KR20060129050A - 저항 내장 바이폴라 트랜지스터 - Google Patents

저항 내장 바이폴라 트랜지스터 Download PDF

Info

Publication number
KR20060129050A
KR20060129050A KR1020067018390A KR20067018390A KR20060129050A KR 20060129050 A KR20060129050 A KR 20060129050A KR 1020067018390 A KR1020067018390 A KR 1020067018390A KR 20067018390 A KR20067018390 A KR 20067018390A KR 20060129050 A KR20060129050 A KR 20060129050A
Authority
KR
South Korea
Prior art keywords
semiconductor substrate
type
resistor
region
bipolar transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020067018390A
Other languages
English (en)
Korean (ko)
Inventor
타이라 마츠나가
Original Assignee
이사하야덴시 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이사하야덴시 가부시키가이샤 filed Critical 이사하야덴시 가부시키가이샤
Publication of KR20060129050A publication Critical patent/KR20060129050A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611Combinations of BJTs and one or more of diodes, resistors or capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/101Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
    • H10D84/121BJTs having built-in components
    • H10D84/125BJTs having built-in components the built-in components being resistive elements, e.g. BJT having a built-in ballasting resistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611Combinations of BJTs and one or more of diodes, resistors or capacitors
    • H10D84/613Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
    • H10D84/617Combinations of vertical BJTs and only diodes

Landscapes

  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
KR1020067018390A 2004-04-02 2004-09-22 저항 내장 바이폴라 트랜지스터 Ceased KR20060129050A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004109640A JP2005294659A (ja) 2004-04-02 2004-04-02 抵抗内蔵バイポーラトランジスタ
JPJP-P-2004-00109640 2004-04-02

Publications (1)

Publication Number Publication Date
KR20060129050A true KR20060129050A (ko) 2006-12-14

Family

ID=35150260

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067018390A Ceased KR20060129050A (ko) 2004-04-02 2004-09-22 저항 내장 바이폴라 트랜지스터

Country Status (4)

Country Link
JP (1) JP2005294659A (enExample)
KR (1) KR20060129050A (enExample)
CN (1) CN100444401C (enExample)
WO (1) WO2005101517A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020194850A (ja) * 2019-05-27 2020-12-03 イサハヤ電子株式会社 多用途抵抗付きトランジスタ

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5247392Y2 (enExample) * 1972-12-11 1977-10-27
JP2757864B2 (ja) * 1986-07-03 1998-05-25 ローム 株式会社 半導体装置
CN1035849C (zh) * 1992-07-22 1997-09-10 天津大学 一种具有双负阻特性的负阻器件
JPH0722164B2 (ja) * 1992-09-17 1995-03-08 ローム株式会社 抵抗内蔵トランジスタ
JP2648808B2 (ja) * 1992-12-18 1997-09-03 華邦電子股▲ふん▼有限公司 BiCMOS用バイポーラトランジスタ製造法
JPH08279561A (ja) * 1995-04-07 1996-10-22 Mitsubishi Electric Corp バイポーラトランジスタ並びに該バイポーラトランジスタを用いた増幅器および集積回路
KR100258436B1 (ko) * 1996-10-11 2000-06-01 김덕중 상보형 쌍극성 트랜지스터 및 그 제조 방법
CN2275248Y (zh) * 1996-10-17 1998-02-25 东南大学 厚膜集成阻抗变换功能模块

Also Published As

Publication number Publication date
CN1926689A (zh) 2007-03-07
WO2005101517A1 (ja) 2005-10-27
CN100444401C (zh) 2008-12-17
JP2005294659A (ja) 2005-10-20

Similar Documents

Publication Publication Date Title
KR100683100B1 (ko) 반도체 집적 회로 장치 및 그 제조 방법
KR100258436B1 (ko) 상보형 쌍극성 트랜지스터 및 그 제조 방법
KR100683099B1 (ko) 반도체 집적 회로 장치 및 그 제조 방법
US7089525B2 (en) Semiconductor device and method for fabricating the same
KR100684676B1 (ko) 반도체 집적 회로 장치
US5481132A (en) Transistor with a predetermined current gain in a bipolar integrated circuit
KR20060129050A (ko) 저항 내장 바이폴라 트랜지스터
JPS6133261B2 (enExample)
US20040120085A1 (en) Semiconductor device with surge protection circuit
KR100208645B1 (ko) 광 반도체 장치
JPH10125692A (ja) バイポーラ・パワー・トランジスタ
US4249192A (en) Monolithic integrated semiconductor diode arrangement
JPS61134036A (ja) 半導体集積回路の製造方法
US5323056A (en) Bipolar transistor with a particular emitter structure
JPH0246735A (ja) バイポーラ形薄膜半導体装置
KR870009476A (ko) 프로그램 가능 트랜지스터 및 그의 제조방법
JP2558472B2 (ja) 半導体集積回路
JP2940203B2 (ja) セミカスタム半導体集積回路
JPS5882562A (ja) 半導体装置
JP2005033199A (ja) パワーIGBT(InsulatedGateBipolarTransistor:集積ゲートバイポーラトランジスター)デバイスを有するモノリシリック集積抵抗構造
JPH02276271A (ja) バイポーラ・cmos半導体装置及びその製造方法
JPH0474478A (ja) ダイオード
JPS60180138A (ja) 半導体装置
JPH11186282A (ja) 半導体装置
JPS61207067A (ja) 半導体集積回路装置の製造方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20060908

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination
PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20070719

Patent event code: PE09021S01D

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20071228

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20080324

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20071228

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

Patent event date: 20070719

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I