KR20150013296A - 원자층 증착 카트리지를 이용하는 분말 입자 코팅 - Google Patents

원자층 증착 카트리지를 이용하는 분말 입자 코팅 Download PDF

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Publication number
KR20150013296A
KR20150013296A KR20147035040A KR20147035040A KR20150013296A KR 20150013296 A KR20150013296 A KR 20150013296A KR 20147035040 A KR20147035040 A KR 20147035040A KR 20147035040 A KR20147035040 A KR 20147035040A KR 20150013296 A KR20150013296 A KR 20150013296A
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KR
South Korea
Prior art keywords
ald
cartridge
reactor
receiver
particulate material
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KR20147035040A
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English (en)
Korean (ko)
Inventor
스벤 린드포르스
페카 제이. 소이니넨
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피코순 오와이
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Publication of KR20150013296A publication Critical patent/KR20150013296A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
KR20147035040A 2012-05-14 2012-05-14 원자층 증착 카트리지를 이용하는 분말 입자 코팅 Withdrawn KR20150013296A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/FI2012/050462 WO2013171360A1 (en) 2012-05-14 2012-05-14 Powder particle coating using atomic layer deposition cartridge

Publications (1)

Publication Number Publication Date
KR20150013296A true KR20150013296A (ko) 2015-02-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR20147035040A Withdrawn KR20150013296A (ko) 2012-05-14 2012-05-14 원자층 증착 카트리지를 이용하는 분말 입자 코팅

Country Status (10)

Country Link
US (1) US20150125599A1 (enExample)
EP (1) EP2850222A4 (enExample)
JP (1) JP5963948B2 (enExample)
KR (1) KR20150013296A (enExample)
CN (1) CN104284998A (enExample)
IN (1) IN2014DN09214A (enExample)
RU (1) RU2600042C2 (enExample)
SG (1) SG11201406817XA (enExample)
TW (1) TW201346057A (enExample)
WO (1) WO2013171360A1 (enExample)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101868703B1 (ko) * 2016-12-14 2018-06-18 서울과학기술대학교 산학협력단 분말 코팅 반응기
WO2020018744A1 (en) * 2018-07-19 2020-01-23 Applied Materials, Inc. Particle coating methods and apparatus
KR20200038012A (ko) * 2018-10-02 2020-04-10 (주)아이작리서치 파우더용 플라즈마 원자층 증착 장치
KR20200039136A (ko) * 2018-10-05 2020-04-16 (주)아이작리서치 파우더용 원자층 증착 장치
KR20200041091A (ko) * 2018-10-11 2020-04-21 부산대학교 산학협력단 저밀도 글라스 버블 미세 입자의 기능성 코팅을 위한 원자층 증착기 및 이를 이용한 코팅방법
WO2020159162A1 (ko) * 2019-01-31 2020-08-06 주식회사 엘지화학 코팅 장치
KR20200098274A (ko) * 2019-02-12 2020-08-20 (주)아이작리서치 파우더 원자층 증착 장치
KR20200100928A (ko) * 2019-02-19 2020-08-27 현대자동차주식회사 분말의 표면 처리 장치 및 이를 이용한 분말의 표면 처리 방법
KR20200122020A (ko) * 2019-04-17 2020-10-27 주식회사 엘지화학 원자층 증착 장치
KR20200127132A (ko) * 2018-10-05 2020-11-10 (주)아이작리서치 파우더용 원자층 증착 장치
KR20210018426A (ko) * 2019-05-24 2021-02-17 가부시키가이샤 크리에이티브 코팅즈 분체의 성막 방법, 분체 성막용 용기 및 ald장치
KR20210105622A (ko) * 2020-02-19 2021-08-27 (주)아이작리서치 파우더용 원자층 증착 설비
WO2021235772A1 (ko) * 2020-05-19 2021-11-25 (주)아이작리서치 파우더용 원자층 증착 설비 및 이의 가스 공급 방법
WO2022239888A1 (ko) * 2021-05-13 2022-11-17 (주)아이작리서치 파우더용 원자층 증착 설비
WO2023027262A1 (ko) * 2021-08-27 2023-03-02 (주)아이작리서치 파우더용 원자층 증착 장치
KR20230076863A (ko) * 2017-08-24 2023-05-31 포지 나노, 인크. 분말의 합성, 기능화, 표면 처리 및/또는 캡슐화를 위한 제조 공정, 및 그의 응용

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KR101868703B1 (ko) * 2016-12-14 2018-06-18 서울과학기술대학교 산학협력단 분말 코팅 반응기
KR20230076863A (ko) * 2017-08-24 2023-05-31 포지 나노, 인크. 분말의 합성, 기능화, 표면 처리 및/또는 캡슐화를 위한 제조 공정, 및 그의 응용
US11242599B2 (en) 2018-07-19 2022-02-08 Applied Materials, Inc. Particle coating methods and apparatus
WO2020018744A1 (en) * 2018-07-19 2020-01-23 Applied Materials, Inc. Particle coating methods and apparatus
US12146217B2 (en) 2018-07-19 2024-11-19 Applied Materials, Inc. Particle coating methods and apparatus
KR20210022769A (ko) * 2018-07-19 2021-03-03 어플라이드 머티어리얼스, 인코포레이티드 입자 코팅 방법들 및 장치
KR20200038012A (ko) * 2018-10-02 2020-04-10 (주)아이작리서치 파우더용 플라즈마 원자층 증착 장치
KR20200127132A (ko) * 2018-10-05 2020-11-10 (주)아이작리서치 파우더용 원자층 증착 장치
KR20200039136A (ko) * 2018-10-05 2020-04-16 (주)아이작리서치 파우더용 원자층 증착 장치
KR20200041091A (ko) * 2018-10-11 2020-04-21 부산대학교 산학협력단 저밀도 글라스 버블 미세 입자의 기능성 코팅을 위한 원자층 증착기 및 이를 이용한 코팅방법
WO2020159162A1 (ko) * 2019-01-31 2020-08-06 주식회사 엘지화학 코팅 장치
KR20200098274A (ko) * 2019-02-12 2020-08-20 (주)아이작리서치 파우더 원자층 증착 장치
KR20200100928A (ko) * 2019-02-19 2020-08-27 현대자동차주식회사 분말의 표면 처리 장치 및 이를 이용한 분말의 표면 처리 방법
KR20200122020A (ko) * 2019-04-17 2020-10-27 주식회사 엘지화학 원자층 증착 장치
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JP5963948B2 (ja) 2016-08-03
JP2015520297A (ja) 2015-07-16
CN104284998A (zh) 2015-01-14
US20150125599A1 (en) 2015-05-07
SG11201406817XA (en) 2014-12-30
TW201346057A (zh) 2013-11-16
RU2014147671A (ru) 2016-07-10
RU2600042C2 (ru) 2016-10-20

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