KR20020092823A - 집적 회로 구조 및 집적 회로 연결 소자 형성 방법과,회로 형성 방법과, 어드레싱 회로 및 어드레싱 회로 형성방법 - Google Patents
집적 회로 구조 및 집적 회로 연결 소자 형성 방법과,회로 형성 방법과, 어드레싱 회로 및 어드레싱 회로 형성방법 Download PDFInfo
- Publication number
- KR20020092823A KR20020092823A KR1020020031268A KR20020031268A KR20020092823A KR 20020092823 A KR20020092823 A KR 20020092823A KR 1020020031268 A KR1020020031268 A KR 1020020031268A KR 20020031268 A KR20020031268 A KR 20020031268A KR 20020092823 A KR20020092823 A KR 20020092823A
- Authority
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- South Korea
- Prior art keywords
- circuit
- conductor
- line
- memory
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C8/00—Arrangements for selecting an address in a digital store
- G11C8/10—Decoders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
- H01L23/5256—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5382—Adaptable interconnections, e.g. for engineering changes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/10—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L25/105—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/10—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
- H01L2225/1011—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
- H01L2225/1017—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support
- H01L2225/1023—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/10—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
- H01L2225/1011—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
- H01L2225/1047—Details of electrical connections between containers
- H01L2225/1064—Electrical connections provided on a side surface of one or more of the containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
- H01L2225/10—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
- H01L2225/1011—All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
- H01L2225/1076—Shape of the containers
- H01L2225/1082—Shape of the containers for improving alignment between containers, e.g. interlocking features
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/91—Diode arrays, e.g. diode read-only memory array
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/875,572 US6552409B2 (en) | 2001-06-05 | 2001-06-05 | Techniques for addressing cross-point diode memory arrays |
| US09/875,572 | 2001-06-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20020092823A true KR20020092823A (ko) | 2002-12-12 |
Family
ID=25366025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020020031268A Ceased KR20020092823A (ko) | 2001-06-05 | 2002-06-04 | 집적 회로 구조 및 집적 회로 연결 소자 형성 방법과,회로 형성 방법과, 어드레싱 회로 및 어드레싱 회로 형성방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6552409B2 (enExample) |
| EP (1) | EP1265286B1 (enExample) |
| JP (1) | JP2003007977A (enExample) |
| KR (1) | KR20020092823A (enExample) |
| CN (1) | CN1263135C (enExample) |
| DE (1) | DE60218932T2 (enExample) |
| TW (1) | TW564516B (enExample) |
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5673218A (en) | 1996-03-05 | 1997-09-30 | Shepard; Daniel R. | Dual-addressed rectifier storage device |
| US6956757B2 (en) * | 2000-06-22 | 2005-10-18 | Contour Semiconductor, Inc. | Low cost high density rectifier matrix memory |
| WO2002027768A2 (en) * | 2000-09-27 | 2002-04-04 | Nüp2 Incorporated | Fabrication of semiconductor devices |
| US6639859B2 (en) * | 2001-10-25 | 2003-10-28 | Hewlett-Packard Development Company, L.P. | Test array and method for testing memory arrays |
| US6683322B2 (en) * | 2002-03-01 | 2004-01-27 | Hewlett-Packard Development Company, L.P. | Flexible hybrid memory element |
| US6828685B2 (en) * | 2002-06-14 | 2004-12-07 | Hewlett-Packard Development Company, L.P. | Memory device having a semiconducting polymer film |
| US7079442B2 (en) * | 2002-08-02 | 2006-07-18 | Unity Semiconductor Corporation | Layout of driver sets in a cross point memory array |
| US6867132B2 (en) * | 2002-09-17 | 2005-03-15 | Hewlett-Packard Development Company, L.P. | Large line conductive pads for interconnection of stackable circuitry |
| US6887792B2 (en) * | 2002-09-17 | 2005-05-03 | Hewlett-Packard Development Company, L.P. | Embossed mask lithography |
| US6762094B2 (en) * | 2002-09-27 | 2004-07-13 | Hewlett-Packard Development Company, L.P. | Nanometer-scale semiconductor devices and method of making |
