KR20050047126A - 에칭 깊이 제어용 장치 및 방법 - Google Patents
에칭 깊이 제어용 장치 및 방법 Download PDFInfo
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- KR20050047126A KR20050047126A KR1020057005131A KR20057005131A KR20050047126A KR 20050047126 A KR20050047126 A KR 20050047126A KR 1020057005131 A KR1020057005131 A KR 1020057005131A KR 20057005131 A KR20057005131 A KR 20057005131A KR 20050047126 A KR20050047126 A KR 20050047126A
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- etching
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- 238000000034 method Methods 0.000 title claims abstract description 97
- 238000005530 etching Methods 0.000 claims abstract description 97
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 230000008569 process Effects 0.000 claims description 41
- 230000008859 change Effects 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 239000003518 caustics Substances 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 2
- 238000002955 isolation Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 32
- 238000004519 manufacturing process Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 9
- 230000007246 mechanism Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 5
- 238000011065 in-situ storage Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000000295 emission spectrum Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 230000010076 replication Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32963—End-point detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
- Blast Furnaces (AREA)
Abstract
Description
Claims (20)
- 웨이퍼의 층에서 피쳐 (feature) 깊이를 가지는 피쳐를 에칭하는 방법으로서,제 1 에칭 속도로 상기 피쳐의 제 1 깊이까지 에칭하는 단계;상기 제 1 에칭 속도보다 느린 제 2 에칭 속도로 상기 제 1 깊이부터 제 2 깊이까지 에칭하는 단계;상기 제 2 깊이가 상기 피쳐 깊이에 도달할 때를 광학적으로 결정하는 단계; 및상기 피쳐를 에칭하는 것을 정지하는 단계를 포함하는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 제 1 깊이까지 에칭하는 단계는 원하는 피쳐 프로파일 (profile) 을 형성하는 단계를 포함하는, 피쳐 에칭 방법.
- 제 2 항에 있어서,상기 제 1 깊이부터 상기 제 2 깊이까지 에칭하는 단계는 상기 원하는 피쳐 프로파일을 실질적으로 유지하는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 제 1 에칭 깊이는 상기 피쳐 깊이의 약 65 내지 85 퍼센트의 범위 내에 있는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 피쳐는 트렌치인, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 층은 결정질 실리콘층인, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 에칭 깊이는 상기 방법에 의해 광학적으로 결정되는, 피쳐 에칭 방법.
- 제 7 항에 있어서,상기 제 1 깊이에 도달되는 때를 광학적으로 결정하는 단계를 더 포함하는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 에칭 속도는 부식제의 조성을 변경함으로써 변경되는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 층은 연관된 에칭 정지 표시기를 가지지 않는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 층은 에칭 정지 층을 가지지 않는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 광학적으로 결정하는 단계는 광학 종점 (end point) 기술을 사용하여 수행되는, 피쳐 에칭 방법.
- 제 12 항에 있어서,상기 광학 종점 기술은 간섭 측정의 종점 및 광대역 반사파 측정 기반의 종점을 포함하는 그룹으로부터 선택되는, 피쳐 에칭 방법.
- 제 1 항에 있어서,상기 방법은 리세스 및 얕은 트렌치 분리를 포함하는 그룹으로부터 선택되는 프로세스의 부분인, 피쳐 에칭 방법.
- 제 1 항에 있어서,절대적인 피쳐 깊이는 광학적으로 결정되는, 피쳐 에칭 방법.
- 웨이퍼의 실리콘 층에서 종점을 가지는 트렌치를 에칭하는 방법으로서,제 1 에칭 속도로 에칭하는 단계;상기 제 1 에칭 속도보다 작은 제 2 에칭 속도로 에칭하는 단계;현재 에칭 깊이를 광학적으로 결정하는 단계; 및트렌치 깊이가 상기 종점에 도달하도록 에칭을 정지하는 단계를 포함하는, 트렌치 에칭 방법.
- 제 16 항에 있어서,상기 제 1 에칭 속도로 에칭하는 단계는 원하는 트렌치 프로파일을 형성하는, 트렌치 에칭 방법.
- 제 17 항에 있어서,상기 제 2 에칭 속도로 에칭하는 단계는 상기 원하는 트렌치 프로파일을 실질적으로 유지하는, 트렌치 에칭 방법.
