CrN을 동시에 코팅하는 것을 특징으로 하는 히터 로드에 대한 코팅 방법.
- 제2항에 있어서, AlCrN 코팅층의 형성을 위해, Al70Cr30 합금 타겟을 사용하는 것을 특징으로 하는 히터 로드에 대한 코팅 방법.
- 제2항에 있어서, 코팅은 아크이온플레이팅(AIP:Arc Ion Plating) 장비에 의해 실시되는 것을 특징으로 하는 히터 로드에 대한 코팅 방법.
- 제1항 내지 제4항 중 어느 한 항의 코팅 방법에 의해 제조된 AlCrN과 CrN의 복합 코팅재는 30 내지 31GPa의 소성경도와 1111 내지 1112GPa의 탄성계수를 갖는 것을 특징으로 하는 AlCrN과 CrN의 복합 코팅재.
- 삭제
- 제1항 내지 제4항 중 어느 한 항의 코팅 방법에 의해 AlCrN과 CrN의 복합 코팅재를 갖는 히터 로드.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020230031428A KR102877458B1 (ko) | 2023-03-09 | 2023-03-09 | 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020230031428A KR102877458B1 (ko) | 2023-03-09 | 2023-03-09 | 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20240137975A KR20240137975A (ko) | 2024-09-20 |
| KR102877458B1 true KR102877458B1 (ko) | 2025-10-29 |
Family
ID=92926636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020230031428A Active KR102877458B1 (ko) | 2023-03-09 | 2023-03-09 | 다중 타겟을 이용한 코팅 방법 및 그에 따른 코팅재 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR102877458B1 (ko) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101345693B1 (ko) * | 2011-11-29 | 2013-12-30 | (주)티티에스 | 기판 지지 모듈 |
| DE102013006633A1 (de) * | 2013-04-18 | 2014-10-23 | Oerlikon Trading Ag, Trübbach | Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen |
| KR20150044092A (ko) * | 2013-10-15 | 2015-04-24 | (주)제이 앤 엘 테크 | 외장재 용 고경도 장식성 금속질화물 코팅층의 제조방법 및 제조장치 |
-
2023
- 2023-03-09 KR KR1020230031428A patent/KR102877458B1/ko active Active
Non-Patent Citations (1)
| Title |
|---|
| Renxin Wang 외 4, Study on the Cutting Performance of CrN/AlCrN-Coated Carbide PCB Milling Cutter, Coatings, 2022년 04월 20일, Vol.12, No.556, pp.1~15* |
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| Publication number | Publication date |
|---|---|
| KR20240137975A (ko) | 2024-09-20 |
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