KR20100119780A - 2개의 기판을 본딩하는 프로세싱 - Google Patents

2개의 기판을 본딩하는 프로세싱 Download PDF

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Publication number
KR20100119780A
KR20100119780A KR1020107019406A KR20107019406A KR20100119780A KR 20100119780 A KR20100119780 A KR 20100119780A KR 1020107019406 A KR1020107019406 A KR 1020107019406A KR 20107019406 A KR20107019406 A KR 20107019406A KR 20100119780 A KR20100119780 A KR 20100119780A
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KR
South Korea
Prior art keywords
gas flow
substrates
bonding
gas
flow
Prior art date
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Ceased
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KR1020107019406A
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English (en)
Korean (ko)
Inventor
그웰따즈 고댕
파브리스 랄르망
시릴 콜나
파스칼 지아르
Original Assignee
에스오아이테크 실리콘 온 인슐레이터 테크놀로지스
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Application filed by 에스오아이테크 실리콘 온 인슐레이터 테크놀로지스 filed Critical 에스오아이테크 실리콘 온 인슐레이터 테크놀로지스
Publication of KR20100119780A publication Critical patent/KR20100119780A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185—Joining of semiconductor bodies for junction formation
    • H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
KR1020107019406A 2008-02-15 2009-01-23 2개의 기판을 본딩하는 프로세싱 Ceased KR20100119780A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08290150.5 2008-02-15
EP08290150A EP2091071B1 (en) 2008-02-15 2008-02-15 Process for bonding two substrates

Publications (1)

Publication Number Publication Date
KR20100119780A true KR20100119780A (ko) 2010-11-10

Family

ID=39577753

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107019406A Ceased KR20100119780A (ko) 2008-02-15 2009-01-23 2개의 기판을 본딩하는 프로세싱

Country Status (6)

Country Link
US (2) US20110000612A1 (enExample)
EP (1) EP2091071B1 (enExample)
JP (1) JP2011514669A (enExample)
KR (1) KR20100119780A (enExample)
CN (1) CN101925978A (enExample)
WO (1) WO2009101495A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230288916A1 (en) * 2022-03-11 2023-09-14 Applied Materials, Inc. Apparatus for environmental control of dies and substrates for hybrid bonding

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FR2963157B1 (fr) * 2010-07-22 2013-04-26 Soitec Silicon On Insulator Procede et appareil de collage par adhesion moleculaire de deux plaques
FR2963982B1 (fr) * 2010-08-20 2012-09-28 Soitec Silicon On Insulator Procede de collage a basse temperature
JP2013008921A (ja) * 2011-06-27 2013-01-10 Toshiba Corp 半導体製造装置及び製造方法
JP2014188536A (ja) * 2013-03-26 2014-10-06 National Institute For Materials Science 金属材の拡散接合方法および金属材の拡散接合装置
US9922851B2 (en) 2014-05-05 2018-03-20 International Business Machines Corporation Gas-controlled bonding platform for edge defect reduction during wafer bonding
CN105197880B (zh) * 2014-06-24 2018-03-20 中芯国际集成电路制造(上海)有限公司 一种带空腔晶片的键合方法
FR3029352B1 (fr) 2014-11-27 2017-01-06 Soitec Silicon On Insulator Procede d'assemblage de deux substrats
SG11201706844QA (en) 2015-04-10 2017-10-30 Ev Group E Thallner Gmbh Substrate holder and method for bonding two substrates
US11056356B1 (en) * 2017-09-01 2021-07-06 Intel Corporation Fluid viscosity control during wafer bonding
CN109887860B (zh) * 2018-12-28 2020-12-25 上海集成电路研发中心有限公司 一种键合腔体结构及键合方法
KR102808554B1 (ko) 2019-11-07 2025-05-16 삼성전자주식회사 기판 본딩 장치
KR20250044459A (ko) * 2020-03-06 2025-03-31 가부시키가이샤 니콘 제어 장치, 제어 방법 및 프로그램
JP7014850B2 (ja) * 2020-04-28 2022-02-01 エーファウ・グループ・エー・タルナー・ゲーエムベーハー ２つの基板をボンディングするための基板ホルダおよび方法
CN113707564B (zh) * 2021-08-31 2024-06-21 浙江同芯祺科技有限公司 一种超薄半导体基板加工工艺
CN118560040B (zh) * 2024-07-31 2024-12-03 浙江方氏眼镜制造有限公司 一种塑料眼镜架板材贴合加工设备及贴合加工方法