| GB0229191D0 (en) * | 2002-12-14 | 2003-01-22 | Plastic Logic Ltd | Embossing of polymer devices |
| US7800932B2 (en) * | 2005-09-28 | 2010-09-21 | Sandisk 3D Llc | Memory cell comprising switchable semiconductor memory element with trimmable resistance |
| US7400522B2 (en) | 2003-03-18 | 2008-07-15 | Kabushiki Kaisha Toshiba | Resistance change memory device having a variable resistance element formed of a first and second composite compound for storing a cation |
| US7778062B2 (en) | 2003-03-18 | 2010-08-17 | Kabushiki Kaisha Toshiba | Resistance change memory device |
| US7606059B2 (en) | 2003-03-18 | 2009-10-20 | Kabushiki Kaisha Toshiba | Three-dimensional programmable resistance memory device with a read/write circuit stacked under a memory cell array |
| US7394680B2 (en) | 2003-03-18 | 2008-07-01 | Kabushiki Kaisha Toshiba | Resistance change memory device having a variable resistance element with a recording layer electrode served as a cation source in a write or erase mode |
| KR20060010763A (ko) * | 2003-05-01 | 2006-02-02 | 퀸 메리 앤드 웨스트필드 컬리지 | 케이스화된 열 관리 장치 및 그 제조 방법 |
| US20070034909A1 (en) * | 2003-09-22 | 2007-02-15 | James Stasiak | Nanometer-scale semiconductor devices and method of making |
| SE526368C2 (sv) * | 2003-10-30 | 2005-08-30 | Infineon Technologies Ag | Zener-Zap Minne |
| US6980465B2 (en) * | 2003-12-19 | 2005-12-27 | Hewlett-Packard Development Company, L.P. | Addressing circuit for a cross-point memory array including cross-point resistive elements |
| US8148251B2 (en) | 2004-01-30 | 2012-04-03 | Hewlett-Packard Development Company, L.P. | Forming a semiconductor device |
| JP4377751B2 (ja) * | 2004-06-10 | 2009-12-02 | シャープ株式会社 | クロスポイント構造の半導体記憶装置及びその製造方法 |
| KR100626009B1 (ko) * | 2004-06-30 | 2006-09-20 | 삼성에스디아이 주식회사 | 박막 트랜지스터 구조체 및 이를 구비하는 평판디스플레이 장치 |
| US20060006787A1 (en) * | 2004-07-06 | 2006-01-12 | David Champion | Electronic device having a plurality of conductive beams |
| US7106639B2 (en) * | 2004-09-01 | 2006-09-12 | Hewlett-Packard Development Company, L.P. | Defect management enabled PIRM and method |
| CN101676931B (zh) * | 2004-10-18 | 2012-06-27 | 株式会社半导体能源研究所 | 半导体器件以及防止用户伪造物体的方法 |
| JP4880894B2 (ja) * | 2004-11-17 | 2012-02-22 | シャープ株式会社 | 半導体記憶装置の構造及びその製造方法 |
| US7453755B2 (en) * | 2005-07-01 | 2008-11-18 | Sandisk 3D Llc | Memory cell with high-K antifuse for reverse bias programming |
| KR100730254B1 (ko) | 2005-09-16 | 2007-06-20 | 가부시끼가이샤 도시바 | 프로그램가능 저항 메모리 장치 |
| US20070176255A1 (en) * | 2006-01-31 | 2007-08-02 | Franz Kreupl | Integrated circuit arrangement |
| CN102222765B (zh) * | 2006-03-10 | 2012-12-12 | 株式会社半导体能源研究所 | 存储元件以及半导体器件 |
| JP5201853B2 (ja) * | 2006-03-10 | 2013-06-05 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US7450414B2 (en) * | 2006-07-31 | 2008-11-11 | Sandisk 3D Llc | Method for using a mixed-use memory array |
| US20080025069A1 (en) * | 2006-07-31 | 2008-01-31 | Scheuerlein Roy E | Mixed-use memory array with different data states |
| US7486537B2 (en) * | 2006-07-31 | 2009-02-03 | Sandisk 3D Llc | Method for using a mixed-use memory array with different data states |
| US7372753B1 (en) * | 2006-10-19 | 2008-05-13 | Unity Semiconductor Corporation | Two-cycle sensing in a two-terminal memory array having leakage current |
| US7692951B2 (en) | 2007-06-12 | 2010-04-06 | Kabushiki Kaisha Toshiba | Resistance change memory device with a variable resistance element formed of a first and a second composite compound |
| US20090086521A1 (en) * | 2007-09-28 | 2009-04-02 | Herner S Brad | Multiple antifuse memory cells and methods to form, program, and sense the same |
| US7948094B2 (en) * | 2007-10-22 | 2011-05-24 | Rohm Co., Ltd. | Semiconductor device |
| US7813157B2 (en) * | 2007-10-29 | 2010-10-12 | Contour Semiconductor, Inc. | Non-linear conductor memory |
| US20090225621A1 (en) * | 2008-03-05 | 2009-09-10 | Shepard Daniel R | Split decoder storage array and methods of forming the same |
| US20090296445A1 (en) * | 2008-06-02 | 2009-12-03 | Shepard Daniel R | Diode decoder array with non-sequential layout and methods of forming the same |
| US8325556B2 (en) * | 2008-10-07 | 2012-12-04 | Contour Semiconductor, Inc. | Sequencing decoder circuit |
| KR20110105255A (ko) * | 2010-03-18 | 2011-09-26 | 삼성전자주식회사 | 적층 구조를 갖는 반도체 메모리 장치 및 그 제조 방법 |
| KR20110105257A (ko) * | 2010-03-18 | 2011-09-26 | 삼성전자주식회사 | 적층 구조를 갖는 반도체 메모리 장치 및 에러 정정 방법 |
| US8866121B2 (en) | 2011-07-29 | 2014-10-21 | Sandisk 3D Llc | Current-limiting layer and a current-reducing layer in a memory device |
| US8659001B2 (en) | 2011-09-01 | 2014-02-25 | Sandisk 3D Llc | Defect gradient to boost nonvolatile memory performance |
| US8637413B2 (en) | 2011-12-02 | 2014-01-28 | Sandisk 3D Llc | Nonvolatile resistive memory element with a passivated switching layer |
| US8698119B2 (en) | 2012-01-19 | 2014-04-15 | Sandisk 3D Llc | Nonvolatile memory device using a tunnel oxide as a current limiter element |
| US8686386B2 (en) | 2012-02-17 | 2014-04-01 | Sandisk 3D Llc | Nonvolatile memory device using a varistor as a current limiter element |
| US20140241031A1 (en) | 2013-02-28 | 2014-08-28 | Sandisk 3D Llc | Dielectric-based memory cells having multi-level one-time programmable and bi-level rewriteable operating modes and methods of forming the same |
| TWI497899B (zh) | 2013-08-05 | 2015-08-21 | Ind Tech Res Inst | 機構式編碼器 |
| KR20180005033A (ko) * | 2016-07-05 | 2018-01-15 | 에스케이하이닉스 주식회사 | 반도체 장치 및 그 제조 방법 |
| WO2018044755A1 (en) * | 2016-08-29 | 2018-03-08 | Skyworks Solutions, Inc. | Fuse state sensing circuits, devices and methods |
| WO2019059952A1 (en) * | 2017-09-25 | 2019-03-28 | Intel Corporation | INTEGRATION OF HIGH-DENSITY CROSS-POINT MEMORY AND CMOS LOGIC FOR LOW-LOW AND HIGH-DENSITY ENVM AND EDRAM APPLICATIONS |
| TWI758077B (zh) * | 2021-01-21 | 2022-03-11 | 凌北卿 | 具有pn二極體之非揮發性記憶體元件 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4795657A (en) * | 1984-04-13 | 1989-01-03 | Energy Conversion Devices, Inc. | Method of fabricating a programmable array |
| JPH09331029A (ja) * | 1996-06-12 | 1997-12-22 | Ricoh Co Ltd | 半導体メモリ装置とその製造方法 |
| KR20010022099A (ko) * | 1997-07-22 | 2001-03-15 | 제이르 아이. 레이스타드 | 기능소자를 가지거나 가지지 않은 중합체 재료의전극수단과 상기 수단으로 구성된 전극장치 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4089734A (en) * | 1974-09-16 | 1978-05-16 | Raytheon Company | Integrated circuit fusing technique |
| US4677742A (en) * | 1983-01-18 | 1987-07-07 | Energy Conversion Devices, Inc. | Electronic matrix arrays and method for making the same |
| US4569120A (en) * | 1983-03-07 | 1986-02-11 | Signetics Corporation | Method of fabricating a programmable read-only memory cell incorporating an antifuse utilizing ion implantation |
| US4740485A (en) * | 1986-07-22 | 1988-04-26 | Monolithic Memories, Inc. | Method for forming a fuse |
| US5311053A (en) * | 1991-06-12 | 1994-05-10 | Aptix Corporation | Interconnection network |
| US5917229A (en) * | 1994-02-08 | 1999-06-29 | Prolinx Labs Corporation | Programmable/reprogrammable printed circuit board using fuse and/or antifuse as interconnect |
-
2001
- 2001-06-05 US US09/875,572 patent/US6552409B2/en not_active Expired - Lifetime
-
2002
- 2002-05-02 TW TW091109147A patent/TW564516B/zh not_active IP Right Cessation
- 2002-05-10 EP EP02253285A patent/EP1265286B1/en not_active Expired - Lifetime
- 2002-05-10 DE DE60218932T patent/DE60218932T2/de not_active Expired - Lifetime
- 2002-06-04 KR KR1020020031268A patent/KR20020092823A/ko not_active Ceased
- 2002-06-04 JP JP2002162551A patent/JP2003007977A/ja active Pending
- 2002-06-05 CN CNB021228140A patent/CN1263135C/zh not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4795657A (en) * | 1984-04-13 | 1989-01-03 | Energy Conversion Devices, Inc. | Method of fabricating a programmable array |
| JPH09331029A (ja) * | 1996-06-12 | 1997-12-22 | Ricoh Co Ltd | 半導体メモリ装置とその製造方法 |
| KR20010022099A (ko) * | 1997-07-22 | 2001-03-15 | 제이르 아이. 레이스타드 | 기능소자를 가지거나 가지지 않은 중합체 재료의전극수단과 상기 수단으로 구성된 전극장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1265286B1 (en) | 2007-03-21 |
| TW564516B (en) | 2003-12-01 |
| EP1265286A3 (en) | 2003-12-03 |
| DE60218932D1 (de) | 2007-05-03 |
| US20020192895A1 (en) | 2002-12-19 |
| CN1263135C (zh) | 2006-07-05 |
| EP1265286A2 (en) | 2002-12-11 |
| US6552409B2 (en) | 2003-04-22 |
| DE60218932T2 (de) | 2007-10-18 |
| JP2003007977A (ja) | 2003-01-10 |
| CN1389919A (zh) | 2003-01-08 |
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