JP6830992B2 - 基板上に金属ホウ炭化物層を製造する方法 - Google Patents
基板上に金属ホウ炭化物層を製造する方法 Download PDFInfo
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- JP6830992B2 JP6830992B2 JP2019202423A JP2019202423A JP6830992B2 JP 6830992 B2 JP6830992 B2 JP 6830992B2 JP 2019202423 A JP2019202423 A JP 2019202423A JP 2019202423 A JP2019202423 A JP 2019202423A JP 6830992 B2 JP6830992 B2 JP 6830992B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/907—Oxycarbides; Sulfocarbides; Mixture of carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Sliding-Contact Bearings (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
Claims (3)
- マイクロ結晶金属ホウ炭化物相を少なくとも含む被膜で基板を被覆するためのPVD方法であって、前記PVD方法がHIPIMS法であり、
前記PVD方法において電源をパルス化し、
セラミックス複合物中に金属ホウ炭化物として金属が存在するターゲットを用いてPVD方法を実施し、
金属ホウ炭化物が、一般式Me 2 BC、式中MeはCr、Zr、およびMoからなる群の中の元素、で示される材料であることを特徴とする、方法。 - 前記HIPIMS法を、100W/cm2より大きな電流密度で少なくとも一部に実施することを特徴とする、請求項1に記載の方法。
- 少なくとも前記PVD方法の一部の間に、被覆される基板に負バイアスを印加することを特徴とする、請求項1または2に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012017809.3 | 2012-09-10 | ||
DE102012017809.3A DE102012017809A1 (de) | 2012-09-10 | 2012-09-10 | Verfahren zur Herstellung einer Metallborocarbidschicht auf einem Substrat |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015530317A Division JP2015533937A (ja) | 2012-09-10 | 2013-09-09 | 基板上に金属ホウ炭化物層を製造する方法 |
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Publication Number | Publication Date |
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JP2020023754A JP2020023754A (ja) | 2020-02-13 |
JP6830992B2 true JP6830992B2 (ja) | 2021-02-17 |
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JP2015530317A Pending JP2015533937A (ja) | 2012-09-10 | 2013-09-09 | 基板上に金属ホウ炭化物層を製造する方法 |
JP2019202423A Active JP6830992B2 (ja) | 2012-09-10 | 2019-11-07 | 基板上に金属ホウ炭化物層を製造する方法 |
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JP2015530317A Pending JP2015533937A (ja) | 2012-09-10 | 2013-09-09 | 基板上に金属ホウ炭化物層を製造する方法 |
Country Status (8)
Country | Link |
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US (1) | US9624571B2 (ja) |
EP (1) | EP2893053B1 (ja) |
JP (2) | JP2015533937A (ja) |
KR (2) | KR20150053959A (ja) |
CN (1) | CN104781444B (ja) |
DE (1) | DE102012017809A1 (ja) |
MX (1) | MX361794B (ja) |
WO (1) | WO2014053209A1 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117165927A (zh) * | 2015-09-18 | 2023-12-05 | 应用材料公司 | 用于沉积共形bcn膜的方法 |
US10774416B2 (en) | 2015-10-16 | 2020-09-15 | Oerlikon Surface Solutions Ag, Pfäffikon | Coating material comprising a ternary phase of Hf—B—C |
US10957519B2 (en) | 2015-12-21 | 2021-03-23 | Ionquest Corp. | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films |
US11359274B2 (en) | 2015-12-21 | 2022-06-14 | IonQuestCorp. | Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source |
US11482404B2 (en) | 2015-12-21 | 2022-10-25 | Ionquest Corp. | Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source |
US11823859B2 (en) | 2016-09-09 | 2023-11-21 | Ionquest Corp. | Sputtering a layer on a substrate using a high-energy density plasma magnetron |
US10227691B2 (en) | 2015-12-21 | 2019-03-12 | IonQuest LLC | Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films |
