MX2010011496A - Metodo para producir capas de oxido metalico de estructura predeterminada por medio de evaporacion de arco. - Google Patents
Metodo para producir capas de oxido metalico de estructura predeterminada por medio de evaporacion de arco.Info
- Publication number
- MX2010011496A MX2010011496A MX2010011496A MX2010011496A MX2010011496A MX 2010011496 A MX2010011496 A MX 2010011496A MX 2010011496 A MX2010011496 A MX 2010011496A MX 2010011496 A MX2010011496 A MX 2010011496A MX 2010011496 A MX2010011496 A MX 2010011496A
- Authority
- MX
- Mexico
- Prior art keywords
- way
- metal oxide
- oxide layers
- producing metal
- arc evaporation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0408—Light metal alloys
- C22C1/0416—Aluminium-based alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Catalysts (AREA)
- Drilling Tools (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
La presente invención se relaciona con un método para producir capas que comprenden óxidos ternarios y superiores de constituyentes metálicos y semi-metálicos, en donde la temperatura de generación de tales óxidos se establece sustancialmente encima de la composición de los blancos de aleación (con base en diagrama de fases) binarios (o superiores).
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4759108P | 2008-04-24 | 2008-04-24 | |
EP08016572A EP2166128B1 (de) | 2008-09-19 | 2008-09-19 | Verfahren zum Herstellen von Metalloxidschichten durch Funkenverdampfung |
PCT/EP2009/000852 WO2009129880A1 (de) | 2008-04-24 | 2009-02-06 | Verfahren zum herstellen von metalloxidschichten vorbestimmter struktur durch funkenverdampfung |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2010011496A true MX2010011496A (es) | 2011-03-02 |
Family
ID=40297780
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2010011496A MX2010011496A (es) | 2008-04-24 | 2009-02-06 | Metodo para producir capas de oxido metalico de estructura predeterminada por medio de evaporacion de arco. |
MX2010011502A MX2010011502A (es) | 2008-04-24 | 2009-02-06 | Metodo para producir capas de oxido metalico por medio de evaporacion de arco. |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2010011502A MX2010011502A (es) | 2008-04-24 | 2009-02-06 | Metodo para producir capas de oxido metalico por medio de evaporacion de arco. |
Country Status (16)
Country | Link |
---|---|
US (2) | US10323320B2 (es) |
EP (2) | EP2166128B1 (es) |
JP (3) | JP2011518949A (es) |
KR (2) | KR101629909B1 (es) |
CN (2) | CN102016104B (es) |
AT (1) | ATE532886T1 (es) |
AU (2) | AU2009240321B2 (es) |
BR (2) | BRPI0907264A2 (es) |
CA (2) | CA2722380A1 (es) |
ES (2) | ES2377225T3 (es) |
MX (2) | MX2010011496A (es) |
PL (2) | PL2166128T3 (es) |
PT (2) | PT2166128E (es) |
RU (2) | RU2525949C2 (es) |
TW (2) | TWI390061B (es) |
WO (2) | WO2009129879A1 (es) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8652589B2 (en) * | 2008-01-25 | 2014-02-18 | Oerlikon Trading Ag, Truebbach | Permeation barrier layer |
PL2294241T3 (pl) * | 2008-07-08 | 2012-05-31 | Bekaert Advanced Coatings | Sposób wytwarzania tarczy tlenkowej do rozpylania jonowego, zawierającej pierwszą i drugą fazę |
PL2166128T3 (pl) | 2008-09-19 | 2012-05-31 | Oerlikon Trading Ag | Sposób wytwarzania powłok z tlenków metali przez naparowywanie łukowe |
JP2011084804A (ja) * | 2009-09-18 | 2011-04-28 | Kobelco Kaken:Kk | 金属酸化物−金属複合スパッタリングターゲット |
EP2363509A1 (en) * | 2010-02-28 | 2011-09-07 | Oerlikon Trading AG, Trübbach | Synthesis of metal oxides by reactive cathodic arc evaporation |
DE102010053751A1 (de) * | 2010-10-28 | 2012-05-03 | Oerlikon Trading Ag, Trübbach | Molybdänmonoxidschichten und deren Herstellung mittels PVD |
WO2014032753A1 (en) * | 2012-08-29 | 2014-03-06 | Oerlikon Trading Ag, Trübbach | Arc pvd coating with enhanced reducing friction and reducing wear properties |
DE102012023260A1 (de) * | 2012-11-29 | 2014-06-05 | Oerlikon Trading Ag, Trübbach | Verfahren zur Strukturierung von Schichtoberflächen und Vorrichtung dazu |
