PL2265744T3 - Sposób wytwarzania warstw tlenków metali o zdefiniowanej strukturze za pomocą odparowywania łukowego - Google Patents

Sposób wytwarzania warstw tlenków metali o zdefiniowanej strukturze za pomocą odparowywania łukowego

Info

Publication number
PL2265744T3
PL2265744T3 PL09734873T PL09734873T PL2265744T3 PL 2265744 T3 PL2265744 T3 PL 2265744T3 PL 09734873 T PL09734873 T PL 09734873T PL 09734873 T PL09734873 T PL 09734873T PL 2265744 T3 PL2265744 T3 PL 2265744T3
Authority
PL
Poland
Prior art keywords
way
metal oxide
oxide layers
producing metal
arc evaporation
Prior art date
Application number
PL09734873T
Other languages
English (en)
Inventor
Jürgen Ramm
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of PL2265744T3 publication Critical patent/PL2265744T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Catalysts (AREA)
  • Drilling Tools (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
PL09734873T 2008-04-24 2009-02-06 Sposób wytwarzania warstw tlenków metali o zdefiniowanej strukturze za pomocą odparowywania łukowego PL2265744T3 (pl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US4759108P 2008-04-24 2008-04-24
EP08016572A EP2166128B1 (de) 2008-09-19 2008-09-19 Verfahren zum Herstellen von Metalloxidschichten durch Funkenverdampfung
EP09734873.4A EP2265744B1 (de) 2008-04-24 2009-02-06 Verfahren zum herstellen von metalloxidschichten vorbestimmter struktur durch funkenverdampfung
PCT/EP2009/000852 WO2009129880A1 (de) 2008-04-24 2009-02-06 Verfahren zum herstellen von metalloxidschichten vorbestimmter struktur durch funkenverdampfung

Publications (1)

Publication Number Publication Date
PL2265744T3 true PL2265744T3 (pl) 2014-10-31

Family

ID=40297780

Family Applications (2)

Application Number Title Priority Date Filing Date
PL08016572T PL2166128T3 (pl) 2008-09-19 2008-09-19 Sposób wytwarzania powłok z tlenków metali przez naparowywanie łukowe
PL09734873T PL2265744T3 (pl) 2008-04-24 2009-02-06 Sposób wytwarzania warstw tlenków metali o zdefiniowanej strukturze za pomocą odparowywania łukowego

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PL08016572T PL2166128T3 (pl) 2008-09-19 2008-09-19 Sposób wytwarzania powłok z tlenków metali przez naparowywanie łukowe

Country Status (16)

