JP5906742B2 - フッ素ガス生成装置 - Google Patents
フッ素ガス生成装置 Download PDFInfo
- Publication number
- JP5906742B2 JP5906742B2 JP2012000408A JP2012000408A JP5906742B2 JP 5906742 B2 JP5906742 B2 JP 5906742B2 JP 2012000408 A JP2012000408 A JP 2012000408A JP 2012000408 A JP2012000408 A JP 2012000408A JP 5906742 B2 JP5906742 B2 JP 5906742B2
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- JP
- Japan
- Prior art keywords
- hydrogen fluoride
- liquid level
- fluorine gas
- vaporizer
- electrolytic cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims description 65
- 239000011737 fluorine Substances 0.000 title claims description 65
- 229910052731 fluorine Inorganic materials 0.000 title claims description 65
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 158
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 157
- 239000007789 gas Substances 0.000 claims description 83
- 239000007788 liquid Substances 0.000 claims description 74
- 239000006200 vaporizer Substances 0.000 claims description 38
- 150000003839 salts Chemical class 0.000 claims description 30
- 230000008016 vaporization Effects 0.000 claims description 25
- 238000001514 detection method Methods 0.000 claims description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 14
- 238000009834 vaporization Methods 0.000 claims description 13
- 239000002994 raw material Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 239000006227 byproduct Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005192 partition Methods 0.000 description 5
- 239000011698 potassium fluoride Substances 0.000 description 5
- 239000012159 carrier gas Substances 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/20—Fluorine
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
上記の本発明の実施の形態以外に、他の変形例として、図3に示すように、気化器60と、電解槽1を同一の筐体80に収容する構成にしてもよい。近年、フッ素ガス生成装置は小型化が要求されており、フッ素ガス生成装置を構成する設備、機器はより小型化されたものが望まれる。
1 電解槽
2 フッ素ガス供給系
3 副生ガス供給系
4 外部装置
5 原料供給系
7 陽極
8 陰極
11a 第1気室
12a 第2気室
15 第1メイン通路
17 第1ポンプ
20 精製装置
30 第2メイン通路
31 第2ポンプ
60 気化器
61 中空容器
62 フッ化水素導入部
63 フッ化水素導出部
64 温度調節器
65 気化室
66 凸部(フィン)
67 挿入管
68 圧力検出器
69 液面検出器
70 コントローラ(制御手段)
71 流量制御弁
80 筐体
Claims (4)
- フッ化水素を含む溶融塩中のフッ化水素を電気分解することによって、フッ素ガスを生成するフッ素ガス生成装置であって、
フッ化水素を含む溶融塩からなる電解浴中でフッ化水素を電解することによって陽極側にフッ素ガスを主成分とする主生ガスを発生させると共に、陰極側に水素ガスを主成分とする副生ガスを発生させる電解槽と、
前記電解槽に補充するためのフッ化水素が貯留されたフッ化水素供給源と、
前記フッ化水素供給源のフッ化水素を前記電解槽中の溶融塩中に補充するためのフッ化水素供給通路と、
前記フッ化水素供給通路に設けられ、前記フッ化水素供給源から供給された液体のフッ化水素を収容し気化させる気化器と、
前記気化器内に供給されるフッ化水素の量を調整する流量制御弁と、
を備え、
前記気化器は、
液体のフッ化水素を加熱して気化させる温度調節器を備え、内部に液体のフッ化水素を収容する気化室が形成された中空容器と、
前記フッ化水素供給源から供給される液体のフッ化水素を前記中空容器に導入するフッ化水素導入部と、
前記気化室から、気化されたフッ化水素を前記フッ化水素供給通路を通して前記溶融塩中に導出するフッ化水素導出部と、
を備え、
さらに、
前記気化器内に収容されたフッ化水素の液面を検出する液面検出手段と、
前記液面検出手段の検出結果に基づいて、前記気化器内のフッ化水素の液面が常に一定値になるように、前記流量制御弁の開度を制御する制御手段と、
を備える、
ことを特徴とするフッ素ガス生成装置。 - 前記液面検出手段が、前記気化室内の圧力を検知する圧力検出器、又は、前記気化室内のフッ化水素の液面を検知する液面検出器である、請求項1のフッ素ガス生成装置。
- 前記温度調節器は、前記中空容器の外部に設けたヒーターからなり、気化室の内壁面に、温度調節器からの熱を伝える複数の凸部が設けられている、請求項1又は請求項2のフッ素ガス生成装置。
