CN102369311A - 氟气生成装置 - Google Patents

氟气生成装置 Download PDF

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Publication number
CN102369311A
CN102369311A CN2010800147025A CN201080014702A CN102369311A CN 102369311 A CN102369311 A CN 102369311A CN 2010800147025 A CN2010800147025 A CN 2010800147025A CN 201080014702 A CN201080014702 A CN 201080014702A CN 102369311 A CN102369311 A CN 102369311A
Authority
CN
China
Prior art keywords
gas
mentioned
fluorine gas
refining plant
hydrogen fluoride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010800147025A
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English (en)
Chinese (zh)
Inventor
毛利勇
八尾章史
宫崎达夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of CN102369311A publication Critical patent/CN102369311A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C25B15/021—Process control or regulation of heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
CN2010800147025A 2009-04-01 2010-03-04 氟气生成装置 Pending CN102369311A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-089444 2009-04-01
JP2009089444A JP5572981B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置
PCT/JP2010/054061 WO2010113611A1 (ja) 2009-04-01 2010-03-04 フッ素ガス生成装置

Publications (1)

Publication Number Publication Date
CN102369311A true CN102369311A (zh) 2012-03-07

Family

ID=42827911

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800147025A Pending CN102369311A (zh) 2009-04-01 2010-03-04 氟气生成装置

Country Status (5)

Country Link
EP (1) EP2415906A4 (ja)
JP (1) JP5572981B2 (ja)
KR (1) KR20110129914A (ja)
CN (1) CN102369311A (ja)
WO (1) WO2010113611A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117160179A (zh) * 2023-10-26 2023-12-05 福建德尔科技股份有限公司 一种电子级三氟化氯制备用原材料纯化设备

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101198350B1 (ko) 2011-04-05 2012-11-08 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제용기
JP5757168B2 (ja) * 2011-06-10 2015-07-29 セントラル硝子株式会社 フッ素ガス生成装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2986885B2 (ja) * 1990-10-03 1999-12-06 財団法人川村理化学研究所 電解フッ素化方法およびその装置
JP2004039740A (ja) * 2002-07-01 2004-02-05 Research Institute Of Innovative Technology For The Earth フッ素ガスによるクリーニング機構を備えたｃｖｄ装置およびｃｖｄ装置のフッ素ガスによるクリーニング方法
CN1610573A (zh) * 2001-11-26 2005-04-27 氟在线有限公司 分子氟在制造设施中的产生,分布,和使用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6843258B2 (en) * 2000-12-19 2005-01-18 Applied Materials, Inc. On-site cleaning gas generation for process chamber cleaning
US20040151656A1 (en) * 2001-11-26 2004-08-05 Siegele Stephen H. Modular molecular halogen gas generation system
JP3905433B2 (ja) 2002-07-11 2007-04-18 レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
KR100533411B1 (ko) * 2002-11-08 2005-12-02 도요탄소 가부시키가이샤 불소가스 발생장치와 그 전해욕 액면 제어방법
JP4624699B2 (ja) * 2004-03-18 2011-02-02 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
JP5055484B2 (ja) 2009-01-28 2012-10-24 株式会社メガチップス 撮像システム

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2986885B2 (ja) * 1990-10-03 1999-12-06 財団法人川村理化学研究所 電解フッ素化方法およびその装置
CN1610573A (zh) * 2001-11-26 2005-04-27 氟在线有限公司 分子氟在制造设施中的产生,分布,和使用
JP2004039740A (ja) * 2002-07-01 2004-02-05 Research Institute Of Innovative Technology For The Earth フッ素ガスによるクリーニング機構を備えたｃｖｄ装置およびｃｖｄ装置のフッ素ガスによるクリーニング方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117160179A (zh) * 2023-10-26 2023-12-05 福建德尔科技股份有限公司 一种电子级三氟化氯制备用原材料纯化设备
CN117160179B (zh) * 2023-10-26 2024-02-13 福建德尔科技股份有限公司 一种电子级三氟化氯制备用原材料纯化设备

Also Published As

Publication number Publication date
WO2010113611A1 (ja) 2010-10-07
EP2415906A1 (en) 2012-02-08
EP2415906A4 (en) 2012-08-29
JP2010242127A (ja) 2010-10-28
JP5572981B2 (ja) 2014-08-20
KR20110129914A (ko) 2011-12-02

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PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20120307