Country Link
US (2) US10323320B2 (pl)
EP (2) EP2166128B1 (pl)
JP (3) JP2011518949A (pl)
KR (2) KR101629905B1 (pl)
CN (2) CN102016104B (pl)
AT (1) ATE532886T1 (pl)
AU (2) AU2009240320B2 (pl)
BR (2) BRPI0907264A2 (pl)
CA (2) CA2722380A1 (pl)
ES (2) ES2377225T3 (pl)
MX (2) MX2010011496A (pl)
PL (2) PL2166128T3 (pl)
PT (2) PT2166128E (pl)
RU (2) RU2528602C2 (pl)
TW (2) TWI410506B (pl)
WO (2) WO2009129880A1 (pl)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8652589B2 (en) * 2008-01-25 2014-02-18 Oerlikon Trading Ag, Truebbach Permeation barrier layer
JP5798482B2 (ja) * 2008-07-08 2015-10-21 ソレラス・アドヴァンスト・コーティングス・ビーヴイビーエー 第１の相および第２の相を含む酸化物スパッタターゲットの製造方法
ATE532886T1 (de) * 2008-09-19 2011-11-15 Oerlikon Trading Ag Verfahren zum herstellen von metalloxidschichten durch funkenverdampfung
JP2011084804A (ja) * 2009-09-18 2011-04-28 Kobelco Kaken:Kk 金属酸化物−金属複合スパッタリングターゲット
EP2363509A1 (en) * 2010-02-28 2011-09-07 Oerlikon Trading AG, Trübbach Synthesis of metal oxides by reactive cathodic arc evaporation
DE102010053751A1 (de) * 2010-10-28 2012-05-03 Oerlikon Trading Ag, Trübbach Molybdänmonoxidschichten und deren Herstellung mittels PVD
CN104812925B (zh) * 2012-08-29 2017-07-18 欧瑞康表面解决方案股份公司，普费菲孔 具有增强的减摩擦和减磨损性质的电弧pvd涂层
DE102012023260A1 (de) * 2012-11-29 2014-06-05 Oerlikon Trading Ag, Trübbach Verfahren zur Strukturierung von Schichtoberflächen und Vorrichtung dazu
WO2014111264A1 (en) * 2013-01-18 2014-07-24 Oerlikon Trading Ag, Trübbach COATING METHOD FOR PRODUCING (Al,Cr)2O3-BASED COATINGS WITH ENHANCED PROPERTIES
DE102013006633A1 (de) * 2013-04-18 2014-10-23 Oerlikon Trading Ag, Trübbach Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen
SG11201510706UA (en) * 2013-07-09 2016-01-28 Oerlikon Surface Solutions Ag Trubbach Target for the reactive sputter deposition of electrically insulating layers
DE102014104672A1 (de) * 2014-04-02 2015-10-08 Kennametal Inc. Beschichtetes Schneidwerkzeug und Verfahren zu seiner Herstellung
EP2980267B1 (en) 2014-07-28 2019-05-01 Oerlikon Surface Solutions AG, Trübbach Corundum-type fe-doped cathodic arc evaporated al-cr-o coatings
ES2786348T3 (es) * 2015-12-23 2020-10-09 Materion Advanced Mat Germany Gmbh Diana de pulverización catódica basada en óxido de circonio
DE102016125042A1 (de) * 2015-12-28 2017-06-29 Oerlikon Surface Solutions Ag, Pfäffikon Infrarotspiegel mit einer thermisch stabilen Schicht
DE102016212874A1 (de) 2016-07-14 2018-01-18 Oerlikon Surface Solutions Ag, Pfäffikon Schutzbeschichtung für eine thermisch beanspruchte Struktur
US20200181757A1 (en) * 2017-07-31 2020-06-11 Walter Ag Coated cutting tool and a process for its manufacture
US11249234B2 (en) * 2019-07-29 2022-02-15 Moxtek, Inc. Polarizer with composite materials

