KR20130126495A - 포토레지스트용 수지 조성물, 포토레지스트 및 액정 디바이스의 제조 방법 - Google Patents
포토레지스트용 수지 조성물, 포토레지스트 및 액정 디바이스의 제조 방법 Download PDFInfo
- Publication number
- KR20130126495A KR20130126495A KR1020130051161A KR20130051161A KR20130126495A KR 20130126495 A KR20130126495 A KR 20130126495A KR 1020130051161 A KR1020130051161 A KR 1020130051161A KR 20130051161 A KR20130051161 A KR 20130051161A KR 20130126495 A KR20130126495 A KR 20130126495A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- photoresists
- photoresist
- xylenol
- resin
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012109329 | 2012-05-11 | ||
JPJP-P-2012-109329 | 2012-05-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20130126495A true KR20130126495A (ko) | 2013-11-20 |
Family
ID=49533929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020130051161A KR20130126495A (ko) | 2012-05-11 | 2013-05-07 | 포토레지스트용 수지 조성물, 포토레지스트 및 액정 디바이스의 제조 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6221316B2 (zh) |
KR (1) | KR20130126495A (zh) |
CN (1) | CN103389622A (zh) |
TW (1) | TWI591432B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6287652B2 (ja) * | 2014-07-10 | 2018-03-07 | 日油株式会社 | 感光性樹脂組成物およびその用途 |
TWI685714B (zh) * | 2016-12-27 | 2020-02-21 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、附有鑄模的基板的製造方法以及電鍍成形體的製造方法 |
CN113004478A (zh) * | 2019-12-19 | 2021-06-22 | 彤程化学(中国)有限公司 | 一种酚类聚合物及其制备方法和应用 |
CN111538211B (zh) * | 2020-05-25 | 2023-04-21 | 苏州理硕科技有限公司 | 一种酚醛树脂光刻胶组合物及其制备方法 |
CN112034687B (zh) * | 2020-09-08 | 2021-08-10 | 江苏艾森半导体材料股份有限公司 | 一种光刻胶组合物及其应用 |
CN113461884B (zh) * | 2021-08-04 | 2022-07-05 | 浙江自立高分子化工材料有限公司 | 一种光刻胶用改性酚醛树脂及其制备方法 |
CN114874405A (zh) * | 2022-05-31 | 2022-08-09 | 杭摩科技新材料(阜阳)有限公司 | 一种热塑性酚醛树脂及其制备工艺 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5413894A (en) * | 1993-05-07 | 1995-05-09 | Ocg Microelectronic Materials, Inc. | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions |
JP2834650B2 (ja) * | 1993-10-08 | 1998-12-09 | 住友デュレズ株式会社 | フォトレジスト用フェノール樹脂 |
JP3329026B2 (ja) * | 1993-10-19 | 2002-09-30 | 住友化学工業株式会社 | ポジ型フォトレジスト組成物 |
JP3652071B2 (ja) * | 1997-07-25 | 2005-05-25 | 東京応化工業株式会社 | ノボラック樹脂前駆体およびノボラック樹脂の製造方法 |
JP3600713B2 (ja) * | 1997-08-06 | 2004-12-15 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
US6045966A (en) * | 1997-12-15 | 2000-04-04 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
JPH11202485A (ja) * | 1998-01-08 | 1999-07-30 | Konica Corp | 平版印刷版用感光性組成物 |
JP2002141265A (ja) * | 2000-10-31 | 2002-05-17 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト除去液 |
JP2004043777A (ja) * | 2002-04-22 | 2004-02-12 | Tokyo Ohka Kogyo Co Ltd | ノボラック樹脂溶液、ポジ型ホトレジスト組成物およびその調製方法 |
CN102346372A (zh) * | 2010-07-30 | 2012-02-08 | 奇美实业股份有限公司 | 正型感光性树脂组成物及使用该组成物形成图案的方法 |
-
2013
- 2013-04-12 JP JP2013083606A patent/JP6221316B2/ja active Active
- 2013-04-16 TW TW102113426A patent/TWI591432B/zh not_active IP Right Cessation
- 2013-05-07 KR KR1020130051161A patent/KR20130126495A/ko not_active Application Discontinuation
- 2013-05-10 CN CN2013101708978A patent/CN103389622A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
TWI591432B (zh) | 2017-07-11 |
JP2013254193A (ja) | 2013-12-19 |
JP6221316B2 (ja) | 2017-11-01 |
CN103389622A (zh) | 2013-11-13 |
TW201403229A (zh) | 2014-01-16 |
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