JP2005294659A - 抵抗内蔵バイポーラトランジスタ - Google Patents
抵抗内蔵バイポーラトランジスタ Download PDFInfo
- Publication number
- JP2005294659A JP2005294659A JP2004109640A JP2004109640A JP2005294659A JP 2005294659 A JP2005294659 A JP 2005294659A JP 2004109640 A JP2004109640 A JP 2004109640A JP 2004109640 A JP2004109640 A JP 2004109640A JP 2005294659 A JP2005294659 A JP 2005294659A
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- built
- semiconductor substrate
- type
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 52
- 239000012535 impurity Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 230000003321 amplification Effects 0.000 abstract description 2
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/101—Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
- H10D84/121—BJTs having built-in components
- H10D84/125—BJTs having built-in components the built-in components being resistive elements, e.g. BJT having a built-in ballasting resistor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
- H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
- H10D84/617—Combinations of vertical BJTs and only diodes
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004109640A JP2005294659A (ja) | 2004-04-02 | 2004-04-02 | 抵抗内蔵バイポーラトランジスタ |
| KR1020067018390A KR20060129050A (ko) | 2004-04-02 | 2004-09-22 | 저항 내장 바이폴라 트랜지스터 |
| CNB2004800424732A CN100444401C (zh) | 2004-04-02 | 2004-09-22 | 电阻内置型双极晶体管 |
| PCT/JP2004/013783 WO2005101517A1 (ja) | 2004-04-02 | 2004-09-22 | 抵抗内蔵バイポーラトランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004109640A JP2005294659A (ja) | 2004-04-02 | 2004-04-02 | 抵抗内蔵バイポーラトランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005294659A true JP2005294659A (ja) | 2005-10-20 |
| JP2005294659A5 JP2005294659A5 (enExample) | 2007-05-17 |
Family
ID=35150260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004109640A Pending JP2005294659A (ja) | 2004-04-02 | 2004-04-02 | 抵抗内蔵バイポーラトランジスタ |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2005294659A (enExample) |
| KR (1) | KR20060129050A (enExample) |
| CN (1) | CN100444401C (enExample) |
| WO (1) | WO2005101517A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020194850A (ja) * | 2019-05-27 | 2020-12-03 | イサハヤ電子株式会社 | 多用途抵抗付きトランジスタ |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5247392Y2 (enExample) * | 1972-12-11 | 1977-10-27 | ||
| JP2757864B2 (ja) * | 1986-07-03 | 1998-05-25 | ローム 株式会社 | 半導体装置 |
| CN1035849C (zh) * | 1992-07-22 | 1997-09-10 | 天津大学 | 一种具有双负阻特性的负阻器件 |
| JPH0722164B2 (ja) * | 1992-09-17 | 1995-03-08 | ローム株式会社 | 抵抗内蔵トランジスタ |
| JP2648808B2 (ja) * | 1992-12-18 | 1997-09-03 | 華邦電子股▲ふん▼有限公司 | BiCMOS用バイポーラトランジスタ製造法 |
| JPH08279561A (ja) * | 1995-04-07 | 1996-10-22 | Mitsubishi Electric Corp | バイポーラトランジスタ並びに該バイポーラトランジスタを用いた増幅器および集積回路 |
| KR100258436B1 (ko) * | 1996-10-11 | 2000-06-01 | 김덕중 | 상보형 쌍극성 트랜지스터 및 그 제조 방법 |
| CN2275248Y (zh) * | 1996-10-17 | 1998-02-25 | 东南大学 | 厚膜集成阻抗变换功能模块 |
-
2004
- 2004-04-02 JP JP2004109640A patent/JP2005294659A/ja active Pending
- 2004-09-22 KR KR1020067018390A patent/KR20060129050A/ko not_active Ceased
- 2004-09-22 CN CNB2004800424732A patent/CN100444401C/zh not_active Expired - Fee Related
- 2004-09-22 WO PCT/JP2004/013783 patent/WO2005101517A1/ja not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020194850A (ja) * | 2019-05-27 | 2020-12-03 | イサハヤ電子株式会社 | 多用途抵抗付きトランジスタ |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1926689A (zh) | 2007-03-07 |
| KR20060129050A (ko) | 2006-12-14 |
| WO2005101517A1 (ja) | 2005-10-27 |
| CN100444401C (zh) | 2008-12-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070322 |
|
| A621 | Written request for application examination |
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| A871 | Explanation of circumstances concerning accelerated examination |
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| A975 | Report on accelerated examination |
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| A131 | Notification of reasons for refusal |
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| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080702 |
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| A02 | Decision of refusal |
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