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5246787A (en) * 1989-11-22 1993-09-21 Balzers Aktiengesellschaft Tool or instrument with a wear-resistant hard coating for working or processing organic materials
US6099457A (en) * 1990-08-13 2000-08-08 Endotech, Inc. Endocurietherapy
US5342283A (en) * 1990-08-13 1994-08-30 Good Roger R Endocurietherapy
US5500301A (en) * 1991-03-07 1996-03-19 Kabushiki Kaisha Kobe Seiko Sho A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films
US5415829A (en) * 1992-12-28 1995-05-16 Nikko Kyodo Co., Ltd. Sputtering target
CH688863A5 (de) * 1994-06-24 1998-04-30 Balzers Hochvakuum Verfahren zum Beschichten mindestens eines Werkstueckes und Anlage hierfuer.
US5518597A (en) 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
JP3484861B2 (ja) 1995-03-31 2004-01-06 セイコーエプソン株式会社 画像形成装置用のローラ及びその成形用金型
RU2163942C2 (ru) * 1996-07-25 2001-03-10 Сименс Акциенгезелльшафт Металлическая подложка с оксидным слоем и улучшенным крепежным слоем
US6268284B1 (en) * 1998-10-07 2001-07-31 Tokyo Electron Limited In situ titanium aluminide deposit in high aspect ratio features
JP4155641B2 (ja) * 1998-10-27 2008-09-24 住友電工ハードメタル株式会社 耐摩耗性被膜およびその製造方法ならびに耐摩耗部材
DE60038783D1 (de) * 2000-03-09 2008-06-19 Sulzer Metaplas Gmbh Hartschichten auf Komponenten
JP4502475B2 (ja) * 2000-08-04 2010-07-14 株式会社神戸製鋼所 硬質皮膜および耐摩耗部材並びにその製造方法
US6835414B2 (en) * 2001-07-27 2004-12-28 Unaxis Balzers Aktiengesellschaft Method for producing coated substrates
US6709557B1 (en) * 2002-02-28 2004-03-23 Novellus Systems, Inc. Sputter apparatus for producing multi-component metal alloy films and method for making the same
JP4216518B2 (ja) * 2002-03-29 2009-01-28 株式会社神戸製鋼所 カソード放電型アークイオンプレーティング用ターゲットおよびその製造方法
FR2838752B1 (fr) * 2002-04-22 2005-02-25 Snecma Moteurs Procede de formation d'un revetement ceramique sur un substrat par depot physique en phase vapeur sous faisceau d'electrons
US20040022662A1 (en) * 2002-07-31 2004-02-05 General Electric Company Method for protecting articles, and related compositions
US20040185182A1 (en) 2002-07-31 2004-09-23 General Electric Company Method for protecting articles, and related compositions
US6767627B2 (en) * 2002-12-18 2004-07-27 Kobe Steel, Ltd. Hard film, wear-resistant object and method of manufacturing wear-resistant object
FR2860790B1 (fr) * 2003-10-09 2006-07-28 Snecma Moteurs Cible destinee a etre evaporee sous faisceau d'electrons, son procede de fabrication, barriere thermique et revetement obtenus a partir d'une cible, et piece mecanique comportant un tel revetement
EP1536041B1 (en) * 2003-11-25 2008-05-21 Mitsubishi Materials Corporation Coated cermet cutting tool with a chipping resistant, hard coating layer
US7381282B2 (en) * 2004-04-07 2008-06-03 Hitachi Metals, Ltd. Co alloy target and its production method, soft magnetic film for perpendicular magnetic recording and perpendicular magnetic recording medium
US7247529B2 (en) * 2004-08-30 2007-07-24 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing display device
TWI282385B (en) * 2004-12-02 2007-06-11 Taiwan Textile Res Inst Method for producing durably anti-microbial fibers
JP4579709B2 (ja) * 2005-02-15 2010-11-10 株式会社神戸製鋼所 Ａｌ−Ｎｉ−希土類元素合金スパッタリングターゲット
PL1863947T3 (pl) 2005-03-24 2012-06-29 Oerlikon Trading Ag Warstwa z twardego materiału
US9997338B2 (en) 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
US7450295B2 (en) * 2006-03-02 2008-11-11 Qualcomm Mems Technologies, Inc. Methods for producing MEMS with protective coatings using multi-component sacrificial layers
TWI411696B (zh) 2006-07-19 2013-10-11 Oerlikon Trading Ag 沉積電絕緣層之方法
US7857948B2 (en) 2006-07-19 2010-12-28 Oerlikon Trading Ag, Trubbach Method for manufacturing poorly conductive layers
US7939181B2 (en) * 2006-10-11 2011-05-10 Oerlikon Trading Ag, Trubbach Layer system with at least one mixed crystal layer of a multi-oxide
US8436051B2 (en) 2007-06-08 2013-05-07 Aptalis Pharma Canada Inc. Mesalamine suppository
ATE532886T1 (de) * 2008-09-19 2011-11-15 Oerlikon Trading Ag Verfahren zum herstellen von metalloxidschichten durch funkenverdampfung

