KR20120098683A - 고순도 불소가스, 그 제조 방법 및 용도, 및 불소가스 내의 불순물 모니터링 방법 - Google Patents
고순도 불소가스, 그 제조 방법 및 용도, 및 불소가스 내의 불순물 모니터링 방법 Download PDFInfo
- Publication number
- KR20120098683A KR20120098683A KR1020127012164A KR20127012164A KR20120098683A KR 20120098683 A KR20120098683 A KR 20120098683A KR 1020127012164 A KR1020127012164 A KR 1020127012164A KR 20127012164 A KR20127012164 A KR 20127012164A KR 20120098683 A KR20120098683 A KR 20120098683A
- Authority
- KR
- South Korea
- Prior art keywords
- fluorine
- cell
- detector
- generating cell
- producing
- Prior art date
Links
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 337
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 336
- 239000011737 fluorine Substances 0.000 title claims abstract description 336
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 37
- 239000012535 impurity Substances 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 33
- 238000012544 monitoring process Methods 0.000 title description 13
- 238000012545 processing Methods 0.000 claims description 14
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 8
- 238000001228 spectrum Methods 0.000 claims description 4
- 210000004027 cell Anatomy 0.000 description 197
- 239000007789 gas Substances 0.000 description 99
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 28
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 28
- 239000002245 particle Substances 0.000 description 20
- 230000007423 decrease Effects 0.000 description 17
- 238000005259 measurement Methods 0.000 description 13
- 239000002994 raw material Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 7
- 238000004817 gas chromatography Methods 0.000 description 7
- 238000001514 detection method Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- -1 nickel fluoride compound Chemical class 0.000 description 4
- 210000005056 cell body Anatomy 0.000 description 3
- 239000002826 coolant Substances 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 230000008439 repair process Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000000825 ultraviolet detection Methods 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/20—Fluorine
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/72—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using flame burners
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
- G01N2021/399—Diode laser
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Optics & Photonics (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Treating Waste Gases (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09173332 | 2009-10-16 | ||
EP09173332.9 | 2009-10-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20120098683A true KR20120098683A (ko) | 2012-09-05 |
Family
ID=41800784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020127012164A KR20120098683A (ko) | 2009-10-16 | 2010-10-13 | 고순도 불소가스, 그 제조 방법 및 용도, 및 불소가스 내의 불순물 모니터링 방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20120228144A1 (ja) |
EP (1) | EP2488448A1 (ja) |
JP (1) | JP2013507629A (ja) |
KR (1) | KR20120098683A (ja) |
CN (1) | CN102574682A (ja) |
TW (1) | TW201121889A (ja) |
WO (1) | WO2011045338A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6792158B2 (ja) | 2016-02-09 | 2020-11-25 | セントラル硝子株式会社 | フッ素化合物ガスの精製方法 |
JP6867581B2 (ja) * | 2016-02-09 | 2021-04-28 | セントラル硝子株式会社 | フッ素ガスの精製方法 |
CN109276976B (zh) * | 2018-12-05 | 2023-07-04 | 国家电网有限公司 | 一种六氟化硫与氮气混合气体的回收装置及方法 |
