BR112021023386A2 - Método para produzir um revestimento, revestimento e uso do revestimento - Google Patents

Método para produzir um revestimento, revestimento e uso do revestimento

Info

Publication number
BR112021023386A2
BR112021023386A2 BR112021023386A BR112021023386A BR112021023386A2 BR 112021023386 A2 BR112021023386 A2 BR 112021023386A2 BR 112021023386 A BR112021023386 A BR 112021023386A BR 112021023386 A BR112021023386 A BR 112021023386A BR 112021023386 A2 BR112021023386 A2 BR 112021023386A2
Authority
BR
Brazil
Prior art keywords
coating
pvd
producing
elements
coating layer
Prior art date
Application number
BR112021023386A
Other languages
English (en)
Inventor
Doris Fopp-Spori
Helmut Rudigier
Phani Kumar Yalamanchili Siva
Original Assignee
Oerlikon Surface Solutions Ag Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Pfaeffikon filed Critical Oerlikon Surface Solutions Ag Pfaeffikon
Publication of BR112021023386A2 publication Critical patent/BR112021023386A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

método para produzir um revestimento, revestimento e uso do revestimento. método para produzir um revestimento que compreende pelo menos uma camada de revestimento pvd, em que para a produção de pelo menos uma camada de revestimento pvd são evaporados materiais a partir de um ou mais alvos, com o uso de uma técnica de pvd em uma câmara de revestimento compreendendo oxigênio e nitrogênio como gases reativos, em que durante a deposição de pelo menos uma camada de revestimento pvd é formada uma estrutura de oxinitreto em hea multianiônica, a qual compreende uma rede de cátions formada por cinco ou mais elementos e uma rede de ânions formada por dois ou mais elementos, em que se somente dois elementos estão presentes na rede de ânions, eles são oxigênio e nitrogênio.
BR112021023386A 2019-05-21 2020-05-25 Método para produzir um revestimento, revestimento e uso do revestimento BR112021023386A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962850737P 2019-05-21 2019-05-21
PCT/EP2020/064441 WO2020234484A1 (en) 2019-05-21 2020-05-25 Pvd coatings comprising multi-anion high entropy alloy oxy-nitrides

Publications (1)

Publication Number Publication Date
BR112021023386A2 true BR112021023386A2 (pt) 2022-02-01

Family

ID=73459582

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112021023386A BR112021023386A2 (pt) 2019-05-21 2020-05-25 Método para produzir um revestimento, revestimento e uso do revestimento

Country Status (9)

Country Link
US (1) US20220220601A1 (pt)
EP (1) EP3973086A1 (pt)
JP (1) JP2022533738A (pt)
KR (1) KR20220010026A (pt)
CN (1) CN113966408B (pt)
BR (1) BR112021023386A2 (pt)
CA (1) CA3140095A1 (pt)
MX (1) MX2021014264A (pt)
WO (1) WO2020234484A1 (pt)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112899629B (zh) * 2021-01-18 2022-07-19 南宁师范大学 一种高熵氧化物薄膜及其制备方法和应用
WO2023189595A1 (ja) * 2022-03-30 2023-10-05 三菱マテリアル株式会社 表面被覆切削工具
CN114934258B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种SiAlON涂层的制备方法
CN114875360B (zh) * 2022-05-24 2024-03-22 河南科技学院 一种抗高温氧化的NiAl/AlSiON多层复合涂层及制备方法
CN114990509B (zh) * 2022-06-15 2024-07-12 西安热工研究院有限公司 一种中熵合金涂层的强化方法
CN117305787B (zh) * 2023-09-28 2024-06-18 郑州大学 高熵涂层和原位锆硅扩散层的多层协同防护体系、制备方法及应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE529161C2 (sv) * 2005-06-22 2007-05-22 Seco Tools Ab Skärverktyg med kompositbeläggning för finbearbetning av härdade stål
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
CN105671404B (zh) * 2014-11-19 2017-11-03 北京科技大学 一种氮氧共合金化的TiZrHfNb基高熵合金及其制备方法
US10280312B2 (en) * 2016-07-20 2019-05-07 Guardian Glass, LLC Coated article supporting high-entropy nitride and/or oxide thin film inclusive coating, and/or method of making the same
KR101955370B1 (ko) * 2017-10-20 2019-03-07 충남대학교산학협력단 코발트크롬철망간니켈 질산화물 고엔트로피 합금 및 상기 박막의 제조방법
WO2020084166A1 (en) 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Pvd coatings with a hea ceramic matrix with controlled precipitate structure

Also Published As

Publication number Publication date
WO2020234484A1 (en) 2020-11-26
US20220220601A1 (en) 2022-07-14
EP3973086A1 (en) 2022-03-30
CN113966408A (zh) 2022-01-21
CN113966408B (zh) 2024-05-03
KR20220010026A (ko) 2022-01-25
JP2022533738A (ja) 2022-07-25
CA3140095A1 (en) 2020-11-26
MX2021014264A (es) 2022-01-06

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