KR20070092615A - 세라믹 분말 및 이것을 사용한 도전 페이스트, 적층 세라믹전자부품, 그 제조방법 - Google Patents
세라믹 분말 및 이것을 사용한 도전 페이스트, 적층 세라믹전자부품, 그 제조방법 Download PDFInfo
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Abstract
Description
Claims (10)
- 유전체 세라믹층과 내부전극층이 번갈아 적층된 적층 세라믹 전자부품의 상기 내부전극층을 형성하기 위한 도전 페이스트에 첨가되는 세라믹 분말로서,페로브스카이트형 결정구조를 갖고, 테트라고날상의 함유량 Wt와 큐빅상의 함유량 Wc의 중량비율 Wt/Wc를 X라고 했을 때에, X≥2인 것을 특징으로 하는 세라믹 분말.
- 제 1 항에 있어서, 상기 테트라고날상의 함유량 Wt와 큐빅상의 함유량 Wc는 리트벨트법에 의한 다상 해석에 의해 구해진 값인 것을 특징으로 하는 세라믹 분말.
- 제 1 항 또는 제 2 항에 있어서, 비표면적이 10m2/g 이상인 것을 특징으로 하는 세라믹 분말.
- 제 1 항 또는 제 2 항에 있어서, 티탄산 바륨 분말을 주성분으로 하는 것을 특징으로 하는 세라믹 분말.
- 유전체 세라믹층과 내부전극층이 번갈아 적층된 적층 세라믹 전자부품의 상 기 내부전극층을 형성하기 위한 도전 페이스트로서,도전재료와 세라믹 분말을 함유하고, 상기 세라믹 분말로서 제 1 항 또는 제 2 항에 기재된 세라믹 분말을 포함하는 것을 특징으로 하는 도전 페이스트.
- 제 5 항에 있어서, 상기 도전재료는 비금속을 주성분으로 하는 것을 특징으로 하는 도전 페이스트.
- 제 6 항에 있어서, 상기 비금속이 Ni인 것을 특징으로 하는 도전 페이스트.
- 유전체 세라믹층과 내부전극층이 번갈아 적층된 적층 세라믹 전자부품으로서,상기 내부전극층은, 제 5 항에 기재된 도전 페이스트에 의해 전극 전구체층을 형성하고, 이것을 소성함으로써 형성되는 것을 특징으로 하는 적층 세라믹 전자부품.
- 제 8 항에 있어서, 적층 세라믹 콘덴서인 것을 특징으로 하는 적층 세라믹 전자부품.
- 유전체 페이스트와 도전 페이스트에 의해 유전체 그린시트와 전극 전구체층을 번갈아 적층 형성한 후, 이것을 소성하여 적층 세라믹 전자부품으로 할 때에,상기 도전 페이스트로서 제 5 항에 기재된 도전 페이스트를 사용하는 것을 특징으로 하는 적층 세라믹 전자부품의 제조방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2006065946A JP2007243026A (ja) | 2006-03-10 | 2006-03-10 | セラミック粉末及びこれを用いた導電ペースト、積層セラミック電子部品、その製造方法 |
JPJP-P-2006-00065946 | 2006-03-10 |
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KR20070092615A true KR20070092615A (ko) | 2007-09-13 |
KR100832372B1 KR100832372B1 (ko) | 2008-05-26 |
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KR1020070020363A KR100832372B1 (ko) | 2006-03-10 | 2007-02-28 | 세라믹 분말 및 이것을 사용한 도전 페이스트, 적층 세라믹전자부품, 그 제조방법 |
Country Status (6)
Country | Link |
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US (1) | US20070211406A1 (ko) |
EP (1) | EP1832564A2 (ko) |
JP (1) | JP2007243026A (ko) |
KR (1) | KR100832372B1 (ko) |
CN (1) | CN101034598A (ko) |
TW (1) | TW200746196A (ko) |
Families Citing this family (8)
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JP4827011B2 (ja) * | 2006-03-10 | 2011-11-30 | Tdk株式会社 | セラミック粉末及びこれを用いた誘電体ペースト、積層セラミック電子部品、その製造方法 |
JP5141708B2 (ja) | 2010-03-29 | 2013-02-13 | Tdk株式会社 | 電子部品および電子部品の製造方法 |
CN102148097B (zh) * | 2010-12-03 | 2013-04-24 | 无锡索垠飞科技有限公司 | 电容器储能电池及其高比表面积电极的制备方法 |
CN102035265B (zh) * | 2010-12-06 | 2013-11-20 | 南京科孚纳米技术有限公司 | 电容器储能电池无线充电系统 |
JP2012169594A (ja) * | 2011-01-26 | 2012-09-06 | Murata Mfg Co Ltd | セラミック電子部品の製造方法及びセラミック電子部品 |
WO2013157516A1 (ja) * | 2012-04-19 | 2013-10-24 | 株式会社村田製作所 | 導電性ペースト、積層セラミック電子部品、および該積層セラミック電子部品の製造方法 |
JP6000983B2 (ja) * | 2012-11-20 | 2016-10-05 | Jfeミネラル株式会社 | ニッケル粉末、導電ペースト、および、積層セラミック電子部品 |
JP6841036B2 (ja) * | 2016-12-28 | 2021-03-10 | Tdk株式会社 | 積層セラミック電子部品 |
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DE69532235T2 (de) * | 1994-10-19 | 2004-09-16 | Tdk Corp. | Keramischer mehrschicht-chipkondensator |
JP4660935B2 (ja) * | 2001-02-05 | 2011-03-30 | 株式会社村田製作所 | 正方晶ペロブスカイト構造を有するチタン酸バリウム系セラミック粉末の製造方法 |
JP4366456B2 (ja) * | 2003-03-20 | 2009-11-18 | 国立大学法人山梨大学 | 誘電体材料およびその製造方法 |
JP4407299B2 (ja) * | 2004-01-30 | 2010-02-03 | Tdk株式会社 | 積層セラミックコンデンサ |
JP2005272295A (ja) * | 2004-02-26 | 2005-10-06 | Dowa Mining Co Ltd | 正方晶チタン酸バリウム粒子およびその製造方法並びにセラミックコンデンサ |
JP4702515B2 (ja) * | 2004-03-31 | 2011-06-15 | 戸田工業株式会社 | 正方晶系チタン酸バリウム微粒子粉末及びその製造法 |
JP2005347288A (ja) * | 2004-05-31 | 2005-12-15 | Tdk Corp | 積層セラミックコンデンサの製造方法 |
JP2006117446A (ja) * | 2004-10-19 | 2006-05-11 | Tokyo Institute Of Technology | チタン酸バリウム粉末およびその製造方法 |
-
2006
- 2006-03-10 JP JP2006065946A patent/JP2007243026A/ja active Pending
-
2007
- 2007-02-06 TW TW096104224A patent/TW200746196A/zh unknown
- 2007-02-28 KR KR1020070020363A patent/KR100832372B1/ko active IP Right Grant
- 2007-03-06 US US11/714,187 patent/US20070211406A1/en not_active Abandoned
- 2007-03-07 CN CNA2007100860205A patent/CN101034598A/zh active Pending
- 2007-03-07 EP EP07250951A patent/EP1832564A2/en not_active Withdrawn
Also Published As
Publication number | Publication date |
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CN101034598A (zh) | 2007-09-12 |
TW200746196A (en) | 2007-12-16 |
JP2007243026A (ja) | 2007-09-20 |
EP1832564A2 (en) | 2007-09-12 |
US20070211406A1 (en) | 2007-09-13 |
KR100832372B1 (ko) | 2008-05-26 |
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