WO2014111264A1 (en) * | 2013-01-18 | 2014-07-24 | Oerlikon Trading Ag, Trübbach | COATING METHOD FOR PRODUCING (Al,Cr)2O3-BASED COATINGS WITH ENHANCED PROPERTIES |
DE102013006633A1 (de) * | 2013-04-18 | 2014-10-23 | Oerlikon Trading Ag, Trübbach | Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen |
WO2015003806A1 (de) * | 2013-07-09 | 2015-01-15 | Oerlikon Trading Ag, Trübbach | Target zur reaktiven sputter-abscheidung elektrisch-isolierender schichten |
DE102014104672A1 (de) * | 2014-04-02 | 2015-10-08 | Kennametal Inc. | Beschichtetes Schneidwerkzeug und Verfahren zu seiner Herstellung |
EP2980267B1 (en) | 2014-07-28 | 2019-05-01 | Oerlikon Surface Solutions AG, Trübbach | Corundum-type fe-doped cathodic arc evaporated al-cr-o coatings |
ES2786348T3 (es) * | 2015-12-23 | 2020-10-09 | Materion Advanced Mat Germany Gmbh | Diana de pulverización catódica basada en óxido de circonio |
DE102016125042A1 (de) * | 2015-12-28 | 2017-06-29 | Oerlikon Surface Solutions Ag, Pfäffikon | Infrarotspiegel mit einer thermisch stabilen Schicht |
DE102016212874A1 (de) | 2016-07-14 | 2018-01-18 | Oerlikon Surface Solutions Ag, Pfäffikon | Schutzbeschichtung für eine thermisch beanspruchte Struktur |
CN110945156A (zh) * | 2017-07-31 | 2020-03-31 | 瓦尔特公开股份有限公司 | 涂层切削工具及其制造方法 |
US11249234B2 (en) * | 2019-07-29 | 2022-02-15 | Moxtek, Inc. | Polarizer with composite materials |
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US5246787A (en) * | 1989-11-22 | 1993-09-21 | Balzers Aktiengesellschaft | Tool or instrument with a wear-resistant hard coating for working or processing organic materials |
US6099457A (en) * | 1990-08-13 | 2000-08-08 | Endotech, Inc. | Endocurietherapy |
US5342283A (en) * | 1990-08-13 | 1994-08-30 | Good Roger R | Endocurietherapy |
US5500301A (en) * | 1991-03-07 | 1996-03-19 | Kabushiki Kaisha Kobe Seiko Sho | A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films |
US5415829A (en) * | 1992-12-28 | 1995-05-16 | Nikko Kyodo Co., Ltd. | Sputtering target |
CH688863A5 (de) * | 1994-06-24 | 1998-04-30 | Balzers Hochvakuum | Verfahren zum Beschichten mindestens eines Werkstueckes und Anlage hierfuer. |
US5518597A (en) | 1995-03-28 | 1996-05-21 | Minnesota Mining And Manufacturing Company | Cathodic arc coating apparatus and method |
JP3484861B2 (ja) | 1995-03-31 | 2004-01-06 | セイコーエプソン株式会社 | 画像形成装置用のローラ及びその成形用金型 |
RU2163942C2 (ru) * | 1996-07-25 | 2001-03-10 | Сименс Акциенгезелльшафт | Металлическая подложка с оксидным слоем и улучшенным крепежным слоем |
US6268284B1 (en) * | 1998-10-07 | 2001-07-31 | Tokyo Electron Limited | In situ titanium aluminide deposit in high aspect ratio features |
JP4155641B2 (ja) * | 1998-10-27 | 2008-09-24 | 住友電工ハードメタル株式会社 | 耐摩耗性被膜およびその製造方法ならびに耐摩耗部材 |
DE60038783D1 (de) * | 2000-03-09 | 2008-06-19 | Sulzer Metaplas Gmbh | Hartschichten auf Komponenten |
JP4502475B2 (ja) * | 2000-08-04 | 2010-07-14 | 株式会社神戸製鋼所 | 硬質皮膜および耐摩耗部材並びにその製造方法 |
US6835414B2 (en) * | 2001-07-27 | 2004-12-28 | Unaxis Balzers Aktiengesellschaft | Method for producing coated substrates |
US6709557B1 (en) * | 2002-02-28 | 2004-03-23 | Novellus Systems, Inc. | Sputter apparatus for producing multi-component metal alloy films and method for making the same |
JP4216518B2 (ja) | 2002-03-29 | 2009-01-28 | 株式会社神戸製鋼所 | カソード放電型アークイオンプレーティング用ターゲットおよびその製造方法 |
FR2838752B1 (fr) * | 2002-04-22 | 2005-02-25 | Snecma Moteurs | Procede de formation d'un revetement ceramique sur un substrat par depot physique en phase vapeur sous faisceau d'electrons |
US20040022662A1 (en) * | 2002-07-31 | 2004-02-05 | General Electric Company | Method for protecting articles, and related compositions |
US20040185182A1 (en) | 2002-07-31 | 2004-09-23 | General Electric Company | Method for protecting articles, and related compositions |
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FR2860790B1 (fr) * | 2003-10-09 | 2006-07-28 | Snecma Moteurs | Cible destinee a etre evaporee sous faisceau d'electrons, son procede de fabrication, barriere thermique et revetement obtenus a partir d'une cible, et piece mecanique comportant un tel revetement |
