KR20110129914A - 불소 가스 생성 장치 - Google Patents

불소 가스 생성 장치 Download PDF

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Publication number
KR20110129914A
KR20110129914A KR1020117022150A KR20117022150A KR20110129914A KR 20110129914 A KR20110129914 A KR 20110129914A KR 1020117022150 A KR1020117022150 A KR 1020117022150A KR 20117022150 A KR20117022150 A KR 20117022150A KR 20110129914 A KR20110129914 A KR 20110129914A
Authority
KR
South Korea
Prior art keywords
gas
hydrogen fluoride
fluorine gas
fluorine
inner tube
Prior art date
Application number
KR1020117022150A
Other languages
English (en)
Korean (ko)
Inventor
이사무 모리
아키후미 야오
다츠오 미야자키
Original Assignee
샌트랄 글래스 컴퍼니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 샌트랄 글래스 컴퍼니 리미티드 filed Critical 샌트랄 글래스 컴퍼니 리미티드
Publication of KR20110129914A publication Critical patent/KR20110129914A/ko

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/24Halogens or compounds thereof
    • C25B1/245Fluorine; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/02Process control or regulation
    • C25B15/021Process control or regulation of heating or cooling
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/08Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
KR1020117022150A 2009-04-01 2010-03-04 불소 가스 생성 장치 KR20110129914A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-089444 2009-04-01
JP2009089444A JP5572981B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置

Publications (1)

Publication Number Publication Date
KR20110129914A true KR20110129914A (ko) 2011-12-02

Family

ID=42827911

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117022150A KR20110129914A (ko) 2009-04-01 2010-03-04 불소 가스 생성 장치

Country Status (5)

Country Link
EP (1) EP2415906A4 (ja)
JP (1) JP5572981B2 (ja)
KR (1) KR20110129914A (ja)
CN (1) CN102369311A (ja)
WO (1) WO2010113611A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101198350B1 (ko) 2011-04-05 2012-11-08 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제용기
JP5757168B2 (ja) * 2011-06-10 2015-07-29 セントラル硝子株式会社 フッ素ガス生成装置
CN117160179B (zh) * 2023-10-26 2024-02-13 福建德尔科技股份有限公司 一种电子级三氟化氯制备用原材料纯化设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2986885B2 (ja) * 1990-10-03 1999-12-06 財団法人川村理化学研究所 電解フッ素化方法およびその装置
US6843258B2 (en) * 2000-12-19 2005-01-18 Applied Materials, Inc. On-site cleaning gas generation for process chamber cleaning
US20030121796A1 (en) * 2001-11-26 2003-07-03 Siegele Stephen H Generation and distribution of molecular fluorine within a fabrication facility
US20040151656A1 (en) * 2001-11-26 2004-08-05 Siegele Stephen H. Modular molecular halogen gas generation system
JP3855081B2 (ja) * 2002-07-01 2006-12-06 株式会社日立国際電気 フッ素ガスによるクリーニング機構を備えたcvd装置およびcvd装置のフッ素ガスによるクリーニング方法
JP3905433B2 (ja) 2002-07-11 2007-04-18 レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
KR100533411B1 (ko) * 2002-11-08 2005-12-02 도요탄소 가부시키가이샤 불소가스 발생장치와 그 전해욕 액면 제어방법
JP4624699B2 (ja) * 2004-03-18 2011-02-02 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
JP5055484B2 (ja) 2009-01-28 2012-10-24 株式会社メガチップス 撮像システム

Also Published As

Publication number Publication date
WO2010113611A1 (ja) 2010-10-07
EP2415906A1 (en) 2012-02-08
CN102369311A (zh) 2012-03-07
JP5572981B2 (ja) 2014-08-20
JP2010242127A (ja) 2010-10-28
EP2415906A4 (en) 2012-08-29

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Effective date: 20140523