Also Published As

Publication number Publication date
PT2265744E (pt) 2014-07-04
EP2166128A1 (de) 2010-03-24
TWI410506B (zh) 2013-10-01
PT2166128E (pt) 2012-01-17
KR101629909B1 (ko) 2016-06-13
ES2377225T3 (es) 2012-03-23
CN102016104A (zh) 2011-04-13
TW200946698A (en) 2009-11-16
WO2009129880A1 (de) 2009-10-29
AU2009240320B2 (en) 2014-03-20
AU2009240320A1 (en) 2009-10-29
KR20100135946A (ko) 2010-12-27
KR20110010737A (ko) 2011-02-07
JP2011522960A (ja) 2011-08-04
US10323320B2 (en) 2019-06-18
CA2722380A1 (en) 2009-10-29
CN102016104B (zh) 2016-08-03
RU2528602C2 (ru) 2014-09-20
US9611538B2 (en) 2017-04-04
AU2009240321A1 (en) 2009-10-29
ATE532886T1 (de) 2011-11-15
MX2010011502A (es) 2010-11-30
WO2009129879A1 (de) 2009-10-29
RU2525949C2 (ru) 2014-08-20
PL2166128T3 (pl) 2012-05-31
JP2011518949A (ja) 2011-06-30
MX2010011496A (es) 2011-03-02
US20090269615A1 (en) 2009-10-29
EP2166128B1 (de) 2011-11-09
CN102016108A (zh) 2011-04-13
BRPI0907265A2 (pt) 2015-11-17
CA2722520A1 (en) 2009-10-29
RU2010147448A (ru) 2012-05-27
CN102016108B (zh) 2017-03-15
TW201000657A (en) 2010-01-01
EP2265744A1 (de) 2010-12-29
ES2485909T3 (es) 2014-08-14
BRPI0907264A2 (pt) 2015-11-17
KR101629905B1 (ko) 2016-06-13
JP5876123B2 (ja) 2016-03-02
AU2009240321B2 (en) 2013-10-24
RU2010147450A (ru) 2012-05-27
US20090269600A1 (en) 2009-10-29
JP2015038248A (ja) 2015-02-26
EP2265744B1 (de) 2014-05-07
TWI390061B (zh) 2013-03-21

Similar Documents

Publication Publication Date Title
PL2265744T3 (pl) Sposób wytwarzania warstw tlenków metali o zdefiniowanej strukturze za pomocą odparowywania łukowego
Anders A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
WO2011138331A3 (de) Pvd-hybridverfahren zum abscheiden von mischkristallschichten
CA2868596C (en) Method for manufacturing metal powder
MX2016013455A (es) Metodo para galvanizar un tira de metal movil y tira de metal recubierta producida de este modo.
MY179397A (en) Molybdenum monoxide layers, and production thereof using pvd
RU2016121873A (ru) Препятствующий оксидированию барьерный слой
EP2799588A3 (en) Architectures for high temperature TBCs with ultra low thermal conductivity and abradability and method of making
SG165295A1 (en) Electron beam vapor deposition apparatus for depositing multi-layer coating
EA201490034A1 (ru) Способ получения оконного стекла, содержащего пористый слой
MX2017005895A (es) Metodo para recubrir un objeto y recubrimiento producido mediante el mismo.
MX2015014977A (es) Metodo para fabricar una pelicula delgada multi-capa, elemento que incluye la misma y producto electronico que incluye la misma.
TW201612338A (en) Metallization for a thin-film component, process for the production thereof and sputtering target
WO2012097024A3 (en) Pvd process with synchronized process parameters and magnet position
ES2542252A2 (es) Procedimiento para la preparación de una capa o multicapa barrera y/o dieléctrica sobre un sustrato y dispositivo para su realización
JP2016013995A5 (pl)
IN2012DN02318A (pl)
JP2018188741A (ja) マクロ粒子を含む皮膜及びその皮膜を形成する陰極アークプロセス
WO2010109505A8 (en) Process for coating parts made of aluminium alloy and parts obtained therefrom
WO2013101822A3 (en) Metallization of fluoroelastomer films
RU2013132038A (ru) Способ получения многослойного градиентного покрытия методом магнетронного напыления
RU2013136544A (ru) Способ осаждения прозрачной барьерной многослойной системы
RU2016103909A (ru) Мишень для реактивного осаждения электроизолирующих слоев методом ионного распыления
AR088049A1 (es) Metodo para recubrir un sustrato para formar un sustrato recubierto coloreado, metodo para fabricar un sustrato recubierto coloreado en un sistema de deposicion por arco catodico y sustrato recubierto coloreado obtenido
WO2013155432A3 (en) Plasma enhanced atomic layer deposition method