KR20060017577A - 공통 평면 내에 매니폴드 연결부를 갖는 모듈형 기판 가스패널 - Google Patents

공통 평면 내에 매니폴드 연결부를 갖는 모듈형 기판 가스패널 Download PDF

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Publication number
KR20060017577A
KR20060017577A KR1020057003181A KR20057003181A KR20060017577A KR 20060017577 A KR20060017577 A KR 20060017577A KR 1020057003181 A KR1020057003181 A KR 1020057003181A KR 20057003181 A KR20057003181 A KR 20057003181A KR 20060017577 A KR20060017577 A KR 20060017577A
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South Korea
Prior art keywords
substrate
manifold
port
channel
ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
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KR1020057003181A
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English (en)
Korean (ko)
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킴 니고크 부
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셀레리티 인크.
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Application filed by 셀레리티 인크. filed Critical 셀레리티 인크.
Publication of KR20060017577A publication Critical patent/KR20060017577A/ko
Withdrawn legal-status Critical Current

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Valve Housings (AREA)
  • Fluid-Pressure Circuits (AREA)
  • Loading And Unloading Of Fuel Tanks Or Ships (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
KR1020057003181A 2002-08-27 2003-08-26 공통 평면 내에 매니폴드 연결부를 갖는 모듈형 기판 가스패널 Withdrawn KR20060017577A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40613202P 2002-08-27 2002-08-27
US60/406,132 2002-08-27

Publications (1)

Publication Number Publication Date
KR20060017577A true KR20060017577A (ko) 2006-02-24

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057003181A Withdrawn KR20060017577A (ko) 2002-08-27 2003-08-26 공통 평면 내에 매니폴드 연결부를 갖는 모듈형 기판 가스패널

Country Status (8)

Country Link
US (2) US7334605B2 (enExample)
EP (1) EP1543544A2 (enExample)
JP (1) JP2005539375A (enExample)
KR (1) KR20060017577A (enExample)
CN (1) CN100396980C (enExample)
AU (1) AU2003262953A1 (enExample)
TW (1) TWI244669B (enExample)
WO (1) WO2004021412A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130037187A (ko) * 2011-10-05 2013-04-15 가부시키가이샤 호리바 에스텍 유체 기구 및 상기 유체 기구를 구성하는 지지 부재 및 유체 제어 시스템
KR101476446B1 (ko) * 2007-06-11 2014-12-24 램 리써치 코포레이션 일체화된 가스 시스템 가스 패널을 위한 적응성 매니폴드

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CN1887029A (zh) * 2003-11-07 2006-12-27 迅捷公司 表面安装的加热器
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JP4780555B2 (ja) * 2005-09-12 2011-09-28 株式会社フジキン 流体制御装置
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JP4755498B2 (ja) * 2006-01-06 2011-08-24 東京エレクトロン株式会社 加熱装置及び加熱方法
US7575616B2 (en) 2006-02-10 2009-08-18 Entegris, Inc. Low-profile surface mount filter
US7784497B2 (en) * 2007-07-12 2010-08-31 Eriksson Mark L MSM component and associated gas panel assembly
JP5000469B2 (ja) * 2007-12-05 2012-08-15 株式会社キッツエスシーティー 容器用ブロックバルブ
KR101229775B1 (ko) * 2008-12-26 2013-02-06 엘지디스플레이 주식회사 기판 세정장치
US8307854B1 (en) 2009-05-14 2012-11-13 Vistadeltek, Inc. Fluid delivery substrates for building removable standard fluid delivery sticks
TWI534922B (zh) * 2009-06-10 2016-05-21 威士塔戴爾泰克有限責任公司 極端流量和／或高溫流體輸送基板
KR101097509B1 (ko) * 2009-07-17 2011-12-22 주식회사 엠엠티 기판 세정장치
US8336573B2 (en) 2010-03-10 2012-12-25 Coast Pneumatics, Inc. Modular manifold with quick disconnect valve fittings
WO2011112515A2 (en) * 2010-03-10 2011-09-15 Coast Pneumatics, Inc. Modular manifold with quick disconnect valve fittings
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US9114788B2 (en) * 2011-01-27 2015-08-25 Wabtec Holding Corp. Manifold joint seal
JP5277278B2 (ja) * 2011-03-29 2013-08-28 株式会社フジキン 流体制御装置用継手
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US8851113B2 (en) * 2012-03-27 2014-10-07 Lam Research Coporation Shared gas panels in plasma processing systems
JP6175300B2 (ja) * 2013-07-17 2017-08-02 株式会社フジキン 流体制御装置用継手部材および流体制御装置
KR102544885B1 (ko) 2014-04-07 2023-06-16 램 리써치 코포레이션 구성 독립된 가스 전달 시스템
US10557197B2 (en) 2014-10-17 2020-02-11 Lam Research Corporation Monolithic gas distribution manifold and various construction techniques and use cases therefor
US10022689B2 (en) 2015-07-24 2018-07-17 Lam Research Corporation Fluid mixing hub for semiconductor processing tool
US10118263B2 (en) 2015-09-02 2018-11-06 Lam Researech Corporation Monolithic manifold mask and substrate concepts
US9879795B2 (en) 2016-01-15 2018-01-30 Lam Research Corporation Additively manufactured gas distribution manifold
US10215317B2 (en) 2016-01-15 2019-02-26 Lam Research Corporation Additively manufactured gas distribution manifold
WO2018079288A1 (ja) * 2016-10-24 2018-05-03 株式会社フジキン 流体制御装置およびこの流体制御装置を用いた製品製造方法
WO2018168559A1 (ja) * 2017-03-15 2018-09-20 株式会社フジキン 継手および流体制御装置
CN120473408A (zh) * 2019-04-15 2025-08-12 朗姆研究公司 用于气体输送的模块部件系统
JP7333944B2 (ja) * 2019-06-27 2023-08-28 株式会社フジキン 流体制御装置
US11537150B2 (en) * 2020-04-09 2022-12-27 Horiba Stec, Co., Ltd. Fluid control apparatus

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101476446B1 (ko) * 2007-06-11 2014-12-24 램 리써치 코포레이션 일체화된 가스 시스템 가스 패널을 위한 적응성 매니폴드
KR20130037187A (ko) * 2011-10-05 2013-04-15 가부시키가이샤 호리바 에스텍 유체 기구 및 상기 유체 기구를 구성하는 지지 부재 및 유체 제어 시스템

Also Published As

Publication number Publication date
AU2003262953A8 (en) 2004-03-19
WO2004021412A3 (en) 2004-09-02
TW200419630A (en) 2004-10-01
US7334605B2 (en) 2008-02-26
CN1682054A (zh) 2005-10-12
CN100396980C (zh) 2008-06-25
US20040129324A1 (en) 2004-07-08
US7225835B2 (en) 2007-06-05
AU2003262953A1 (en) 2004-03-19
WO2004021412A2 (en) 2004-03-11
EP1543544A2 (en) 2005-06-22
TWI244669B (en) 2005-12-01
JP2005539375A (ja) 2005-12-22
US20060011247A1 (en) 2006-01-19

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PA0105 International application

Patent event date: 20050225

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid