MX361794B - Proceso para producir una capa de borocarburo metálico en un sustrato. - Google Patents
Proceso para producir una capa de borocarburo metálico en un sustrato.Info
- Publication number
- MX361794B MX361794B MX2015003080A MX2015003080A MX361794B MX 361794 B MX361794 B MX 361794B MX 2015003080 A MX2015003080 A MX 2015003080A MX 2015003080 A MX2015003080 A MX 2015003080A MX 361794 B MX361794 B MX 361794B
- Authority
- MX
- Mexico
- Prior art keywords
- borocarbide
- metallic
- layer
- substrate
- producing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/907—Oxycarbides; Sulfocarbides; Mixture of carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Sliding-Contact Bearings (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
La invención se relaciona con un proceso de PVD para recubrir un sustrato con una capa que contiene por lo menos una fase microcristalina de borocarburo metálico. Durante el proceso de PVD, la salida de fuente se pulsa de tal manera que en por lo menos un pico de la misma la mitad de la anchura de intensidad permita que las conclusiones que se obtendrán sobre la presencia de una fase microcristalina de la capa de borocarburo metálico se puedan identificar en el espectro de rayos X de una capa producida de esta manera a una temperatura de sustrato por debajo de 600°C.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012017809.3A DE102012017809A1 (de) | 2012-09-10 | 2012-09-10 | Verfahren zur Herstellung einer Metallborocarbidschicht auf einem Substrat |
PCT/EP2013/002700 WO2014053209A1 (de) | 2012-09-10 | 2013-09-09 | Verfahren zur herstellung einer metallborocarbidschicht auf einem substrat |
Publications (2)
Publication Number | Publication Date |
---|---|
MX2015003080A MX2015003080A (es) | 2015-11-09 |
MX361794B true MX361794B (es) | 2018-12-17 |
Family
ID=49759246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2015003080A MX361794B (es) | 2012-09-10 | 2013-09-09 | Proceso para producir una capa de borocarburo metálico en un sustrato. |
Country Status (8)
Country | Link |
---|---|
US (1) | US9624571B2 (es) |
EP (1) | EP2893053B1 (es) |
JP (2) | JP2015533937A (es) |
KR (2) | KR20210076171A (es) |
CN (1) | CN104781444B (es) |
DE (1) | DE102012017809A1 (es) |
MX (1) | MX361794B (es) |
WO (1) | WO2014053209A1 (es) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117165927A (zh) * | 2015-09-18 | 2023-12-05 | 应用材料公司 | 用于沉积共形bcn膜的方法 |
US10774416B2 (en) * | 2015-10-16 | 2020-09-15 | Oerlikon Surface Solutions Ag, Pfäffikon | Coating material comprising a ternary phase of Hf—B—C |
US11823859B2 (en) | 2016-09-09 | 2023-11-21 | Ionquest Corp. | Sputtering a layer on a substrate using a high-energy density plasma magnetron |
US10957519B2 (en) | 2015-12-21 | 2021-03-23 | Ionquest Corp. | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films |
US9951414B2 (en) | 2015-12-21 | 2018-04-24 | IonQuest LLC | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films |
US11482404B2 (en) | 2015-12-21 | 2022-10-25 | Ionquest Corp. | Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source |
US11359274B2 (en) | 2015-12-21 | 2022-06-14 | IonQuestCorp. | Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source |
CN105441890B (zh) * | 2015-12-22 | 2018-04-17 | 西安交通大学 | 一种高温低摩擦系数硬质涂层及其制备方法 |
EP3835452B1 (fr) * | 2019-12-09 | 2024-01-31 | The Swatch Group Research and Development Ltd | Methode de fabrication d'une surface decorative |
TW202140426A (zh) | 2020-02-14 | 2021-11-01 | 日商大鵬藥品工業股份有限公司 | 醯基硫脲化合物的製造方法 |
CN114560714A (zh) * | 2022-03-14 | 2022-05-31 | 宁波杭州湾新材料研究院 | 一种纤维增韧陶瓷基复合材料及其制备方法与应用 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU734809B2 (en) * | 1997-06-16 | 2001-06-21 | Robert Bosch Gmbh | Method and device for vacuum-coating a substrate |
JP4112836B2 (ja) * | 2001-06-19 | 2008-07-02 | 株式会社神戸製鋼所 | 切削工具用硬質皮膜を形成するためのターゲット |
JP4614546B2 (ja) * | 2001-01-19 | 2011-01-19 | 畑 朋延 | 化合物薄膜の堆積方法とその装置 |
EP2010691B1 (de) * | 2006-04-21 | 2017-12-06 | CemeCon AG | Beschichteter körper |
SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
DE102007030735A1 (de) * | 2007-07-02 | 2009-01-08 | Walter Ag | Werkzeug mit mehrlagiger Metalloxidbeschichtung |
JP4916021B2 (ja) * | 2007-09-26 | 2012-04-11 | 日立ツール株式会社 | 皮膜 |
DE102008009487B4 (de) * | 2008-02-15 | 2022-09-22 | Walter Ag | Strahlbehandelter Schneideinsatz und Verfahren |
DE102008020163A1 (de) * | 2008-04-22 | 2009-10-29 | Siemens Aktiengesellschaft | Kathode |
DE102009001675A1 (de) * | 2009-03-19 | 2010-09-23 | Eberhard-Karls-Universität Tübingen | Schneidwerkzeug |
JP5222764B2 (ja) * | 2009-03-24 | 2013-06-26 | 株式会社神戸製鋼所 | 積層皮膜および積層皮膜被覆部材 |
DE102010028558A1 (de) * | 2010-05-04 | 2011-11-10 | Walter Ag | PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten |
DE102010042828A1 (de) * | 2010-10-22 | 2012-04-26 | Walter Ag | Target für Lichtbogenverfahren |
-
2012
- 2012-09-10 DE DE102012017809.3A patent/DE102012017809A1/de not_active Withdrawn
-
2013
- 2013-09-09 WO PCT/EP2013/002700 patent/WO2014053209A1/de active Application Filing
- 2013-09-09 KR KR1020217018261A patent/KR20210076171A/ko not_active Application Discontinuation
- 2013-09-09 CN CN201380051231.9A patent/CN104781444B/zh not_active Expired - Fee Related
- 2013-09-09 US US14/427,032 patent/US9624571B2/en active Active
- 2013-09-09 KR KR1020157008824A patent/KR20150053959A/ko active Application Filing
- 2013-09-09 MX MX2015003080A patent/MX361794B/es active IP Right Grant
- 2013-09-09 EP EP13802873.3A patent/EP2893053B1/de active Active
- 2013-09-09 JP JP2015530317A patent/JP2015533937A/ja active Pending
-
2019
- 2019-11-07 JP JP2019202423A patent/JP6830992B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
WO2014053209A1 (de) | 2014-04-10 |
US20150232982A1 (en) | 2015-08-20 |
EP2893053A1 (de) | 2015-07-15 |
MX2015003080A (es) | 2015-11-09 |
CN104781444B (zh) | 2018-08-07 |
KR20150053959A (ko) | 2015-05-19 |
US9624571B2 (en) | 2017-04-18 |
EP2893053B1 (de) | 2022-10-12 |
DE102012017809A1 (de) | 2014-03-13 |
CN104781444A (zh) | 2015-07-15 |
JP2020023754A (ja) | 2020-02-13 |
KR20210076171A (ko) | 2021-06-23 |
JP2015533937A (ja) | 2015-11-26 |
JP6830992B2 (ja) | 2021-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration | ||
HC | Change of company name or juridical status |
Owner name: GESVAL S.A. |