- 제 16 항에 있어서,상기 에칭 속도를 변경할 때를 광학적으로 결정하는 단계를 포함하는, 트렌치 에칭 방법.
- 웨이퍼의 층에서 피쳐 깊이를 가지는 피쳐를 에칭하는 장치에 있어서,상기 웨이퍼를 유지하기 위한 척을 포함하는 에칭 기구;상기 에칭 기구와 인접하고, 에칭될 상기 피쳐의 에칭 깊이를 측정하도록 위치한, 광학적 종점 장치; 및상기 광학적 종점 장치 및 상기 에칭 기구와 통신하며, 상기 에칭 깊이가 상기 피쳐 깊이에 도달하도록 상기 피쳐 깊이보다 작은 제 1 에칭 깊이에서 상기 에칭 기구의 에칭 속도를 줄이고 에칭 기구의 에칭을 정지시키도록 구성되는, 전자 제어기를 포함하는 피쳐 에칭 장치.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/256,251 | 2002-09-25 | ||
US10/256,251 US6939811B2 (en) | 2002-09-25 | 2002-09-25 | Apparatus and method for controlling etch depth |
PCT/US2003/030117 WO2004030050A2 (en) | 2002-09-25 | 2003-09-18 | Apparatus and method for controlling etch depth |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050047126A true KR20050047126A (ko) | 2005-05-19 |
KR101116589B1 KR101116589B1 (ko) | 2012-03-15 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057005131A KR101116589B1 (ko) | 2002-09-25 | 2003-09-18 | 에칭 깊이 제어용 장치 및 방법 |
Country Status (10)
Country | Link |
---|---|
US (1) | US6939811B2 (ko) |
EP (1) | EP1543547B1 (ko) |
JP (1) | JP2006500781A (ko) |
KR (1) | KR101116589B1 (ko) |
CN (1) | CN100449706C (ko) |
AT (1) | ATE499701T1 (ko) |
AU (1) | AU2003275221A1 (ko) |
DE (1) | DE60336150D1 (ko) |
TW (1) | TWI324356B (ko) |
WO (1) | WO2004030050A2 (ko) |
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EP1320867A2 (en) * | 2000-09-21 | 2003-06-25 | Applied Materials, Inc. | Reducing deposition of process residues on a surface in a chamber |
US20030000922A1 (en) * | 2001-06-27 | 2003-01-02 | Ramkumar Subramanian | Using scatterometry to develop real time etch image |
-
2002
- 2002-09-25 US US10/256,251 patent/US6939811B2/en not_active Expired - Lifetime
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2003
- 2003-09-18 DE DE60336150T patent/DE60336150D1/de not_active Expired - Lifetime
- 2003-09-18 CN CNB038253666A patent/CN100449706C/zh not_active Expired - Lifetime
- 2003-09-18 AU AU2003275221A patent/AU2003275221A1/en not_active Abandoned
- 2003-09-18 KR KR1020057005131A patent/KR101116589B1/ko active IP Right Grant
- 2003-09-18 EP EP03759493A patent/EP1543547B1/en not_active Expired - Lifetime
- 2003-09-18 WO PCT/US2003/030117 patent/WO2004030050A2/en active Application Filing
- 2003-09-18 AT AT03759493T patent/ATE499701T1/de not_active IP Right Cessation
- 2003-09-18 JP JP2004539866A patent/JP2006500781A/ja active Pending
- 2003-09-23 TW TW092126217A patent/TWI324356B/zh not_active IP Right Cessation
Also Published As
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WO2004030050A3 (en) | 2004-04-29 |
AU2003275221A1 (en) | 2004-04-19 |
AU2003275221A8 (en) | 2004-04-19 |
US20040084406A1 (en) | 2004-05-06 |
KR101116589B1 (ko) | 2012-03-15 |
CN100449706C (zh) | 2009-01-07 |
TWI324356B (en) | 2010-05-01 |
JP2006500781A (ja) | 2006-01-05 |
US6939811B2 (en) | 2005-09-06 |
DE60336150D1 (de) | 2011-04-07 |
CN1701420A (zh) | 2005-11-23 |
WO2004030050A2 (en) | 2004-04-08 |
TW200411734A (en) | 2004-07-01 |
ATE499701T1 (de) | 2011-03-15 |
EP1543547B1 (en) | 2011-02-23 |
EP1543547A2 (en) | 2005-06-22 |
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