EP1536041B1 (en) * | 2003-11-25 | 2008-05-21 | Mitsubishi Materials Corporation | Coated cermet cutting tool with a chipping resistant, hard coating layer |
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US7247529B2 (en) * | 2004-08-30 | 2007-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device |
TWI282385B (en) * | 2004-12-02 | 2007-06-11 | Taiwan Textile Res Inst | Method for producing durably anti-microbial fibers |
JP4579709B2 (ja) * | 2005-02-15 | 2010-11-10 | 株式会社神戸製鋼所 | Al−Ni−希土類元素合金スパッタリングターゲット |
US9997338B2 (en) | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
HUE026952T2 (en) | 2005-03-24 | 2016-08-29 | Oerlikon Surface Solutions Ag Truebbach | Hard Coating Materials |
US7450295B2 (en) * | 2006-03-02 | 2008-11-11 | Qualcomm Mems Technologies, Inc. | Methods for producing MEMS with protective coatings using multi-component sacrificial layers |
US7857948B2 (en) | 2006-07-19 | 2010-12-28 | Oerlikon Trading Ag, Trubbach | Method for manufacturing poorly conductive layers |
TWI411696B (zh) | 2006-07-19 | 2013-10-11 | Oerlikon Trading Ag | 沉積電絕緣層之方法 |
US7939181B2 (en) * | 2006-10-11 | 2011-05-10 | Oerlikon Trading Ag, Trubbach | Layer system with at least one mixed crystal layer of a multi-oxide |
US8436051B2 (en) | 2007-06-08 | 2013-05-07 | Aptalis Pharma Canada Inc. | Mesalamine suppository |
PL2166128T3 (pl) | 2008-09-19 | 2012-05-31 | Oerlikon Trading Ag | Sposób wytwarzania powłok z tlenków metali przez naparowywanie łukowe |
-
2008
- 2008-09-19 PL PL08016572T patent/PL2166128T3/pl unknown
- 2008-09-19 PT PT08016572T patent/PT2166128E/pt unknown
- 2008-09-19 EP EP08016572A patent/EP2166128B1/de not_active Not-in-force
- 2008-09-19 AT AT08016572T patent/ATE532886T1/de active
- 2008-09-19 ES ES08016572T patent/ES2377225T3/es active Active
-
2009
- 2009-02-06 KR KR1020107026388A patent/KR101629909B1/ko active IP Right Grant
- 2009-02-06 EP EP09734873.4A patent/EP2265744B1/de not_active Not-in-force
- 2009-02-06 CN CN200980114304.8A patent/CN102016104B/zh not_active Expired - Fee Related
- 2009-02-06 MX MX2010011496A patent/MX2010011496A/es active IP Right Grant
- 2009-02-06 RU RU2010147450/02A patent/RU2525949C2/ru not_active IP Right Cessation
- 2009-02-06 CA CA2722380A patent/CA2722380A1/en not_active Abandoned
- 2009-02-06 AU AU2009240321A patent/AU2009240321B2/en not_active Ceased
- 2009-02-06 MX MX2010011502A patent/MX2010011502A/es active IP Right Grant
- 2009-02-06 KR KR1020107026387A patent/KR101629905B1/ko active IP Right Grant
- 2009-02-06 WO PCT/EP2009/000851 patent/WO2009129879A1/de active Application Filing
- 2009-02-06 PT PT97348734T patent/PT2265744E/pt unknown
- 2009-02-06 RU RU2010147448/02A patent/RU2528602C2/ru not_active IP Right Cessation
- 2009-02-06 JP JP2011505376A patent/JP2011518949A/ja active Pending
- 2009-02-06 BR BRPI0907264A patent/BRPI0907264A2/pt not_active IP Right Cessation
- 2009-02-06 ES ES09734873.4T patent/ES2485909T3/es active Active
- 2009-02-06 CA CA2722520A patent/CA2722520A1/en not_active Abandoned
- 2009-02-06 JP JP2011505377A patent/JP2011522960A/ja active Pending
- 2009-02-06 BR BRPI0907265A patent/BRPI0907265A2/pt not_active IP Right Cessation
- 2009-02-06 AU AU2009240320A patent/AU2009240320B2/en not_active Ceased
- 2009-02-06 CN CN200980114303.3A patent/CN102016108B/zh not_active Expired - Fee Related
- 2009-02-06 PL PL09734873T patent/PL2265744T3/pl unknown
- 2009-02-06 WO PCT/EP2009/000852 patent/WO2009129880A1/de active Application Filing
- 2009-04-23 US US12/428,699 patent/US10323320B2/en active Active
- 2009-04-24 TW TW098113822A patent/TWI390061B/zh not_active IP Right Cessation
- 2009-04-24 TW TW098113824A patent/TWI410506B/zh not_active IP Right Cessation
- 2009-04-24 US US12/429,252 patent/US9611538B2/en active Active
-
2014
- 2014-09-16 JP JP2014188025A patent/JP5876123B2/ja not_active Expired - Fee Related
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