KR20060026035A - 무전해 금도금액 - Google Patents
무전해 금도금액 Download PDFInfo
- Publication number
- KR20060026035A KR20060026035A KR1020057023237A KR20057023237A KR20060026035A KR 20060026035 A KR20060026035 A KR 20060026035A KR 1020057023237 A KR1020057023237 A KR 1020057023237A KR 20057023237 A KR20057023237 A KR 20057023237A KR 20060026035 A KR20060026035 A KR 20060026035A
- Authority
- KR
- South Korea
- Prior art keywords
- gold
- compound
- plating solution
- plating
- film
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Chemically Coating (AREA)
Abstract
Description
실시예 | 비교예 | ||||
1 | 2 | 1 | 2 | ||
욕 (浴) 조성 | 금화합물 | 아황산 금나트륨 : 1g/L(금) | 염화 금산나트륨 : 1g/L(금) | 아황산 금나트륨 : 1g/L(금) | 시안화금 나트륨: 2g/L(금) |
첨가제 | 피로아황산 나트륨: 5g/L | 피로아황산 나트륨:10g/L | - | - | |
안정제 | 아황산나트륨: 5g/L | 아황산나트륨: 10g/L | 아황산나트륨: 5g/L | 구연산: 30g/L | |
착화제 | 에틸렌디아민 4초산 : 10g/L | 니트릴로3초산: 10g/L | 에틸렌디아민 4초산 : 10g/L | 에틸렌디아민 4초산 : 5g/L | |
pH완충제 | 인산2수소 나트륨: 30g/L | 인산수소2 나트륨: 30g/L | 인산2수소 나트륨:30g/L | - | |
도금조건 | pH | 7.5 | 7.5 | 7.5 | 5.0 |
처리온도(℃) | 80 | 80 | 80 | 90 | |
처리시간 (min) | 10 | 10 | 10 | 5 | |
평가결과 | 막두께(㎛) | 0.05 | 0.05 | 0.05 | 0.05 |
부식구멍 | 없음 | 없음 | 있음 | 있음 | |
땜납밀착강도 | 1412 | 1395 | 1046 | 1014 | |
피막밀착성 | 박리 없음 | 박리 없음 | 박리 있음 | 박리 있음 |
Claims (4)
- 비시안계 수용성 금화합물, 및 피로아황산 화합물을 함유하는 것을 특징으로 하는 무전해 금도금액.
- 제 1 항에 있어서, 아황산 화합물을 더 함유하는 것을 특징으로 하는 무전해 금도금액.
- 제 1 항 또는 제 2 항에 있어서, 아미노 카르본산 화합물을 더 함유하는 것을 특징으로 하는 무전해 금도금액.
- 제 1 항 내지 제 3 항 중의 어느 한 항에 있어서의 무전해 도금액을 이용하여 제작된 것을 특징으로 하는 금도금물.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2003-00160974 | 2003-06-05 | ||
JP2003160974 | 2003-06-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060026035A true KR20060026035A (ko) | 2006-03-22 |
KR100735259B1 KR100735259B1 (ko) | 2007-07-03 |
Family
ID=33508589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057023237A KR100735259B1 (ko) | 2003-06-05 | 2004-02-18 | 무전해 금도금액 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7419536B2 (ko) |
EP (1) | EP1645658A4 (ko) |
JP (1) | JP4299300B2 (ko) |
KR (1) | KR100735259B1 (ko) |
CN (1) | CN100549228C (ko) |
HK (1) | HK1090097A1 (ko) |
TW (1) | TWI267564B (ko) |
WO (1) | WO2004108987A1 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006006367A1 (ja) * | 2004-07-09 | 2006-01-19 | Nippon Mining & Mrtals Co., Ltd. | 無電解金めっき液 |
WO2006051637A1 (ja) * | 2004-11-15 | 2006-05-18 | Nippon Mining & Metals Co., Ltd. | 無電解金めっき液 |
JP4941650B2 (ja) * | 2007-01-11 | 2012-05-30 | 上村工業株式会社 | 無電解金めっき浴のめっき能維持管理方法 |
CN101845625B (zh) * | 2010-06-01 | 2012-03-21 | 无锡阿尔法电子科技有限公司 | 一种在电容式触摸屏表面进行化学镀金的方法 |
CN103540973A (zh) * | 2013-09-24 | 2014-01-29 | 沈阳建筑大学 | 一种用于芯片和线路板热沉的电镀金液及使用方法 |
CN108220934A (zh) * | 2018-01-22 | 2018-06-29 | 昆山成功环保科技有限公司 | 一种无氰化学浸金溶液 |
JP7135384B2 (ja) * | 2018-03-30 | 2022-09-13 | 住友大阪セメント株式会社 | 光導波路素子 |
CN112695306A (zh) * | 2020-12-16 | 2021-04-23 | 昆山成功环保科技有限公司 | 应用在印制线路板领域的无毒环保的化学沉金溶液 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3300328A (en) * | 1963-11-12 | 1967-01-24 | Clevite Corp | Electroless plating of gold |
DE2803147C2 (de) * | 1978-01-25 | 1984-03-08 | W.C. Heraeus Gmbh, 6450 Hanau | Tauchgoldbad |
CN1003524B (zh) * | 1985-10-14 | 1989-03-08 | 株式会社日立制作所 | 无电浸镀金溶液 |
JP3030113B2 (ja) | 1991-04-12 | 2000-04-10 | エヌ・イーケムキャット株式会社 | 置換無電解金めつき液 |
US5232492A (en) * | 1992-01-23 | 1993-08-03 | Applied Electroless Concepts Inc. | Electroless gold plating composition |
WO1994012686A1 (en) * | 1992-11-25 | 1994-06-09 | Kanto Kagaku Kabushiki Kaisha | Electroless gold plating bath |
JPH08291389A (ja) | 1995-04-18 | 1996-11-05 | Hitachi Chem Co Ltd | 非シアン置換金めっき液及びこの液を用いた金めっき方法 |
JP3532046B2 (ja) | 1996-10-25 | 2004-05-31 | 株式会社大和化成研究所 | 非シアン置換銀めっき浴 |
JP3566498B2 (ja) | 1997-05-14 | 2004-09-15 | 株式会社大和化成研究所 | 置換金めっき浴 |
US5935306A (en) * | 1998-02-10 | 1999-08-10 | Technic Inc. | Electroless gold plating bath |
GB9822822D0 (en) * | 1998-10-19 | 1998-12-16 | Dyno Particles As | Particles |
JP3876634B2 (ja) * | 2001-03-14 | 2007-02-07 | トヨタ自動車株式会社 | 合金触媒と排気ガス浄化用触媒の製造方法 |
JP3482402B2 (ja) | 2001-06-29 | 2003-12-22 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 置換金メッキ液 |
WO2006006367A1 (ja) * | 2004-07-09 | 2006-01-19 | Nippon Mining & Mrtals Co., Ltd. | 無電解金めっき液 |
-
2004
- 2004-02-18 EP EP20040712169 patent/EP1645658A4/en not_active Withdrawn
- 2004-02-18 CN CNB2004800156936A patent/CN100549228C/zh not_active Expired - Lifetime
- 2004-02-18 KR KR1020057023237A patent/KR100735259B1/ko active IP Right Grant
- 2004-02-18 US US10/558,173 patent/US7419536B2/en not_active Expired - Lifetime
- 2004-02-18 WO PCT/JP2004/001784 patent/WO2004108987A1/ja active Application Filing
- 2004-02-18 JP JP2005506727A patent/JP4299300B2/ja not_active Expired - Lifetime
- 2004-02-23 TW TW093104419A patent/TWI267564B/zh not_active IP Right Cessation
-
2006
- 2006-09-21 HK HK06110515.9A patent/HK1090097A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP4299300B2 (ja) | 2009-07-22 |
HK1090097A1 (en) | 2006-12-15 |
WO2004108987A1 (ja) | 2004-12-16 |
TW200427865A (en) | 2004-12-16 |
JPWO2004108987A1 (ja) | 2006-07-20 |
CN1802451A (zh) | 2006-07-12 |
EP1645658A1 (en) | 2006-04-12 |
EP1645658A4 (en) | 2011-08-03 |
US7419536B2 (en) | 2008-09-02 |
US20060230979A1 (en) | 2006-10-19 |
CN100549228C (zh) | 2009-10-14 |
KR100735259B1 (ko) | 2007-07-03 |
TWI267564B (en) | 2006-12-01 |
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