CN105441890B (zh) * | 2015-12-22 | 2018-04-17 | 西安交通大学 | 一种高温低摩擦系数硬质涂层及其制备方法 |
EP3835452B1 (fr) * | 2019-12-09 | 2024-01-31 | The Swatch Group Research and Development Ltd | Methode de fabrication d'une surface decorative |
TW202140426A (zh) | 2020-02-14 | 2021-11-01 | 日商大鵬藥品工業股份有限公司 | 醯基硫脲化合物的製造方法 |
CN114560714A (zh) * | 2022-03-14 | 2022-05-31 | 宁波杭州湾新材料研究院 | 一种纤维增韧陶瓷基复合材料及其制备方法与应用 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002504189A (ja) * | 1997-06-16 | 2002-02-05 | ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング | 基板の真空被覆方法および装置 |
JP4112836B2 (ja) * | 2001-06-19 | 2008-07-02 | 株式会社神戸製鋼所 | 切削工具用硬質皮膜を形成するためのターゲット |
JP4614546B2 (ja) * | 2001-01-19 | 2011-01-19 | 畑 朋延 | 化合物薄膜の堆積方法とその装置 |
CN101426947A (zh) * | 2006-04-21 | 2009-05-06 | 塞美康股份公司 | 涂覆体 |
SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
DE102007030735A1 (de) * | 2007-07-02 | 2009-01-08 | Walter Ag | Werkzeug mit mehrlagiger Metalloxidbeschichtung |
JP4916021B2 (ja) * | 2007-09-26 | 2012-04-11 | 日立ツール株式会社 | 皮膜 |
DE102008009487B4 (de) * | 2008-02-15 | 2022-09-22 | Walter Ag | Strahlbehandelter Schneideinsatz und Verfahren |
DE102008020163A1 (de) * | 2008-04-22 | 2009-10-29 | Siemens Aktiengesellschaft | Kathode |
DE102009001675A1 (de) * | 2009-03-19 | 2010-09-23 | Eberhard-Karls-Universität Tübingen | Schneidwerkzeug |
JP5222764B2 (ja) * | 2009-03-24 | 2013-06-26 | 株式会社神戸製鋼所 | 積層皮膜および積層皮膜被覆部材 |
DE102010028558A1 (de) * | 2010-05-04 | 2011-11-10 | Walter Ag | PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten |
DE102010042828A1 (de) * | 2010-10-22 | 2012-04-26 | Walter Ag | Target für Lichtbogenverfahren |
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2012
- 2012-09-10 DE DE102012017809.3A patent/DE102012017809A1/de not_active Withdrawn
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2013
- 2013-09-09 KR KR1020157008824A patent/KR20150053959A/ko active Application Filing
- 2013-09-09 JP JP2015530317A patent/JP2015533937A/ja active Pending
- 2013-09-09 MX MX2015003080A patent/MX361794B/es active IP Right Grant
- 2013-09-09 EP EP13802873.3A patent/EP2893053B1/de active Active
- 2013-09-09 WO PCT/EP2013/002700 patent/WO2014053209A1/de active Application Filing
- 2013-09-09 US US14/427,032 patent/US9624571B2/en active Active
- 2013-09-09 CN CN201380051231.9A patent/CN104781444B/zh not_active Expired - Fee Related
- 2013-09-09 KR KR1020217018261A patent/KR20210076171A/ko not_active Application Discontinuation
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2019
- 2019-11-07 JP JP2019202423A patent/JP6830992B2/ja active Active
Also Published As
Publication number | Publication date |
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JP2020023754A (ja) | 2020-02-13 |
WO2014053209A1 (de) | 2014-04-10 |
JP2015533937A (ja) | 2015-11-26 |
DE102012017809A1 (de) | 2014-03-13 |
EP2893053A1 (de) | 2015-07-15 |
US20150232982A1 (en) | 2015-08-20 |
US9624571B2 (en) | 2017-04-18 |
KR20210076171A (ko) | 2021-06-23 |
MX2015003080A (es) | 2015-11-09 |
KR20150053959A (ko) | 2015-05-19 |
MX361794B (es) | 2018-12-17 |
CN104781444B (zh) | 2018-08-07 |
CN104781444A (zh) | 2015-07-15 |
EP2893053B1 (de) | 2022-10-12 |
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