MX361794B - Proceso para producir una capa de borocarburo metálico en un sustrato. - Google Patents

Proceso para producir una capa de borocarburo metálico en un sustrato.

Info

Publication number
MX361794B
MX361794B MX2015003080A MX2015003080A MX361794B MX 361794 B MX361794 B MX 361794B MX 2015003080 A MX2015003080 A MX 2015003080A MX 2015003080 A MX2015003080 A MX 2015003080A MX 361794 B MX361794 B MX 361794B
Authority
MX
Mexico
Prior art keywords
borocarbide
metallic
layer
substrate
producing
Prior art date
Application number
MX2015003080A
Other languages
English (en)
Other versions
MX2015003080A (es
Inventor
Rudigier Helmut
Arndt Mirjam
Bolvardi Hamid
Schneider Jochen
Original Assignee
Oerlikon Surface Solutions Ag Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Pfaeffikon filed Critical Oerlikon Surface Solutions Ag Pfaeffikon
Publication of MX2015003080A publication Critical patent/MX2015003080A/es
Publication of MX361794B publication Critical patent/MX361794B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/90—Carbides
    • C01B32/907—Oxycarbides; Sulfocarbides; Mixture of carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Sliding-Contact Bearings (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

La invención se relaciona con un proceso de PVD para recubrir un sustrato con una capa que contiene por lo menos una fase microcristalina de borocarburo metálico. Durante el proceso de PVD, la salida de fuente se pulsa de tal manera que en por lo menos un pico de la misma la mitad de la anchura de intensidad permita que las conclusiones que se obtendrán sobre la presencia de una fase microcristalina de la capa de borocarburo metálico se puedan identificar en el espectro de rayos X de una capa producida de esta manera a una temperatura de sustrato por debajo de 600°C.
MX2015003080A 2012-09-10 2013-09-09 Proceso para producir una capa de borocarburo metálico en un sustrato. MX361794B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012017809.3A DE102012017809A1 (de) 2012-09-10 2012-09-10 Verfahren zur Herstellung einer Metallborocarbidschicht auf einem Substrat
PCT/EP2013/002700 WO2014053209A1 (de) 2012-09-10 2013-09-09 Verfahren zur herstellung einer metallborocarbidschicht auf einem substrat

Publications (2)

Publication Number Publication Date
MX2015003080A MX2015003080A (es) 2015-11-09
MX361794B true MX361794B (es) 2018-12-17

Family

ID=49759246

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2015003080A MX361794B (es) 2012-09-10 2013-09-09 Proceso para producir una capa de borocarburo metálico en un sustrato.

Country Status (8)

Country Link
US (1) US9624571B2 (es)
EP (1) EP2893053B1 (es)
JP (2) JP2015533937A (es)
KR (2) KR20210076171A (es)
CN (1) CN104781444B (es)
DE (1) DE102012017809A1 (es)
MX (1) MX361794B (es)
WO (1) WO2014053209A1 (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102615728B1 (ko) * 2015-09-18 2023-12-18 어플라이드 머티어리얼스, 인코포레이티드 등각적 bcn 막들을 증착하기 위한 방법들
CN108350562B (zh) * 2015-10-16 2020-03-10 欧瑞康表面处理解决方案股份公司普费菲孔 包含Hf-B-C三元相的新型涂覆材料
US11823859B2 (en) 2016-09-09 2023-11-21 Ionquest Corp. Sputtering a layer on a substrate using a high-energy density plasma magnetron
US10227691B2 (en) 2015-12-21 2019-03-12 IonQuest LLC Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films
US11482404B2 (en) 2015-12-21 2022-10-25 Ionquest Corp. Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source
US10957519B2 (en) 2015-12-21 2021-03-23 Ionquest Corp. Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films
US12217949B2 (en) 2015-12-21 2025-02-04 Ionquest Corp. Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films
US11359274B2 (en) 2015-12-21 2022-06-14 IonQuestCorp. Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source
CN105441890B (zh) * 2015-12-22 2018-04-17 西安交通大学 一种高温低摩擦系数硬质涂层及其制备方法
EP3835452B1 (fr) * 2019-12-09 2024-01-31 The Swatch Group Research and Development Ltd Methode de fabrication d'une surface decorative
TWI872203B (zh) 2020-02-14 2025-02-11 日商大鵬藥品工業股份有限公司 醯基硫脲化合物的製造方法
CN114560714A (zh) * 2022-03-14 2022-05-31 宁波杭州湾新材料研究院 一种纤维增韧陶瓷基复合材料及其制备方法与应用

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6372303B1 (en) * 1997-06-16 2002-04-16 Robert Bosch Gmbh Method and device for vacuum-coating a substrate
JP4112836B2 (ja) * 2001-06-19 2008-07-02 株式会社神戸製鋼所 切削工具用硬質皮膜を形成するためのターゲット
JP4614546B2 (ja) * 2001-01-19 2011-01-19 畑 朋延 化合物薄膜の堆積方法とその装置
EP2010691B1 (de) * 2006-04-21 2017-12-06 CemeCon AG Beschichteter körper
SE533395C2 (sv) * 2007-06-08 2010-09-14 Sandvik Intellectual Property Sätt att göra PVD-beläggningar
DE102007030735A1 (de) * 2007-07-02 2009-01-08 Walter Ag Werkzeug mit mehrlagiger Metalloxidbeschichtung
JP4916021B2 (ja) * 2007-09-26 2012-04-11 日立ツール株式会社 皮膜
DE102008009487B4 (de) * 2008-02-15 2022-09-22 Walter Ag Strahlbehandelter Schneideinsatz und Verfahren
DE102008020163A1 (de) * 2008-04-22 2009-10-29 Siemens Aktiengesellschaft Kathode
DE102009001675A1 (de) * 2009-03-19 2010-09-23 Eberhard-Karls-Universität Tübingen Schneidwerkzeug
JP5222764B2 (ja) * 2009-03-24 2013-06-26 株式会社神戸製鋼所 積層皮膜および積層皮膜被覆部材
DE102010028558A1 (de) * 2010-05-04 2011-11-10 Walter Ag PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten
DE102010042828A1 (de) 2010-10-22 2012-04-26 Walter Ag Target für Lichtbogenverfahren

Also Published As

Publication number Publication date
JP2015533937A (ja) 2015-11-26
US9624571B2 (en) 2017-04-18
KR20150053959A (ko) 2015-05-19
CN104781444A (zh) 2015-07-15
JP6830992B2 (ja) 2021-02-17
JP2020023754A (ja) 2020-02-13
WO2014053209A1 (de) 2014-04-10
MX2015003080A (es) 2015-11-09
KR20210076171A (ko) 2021-06-23
CN104781444B (zh) 2018-08-07
DE102012017809A1 (de) 2014-03-13
EP2893053A1 (de) 2015-07-15
US20150232982A1 (en) 2015-08-20
EP2893053B1 (de) 2022-10-12

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Owner name: GESVAL S.A.