- 前記電解槽と前記気化器とが、同一の筐体に収容される、請求項1から請求項3の何れかのフッ素ガス生成装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012000408A JP5906742B2 (ja) | 2012-01-05 | 2012-01-05 | フッ素ガス生成装置 |
KR1020147018495A KR20140101407A (ko) | 2012-01-05 | 2012-10-31 | 불소가스 생성 장치 |
PCT/JP2012/078114 WO2013103042A1 (ja) | 2012-01-05 | 2012-10-31 | フッ素ガス生成装置 |
US14/358,630 US20140326596A1 (en) | 2012-01-05 | 2012-10-31 | Fluorine Gas Generation Apparatus |
TW101149179A TW201331419A (zh) | 2012-01-05 | 2012-12-21 | 氟氣生成裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012000408A JP5906742B2 (ja) | 2012-01-05 | 2012-01-05 | フッ素ガス生成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013139606A JP2013139606A (ja) | 2013-07-18 |
JP5906742B2 true JP5906742B2 (ja) | 2016-04-20 |
Family
ID=48745109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012000408A Active JP5906742B2 (ja) | 2012-01-05 | 2012-01-05 | フッ素ガス生成装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20140326596A1 (ja) |
JP (1) | JP5906742B2 (ja) |
KR (1) | KR20140101407A (ja) |
TW (1) | TW201331419A (ja) |
WO (1) | WO2013103042A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220065864A (ko) * | 2019-12-27 | 2022-05-20 | 쇼와 덴코 가부시키가이샤 | 불소 가스의 제조 방법 및 불소 가스 제조 장치 |
CN113430542A (zh) * | 2021-07-08 | 2021-09-24 | 中核四0四有限公司 | 一种制氟电解槽液态氟化氢集中供料装置 |
CN113430543A (zh) * | 2021-07-08 | 2021-09-24 | 中核四0四有限公司 | 一种制氟电解槽液态氟化氢集中供料方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08128596A (ja) * | 1994-10-28 | 1996-05-21 | Fujitsu Ltd | ガス蒸発装置及びガス供給方法 |
JP2003160869A (ja) * | 2001-11-27 | 2003-06-06 | Japan Science & Technology Corp | 液体気化器、液体気化供給システム及び液体気化制御方法 |
JP3569279B2 (ja) * | 2001-12-17 | 2004-09-22 | 東洋炭素株式会社 | F2ガス発生装置及びf2ガス発生方法並びにf2ガス |
GB0216828D0 (en) * | 2002-07-19 | 2002-08-28 | Boc Group Plc | Apparatus and method for fluorine production |
US7680399B2 (en) * | 2006-02-07 | 2010-03-16 | Brooks Instrument, Llc | System and method for producing and delivering vapor |
JP4999605B2 (ja) * | 2007-08-23 | 2012-08-15 | 日本エア・リキード株式会社 | 液化ガスの気化方法、気化装置およびこれを用いた液化ガス供給装置 |
JP5584904B2 (ja) * | 2008-03-11 | 2014-09-10 | 東洋炭素株式会社 | フッ素ガス発生装置 |
JP5461786B2 (ja) * | 2008-04-01 | 2014-04-02 | 株式会社フジキン | 気化器を備えたガス供給装置 |
JP5388538B2 (ja) * | 2008-10-27 | 2014-01-15 | 東洋炭素株式会社 | 気体発生装置 |
JP2011058015A (ja) * | 2009-09-07 | 2011-03-24 | Toyo Tanso Kk | 電解装置 |
JP5375673B2 (ja) * | 2010-03-01 | 2013-12-25 | セントラル硝子株式会社 | フッ素ガス生成装置 |
-
2012
- 2012-01-05 JP JP2012000408A patent/JP5906742B2/ja active Active
- 2012-10-31 WO PCT/JP2012/078114 patent/WO2013103042A1/ja active Application Filing
- 2012-10-31 KR KR1020147018495A patent/KR20140101407A/ko not_active Application Discontinuation
- 2012-10-31 US US14/358,630 patent/US20140326596A1/en not_active Abandoned
- 2012-12-21 TW TW101149179A patent/TW201331419A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2013103042A1 (ja) | 2013-07-11 |
JP2013139606A (ja) | 2013-07-18 |
TW201331419A (zh) | 2013-08-01 |
KR20140101407A (ko) | 2014-08-19 |
US20140326596A1 (en) | 2014-11-06 |
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