MX2021014264A - Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos. - Google Patents
Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos.Info
- Publication number
- MX2021014264A MX2021014264A MX2021014264A MX2021014264A MX2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A MX 2021014264 A MX2021014264 A MX 2021014264A
- Authority
- MX
- Mexico
- Prior art keywords
- nitrides
- anion
- pvd
- entropy alloy
- high entropy
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title abstract 3
- 239000000956 alloy Substances 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 title 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 4
- 239000011247 coating layer Substances 0.000 abstract 3
- 150000001450 anions Chemical class 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 150000001768 cations Chemical class 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0676—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Procedimiento para producir un revestimiento que comprende al menos una capa de revestimiento de PVD, en el que, para la producción de la al menos una capa de revestimiento de PVD se evaporan materiales a partir de uno o más objetivos mediante el uso de una técnica de PVD en una cámara de revestimiento que comprende oxígeno y nitrógeno como gases reactivos, en el que durante la deposición de la al menos una capa de revestimiento de PVD se forma una estructura de oxinitruro de HEA multianiónico, que comprende una red catiónica formada por cinco o más elementos y una red aniónica formada por dos o más elementos, en la que si solo están presentes dos elementos en la red aniónica, son oxígeno y nitrógeno.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962850737P | 2019-05-21 | 2019-05-21 | |
| PCT/EP2020/064441 WO2020234484A1 (en) | 2019-05-21 | 2020-05-25 | Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2021014264A true MX2021014264A (es) | 2022-01-06 |
Family
ID=73459582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2021014264A MX2021014264A (es) | 2019-05-21 | 2020-05-25 | Revestimientos de pvd que comprenden oxinitruros de aleacion de alta entropia multianionicos. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20220220601A1 (es) |
| EP (1) | EP3973086A1 (es) |
| JP (1) | JP2022533738A (es) |
| KR (1) | KR20220010026A (es) |
| CN (1) | CN113966408B (es) |
| BR (1) | BR112021023386A2 (es) |
| CA (1) | CA3140095A1 (es) |
| MX (1) | MX2021014264A (es) |
| WO (1) | WO2020234484A1 (es) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112899629B (zh) * | 2021-01-18 | 2022-07-19 | 南宁师范大学 | 一种高熵氧化物薄膜及其制备方法和应用 |
| WO2023189595A1 (ja) * | 2022-03-30 | 2023-10-05 | 三菱マテリアル株式会社 | 表面被覆切削工具 |
| CN114934258B (zh) * | 2022-05-24 | 2024-03-22 | 河南科技学院 | 一种SiAlON涂层的制备方法 |
| CN114875360B (zh) * | 2022-05-24 | 2024-03-22 | 河南科技学院 | 一种抗高温氧化的NiAl/AlSiON多层复合涂层及制备方法 |
| CN114990509B (zh) * | 2022-06-15 | 2024-07-12 | 西安热工研究院有限公司 | 一种中熵合金涂层的强化方法 |
| CN117305787B (zh) * | 2023-09-28 | 2024-06-18 | 郑州大学 | 高熵涂层和原位锆硅扩散层的多层协同防护体系、制备方法及应用 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE529161C2 (sv) * | 2005-06-22 | 2007-05-22 | Seco Tools Ab | Skärverktyg med kompositbeläggning för finbearbetning av härdade stål |
| KR20090052174A (ko) * | 2007-11-20 | 2009-05-25 | 아이시스(주) | 확산박막 증착 방법 및 장치 |
| CN105671404B (zh) * | 2014-11-19 | 2017-11-03 | 北京科技大学 | 一种氮氧共合金化的TiZrHfNb基高熵合金及其制备方法 |
| US10280312B2 (en) * | 2016-07-20 | 2019-05-07 | Guardian Glass, LLC | Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same |
| KR101955370B1 (ko) * | 2017-10-20 | 2019-03-07 | 충남대학교산학협력단 | 코발트크롬철망간니켈 질산화물 고엔트로피 합금 및 상기 박막의 제조방법 |
| KR20210079314A (ko) | 2018-10-26 | 2021-06-29 | 외를리콘 서피스 솔루션즈 아게, 페피콘 | 제어된 침전물 구조와 함께 hea 세라믹 매트릭스를 갖는 pvd 코팅 |
-
2020
- 2020-05-25 JP JP2021569207A patent/JP2022533738A/ja active Pending
- 2020-05-25 MX MX2021014264A patent/MX2021014264A/es unknown
- 2020-05-25 WO PCT/EP2020/064441 patent/WO2020234484A1/en active Application Filing
- 2020-05-25 CA CA3140095A patent/CA3140095A1/en active Pending
- 2020-05-25 CN CN202080037762.2A patent/CN113966408B/zh active Active
- 2020-05-25 US US17/613,065 patent/US20220220601A1/en active Pending
- 2020-05-25 EP EP20729026.3A patent/EP3973086A1/en active Pending
- 2020-05-25 KR KR1020217041690A patent/KR20220010026A/ko unknown
- 2020-05-25 BR BR112021023386A patent/BR112021023386A2/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20220220601A1 (en) | 2022-07-14 |
| EP3973086A1 (en) | 2022-03-30 |
| BR112021023386A2 (pt) | 2022-02-01 |
| CN113966408B (zh) | 2024-05-03 |
| CN113966408A (zh) | 2022-01-21 |
| WO2020234484A1 (en) | 2020-11-26 |
| KR20220010026A (ko) | 2022-01-25 |
| JP2022533738A (ja) | 2022-07-25 |
| CA3140095A1 (en) | 2020-11-26 |
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