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DE4133820A1 (de) * 1991-10-12 1993-04-15 Bosch Gmbh Robert Verfahren zur herstellung von halbleiterelementen
JP3321882B2 (ja) * 1993-02-28 2002-09-09 ソニー株式会社 基板はり合わせ方法
JPH0745801A (ja) * 1993-08-03 1995-02-14 Matsushita Electric Ind Co Ltd 基板の接合方法
SE507152C2 (sv) 1996-08-22 1998-04-06 Volvo Lastvagnar Ab Anordning och förfarande för reglering av luftkompressor
DE19737051B4 (de) 1997-08-26 2007-02-15 Knorr-Bremse Systeme für Nutzfahrzeuge GmbH Verfahren und Vorrichtung zur Steuerung wenigstens einer Komponente einer pneumatischen Bremsanlage eines Fahrzeugs
DE10048374B4 (de) * 1999-10-01 2009-06-10 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren zum großflächigen Verbinden von Verbindungshalbleitermaterialien
JP4316157B2 (ja) * 2001-05-10 2009-08-19 株式会社東芝 化合物半導体素子の製造方法及びウェハ接着装置
US6372561B1 (en) * 2001-06-01 2002-04-16 Advanced Micro Devices, Inc. Fabrication of fully depleted field effect transistor formed in SOI technology with a single implantation step
KR100442310B1 (ko) 2001-11-28 2004-07-30 최우범 플라즈마 전처리를 구비한 기판접합장치 및 그 제어방법
DE10240600A1 (de) * 2002-09-03 2004-03-18 Knorr-Bremse Systeme für Nutzfahrzeuge GmbH Verfahren zur Erzeugung von Druckluft und Kompressoranordnung zur Durchführung des Verfahrens
JP2006134900A (ja) * 2002-11-28 2006-05-25 Toray Eng Co Ltd 接合方法および装置
DE10344113A1 (de) * 2003-09-24 2005-05-04 Erich Thallner Vorrichtung und Verfahren zum Verbinden von Wafern
US7645681B2 (en) * 2003-12-02 2010-01-12 Bondtech, Inc. Bonding method, device produced by this method, and bonding device
WO2005055293A1 (ja) * 2003-12-02 2005-06-16 Bondtech Inc. 接合方法及びこの方法により作成されるデバイス並びに表面活性化装置及びこの装置を備えた接合装置
US7601271B2 (en) 2005-11-28 2009-10-13 S.O.I.Tec Silicon On Insulator Technologies Process and equipment for bonding by molecular adhesion
DE102006000687B4 (de) * 2006-01-03 2010-09-09 Thallner, Erich, Dipl.-Ing. Kombination aus einem Träger und einem Wafer, Vorrichtung zum Trennen der Kombination und Verfahren zur Handhabung eines Trägers und eines Wafers
US7554103B2 (en) * 2006-06-26 2009-06-30 Applied Materials, Inc. Increased tool utilization/reduction in MWBC for UV curing chamber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230288916A1 (en) * 2022-03-11 2023-09-14 Applied Materials, Inc. Apparatus for environmental control of dies and substrates for hybrid bonding
US12001193B2 (en) * 2022-03-11 2024-06-04 Applied Materials, Inc. Apparatus for environmental control of dies and substrates for hybrid bonding

Also Published As

Publication number Publication date
CN101925978A (zh) 2010-12-22
US20110000612A1 (en) 2011-01-06
US20130139946A1 (en) 2013-06-06
WO2009101495A1 (en) 2009-08-20
EP2091071A1 (en) 2009-08-19
JP2011514669A (ja) 2011-05-06
US8999090B2 (en) 2015-04-07
EP2091071B1 (en) 2012-12-12

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