KR20220005530A (ko) * | 2019-11-27 | 2022-01-13 | 쇼와 덴코 가부시키가이샤 | 자외 분광법에 의한 할로겐불화물 함유 가스에 포함되는 불소 가스 농도의 측정 방법 |
KR20220065864A (ko) * | 2019-12-27 | 2022-05-20 | 쇼와 덴코 가부시키가이샤 | 불소 가스의 제조 방법 및 불소 가스 제조 장치 |
US20220213605A1 (en) * | 2019-12-27 | 2022-07-07 | Showa Denko K.K. | Method for producing fluorine gas and device for producing fluorine gas |
WO2021132028A1 (ja) * | 2019-12-27 | 2021-07-01 | 昭和電工株式会社 | フッ素ガスの製造方法及びフッ素ガス製造装置 |
US20220251716A1 (en) * | 2019-12-27 | 2022-08-11 | Showa Denko K.K. | Method for producing fluorine gas and device for producing fluorine gas |
CN113874553B (zh) * | 2019-12-27 | 2024-02-09 | 株式会社力森诺科 | 氟气的制造方法及氟气制造装置 |
WO2021131816A1 (ja) * | 2019-12-27 | 2021-07-01 | 昭和電工株式会社 | フッ素ガスの製造方法及びフッ素ガス製造装置 |
US20220228273A1 (en) * | 2019-12-27 | 2022-07-21 | Showa Denko K.K. | Device for producing fluorine gas and light scattering detector |
CN112946125B (zh) * | 2021-02-02 | 2021-11-16 | 福建德尔科技有限公司 | 氟气中氟化氢的分析装置及分析方法 |
CN116443854B (zh) * | 2023-06-16 | 2023-09-01 | 福建德尔科技股份有限公司 | 一种基于四氟化碳制备的炭粒与氟气反应流量控制方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4711680A (en) * | 1983-05-23 | 1987-12-08 | Rockwell International Corporation | Pure fluorine gas generator |
IT1229210B (it) * | 1988-03-31 | 1991-07-25 | Central Glass Co Ltd | Metodo e dispositivo per analizzare gas contenenti fluoro. |
JPH04120461A (ja) * | 1990-09-10 | 1992-04-21 | Mitsubishi Electric Corp | Sf↓6ガス分析装置 |
JP3339962B2 (ja) * | 1994-04-18 | 2002-10-28 | 関東電化工業株式会社 | フッ素ガス中の不純物ガスの分析方法およびその装置 |
WO1996034998A1 (en) * | 1995-05-01 | 1996-11-07 | E.I. Du Pont De Nemours And Company | Electrochemical conversion of anhydrous hydrogen halide to halogen gas using a cation-transporting membrane |
US6240117B1 (en) * | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
KR100633870B1 (ko) | 2001-06-29 | 2006-10-13 | 쇼와 덴코 가부시키가이샤 | 고순도 불소 가스, 그의 제조 방법 및 용도 |
JP4744017B2 (ja) * | 2001-06-29 | 2011-08-10 | 昭和電工株式会社 | 高純度フッ素ガス中の微量不純物の分析方法 |
JP2003190762A (ja) * | 2001-12-27 | 2003-07-08 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | フッ化水素を含むフッ素ガスの生成装置 |
JP3725822B2 (ja) * | 2001-12-27 | 2005-12-14 | レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | フッ素ガス生成及び供給装置 |
US7129519B2 (en) * | 2002-05-08 | 2006-10-31 | Advanced Technology Materials, Inc. | Monitoring system comprising infrared thermopile detector |
JP5221881B2 (ja) * | 2007-02-09 | 2013-06-26 | 大陽日酸株式会社 | ガス分析装置 |
JP2011017077A (ja) * | 2009-06-12 | 2011-01-27 | Central Glass Co Ltd | フッ素ガス生成装置 |
JP5438439B2 (ja) * | 2009-09-04 | 2014-03-12 | 東洋炭素株式会社 | 気体供給システム |
-
2010
- 2010-10-13 EP EP10773873A patent/EP2488448A1/en not_active Withdrawn
- 2010-10-13 WO PCT/EP2010/065334 patent/WO2011045338A1/en active Application Filing
- 2010-10-13 KR KR1020127012164A patent/KR20120098683A/ko not_active Application Discontinuation
- 2010-10-13 JP JP2012533618A patent/JP2013507629A/ja active Pending
- 2010-10-13 CN CN2010800468897A patent/CN102574682A/zh active Pending
- 2010-10-13 US US13/501,320 patent/US20120228144A1/en not_active Abandoned
- 2010-10-15 TW TW099135280A patent/TW201121889A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
EP2488448A1 (en) | 2012-08-22 |
US20120228144A1 (en) | 2012-09-13 |
JP2013507629A (ja) | 2013-03-04 |
CN102574682A (zh) | 2012-07-11 |
TW201121889A (en) | 2011-07-01 |
WO2011045338A1 (en) | 2011-04-21 |
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