KR19990062505A - 엑시머레이저 내성을 향상시킨 석영글래스의 제조방법 및 석영글래스 부재 - Google Patents
엑시머레이저 내성을 향상시킨 석영글래스의 제조방법 및 석영글래스 부재 Download PDFInfo
- Publication number
- KR19990062505A KR19990062505A KR1019980038730A KR19980038730A KR19990062505A KR 19990062505 A KR19990062505 A KR 19990062505A KR 1019980038730 A KR1019980038730 A KR 1019980038730A KR 19980038730 A KR19980038730 A KR 19980038730A KR 19990062505 A KR19990062505 A KR 19990062505A
- Authority
- KR
- South Korea
- Prior art keywords
- quartz glass
- less
- absorption
- excimer laser
- photon absorption
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/12—Cooling, heating, or insulating the plunger, the mould, or the glass-pressing machine; cooling or heating of the glass in the mould
- C03B11/122—Heating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/12—Cooling, heating, or insulating the plunger, the mould, or the glass-pressing machine; cooling or heating of the glass in the mould
- C03B11/125—Cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (4)
- 엑시머레이저광을 광원으로 하는 광학계에 있어서 사용되는 석영글래스 부재에 있어서,용존하는 수소분자농도가 5×1018(분자/cm3)이하이고, 엑시머레이저를 조사하였을 때의 1 광자 흡수 및 2 광자 흡수의 전구체가 되는 결함이 실질적으로 없는 것을 특징으로 하는 석영글래스 부재
- 용존하는 수소분자농도가 5×1018(분자/cm3)이하인 석영글래스를, 1000℃이상 10시간 이상 유지한 후, 10℃/hr 이하의 서냉속도로 500℃까지 서서히 냉각시킨 후, 방냉하고, 엑시머레이저를 조사하였을 때의 1 광자 흡수의 생성을 억제한 것을 특징으로 하는 석영글래스 제조방법.
- 용존하는 수소분자농도가 5×1018(분자/cm3)이하인 석영글래스를 1000℃이상 10시간 이상 유지한 후, 10℃/hr 이하의 서냉속도로 500℃이상 700℃이하까지 서서히 냉각시킨 후, 10℃/hr 이상의 서냉속도로 200℃이하에서 방냉하고, 엑시머레이저를 조사하였을 때의 1 광자 흡수의 생성을 억제한 것을 특징으로 하는 석영글래스 제조방법.
- 용존하는 수소분자농도가 5×1018(분자/cm3)이하인 석영글래스를 대기 중에 또는 불활성가스분위기에서 1000℃이상 10시간 이상 유지한 후, 10℃/hr 이하의 서냉속도로 800℃이하까지 서서히 냉각시킨 후, 300℃이상 800℃이하에서 분위기를 수소로 치환하고, 석영글래스중의 수소분자의 방출을 억제하면서 수소분자의 농도의 균질화처리를 하고 500℃이하에서 실온까지 방냉하고, 엑시머레이저를 조사하였을 때의 1 광자 흡수의 생성을 억제한 것을 특징으로 하는 석영글래스 제조방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9336755A JPH10330120A (ja) | 1997-04-01 | 1997-12-08 | エキシマレ−ザ耐性を向上した石英ガラスの製造方法及び石英ガラス部材 |
JP336755/1997 | 1997-12-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990062505A true KR19990062505A (ko) | 1999-07-26 |
KR100554091B1 KR100554091B1 (ko) | 2006-05-16 |
Family
ID=18302424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980038730A KR100554091B1 (ko) | 1997-12-08 | 1998-09-18 | 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재 |
Country Status (4)
Country | Link |
---|---|
US (2) | US6174830B1 (ko) |
EP (1) | EP0921104A1 (ko) |
KR (1) | KR100554091B1 (ko) |
CN (1) | CN1219515A (ko) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4011217B2 (ja) * | 1998-12-25 | 2007-11-21 | 信越石英株式会社 | エキシマレーザー用光学石英ガラスの製造方法 |
JP4051474B2 (ja) * | 1999-04-01 | 2008-02-27 | 株式会社ニコン | 紫外用光学部材の透過率測定方法 |
WO2000076923A1 (fr) * | 1999-06-10 | 2000-12-21 | Asahi Glass Company, Limited | Verre de silice synthétique et son procédé de préparation |
WO2001012566A1 (fr) * | 1999-08-12 | 2001-02-22 | Nikon Corporation | Procede de preparation de silice vitreuse synthetique et appareil de traitement thermique |
JP2001270731A (ja) | 2000-03-28 | 2001-10-02 | Nikon Corp | 合成石英ガラス部材及びこれを用いた光リソグラフィー装置 |
JP4439072B2 (ja) * | 2000-03-29 | 2010-03-24 | 信越石英株式会社 | 光学用合成石英ガラス、その熱処理方法および熱処理装置 |
US6403508B1 (en) * | 2000-05-31 | 2002-06-11 | Corning Incorporated | Fused silica with constant induced absorption |
JP4462720B2 (ja) * | 2000-06-06 | 2010-05-12 | 信越石英株式会社 | 光学用合成石英ガラスの熱処理方法 |
JP2002003227A (ja) | 2000-06-16 | 2002-01-09 | Canon Inc | 光学素子の製造方法、光学素子、および該光学素子を用いた光学系、光学装置、デバイス製造方法とデバイス |
EP1330679A4 (en) | 2000-10-03 | 2006-09-06 | Corning Inc | PHOTOLITHOGRAPHIC PROCESSES AND SYSTEMS |
US6810687B2 (en) * | 2001-02-15 | 2004-11-02 | Heraeus Quarzglas Gmbh & Co. Kg. | Method for producing synthetic quartz glass members for excimer lasers |
JPWO2002085808A1 (ja) * | 2001-04-19 | 2004-08-12 | 株式会社ニコン | 石英ガラス部材及び投影露光装置 |
JP4323319B2 (ja) | 2001-12-21 | 2009-09-02 | コーニング インコーポレイテッド | アルミニウムを含有する溶融シリカ |
US6630418B2 (en) | 2001-12-21 | 2003-10-07 | Corning Incorporated | Fused silica containing aluminum |
US6672111B2 (en) | 2001-12-21 | 2004-01-06 | Corning Incorporated | Method and apparatus for adding metals to fused silica |
US7265070B2 (en) * | 2003-11-26 | 2007-09-04 | Corning Incorporated | Synthetic silica glass optical material having high resistance to optically induced index change |
US7928026B2 (en) * | 2005-06-30 | 2011-04-19 | Corning Incorporated | Synthetic silica material with low fluence-dependent-transmission and method of making the same |
DE102007019154B4 (de) * | 2007-04-20 | 2012-07-26 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit |
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ATE116448T1 (de) | 1989-06-09 | 1995-01-15 | Heraeus Quarzglas | Optische teile und rohlinge aus synthetischem siliziumdioxidglas und verfahren zu ihrer herstellung. |
US5325230A (en) * | 1989-06-09 | 1994-06-28 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks of synthetic silica glass and method for their production |
US5410428A (en) * | 1990-10-30 | 1995-04-25 | Shin-Etsu Quartz Products Co. Ltd. | Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof |
WO1993000307A1 (en) * | 1991-06-29 | 1993-01-07 | Shin-Etsu Quartz Products Company Limited | Synthetic quartz glass optical member for excimer laser and production thereof |
US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
US5702495A (en) * | 1993-02-10 | 1997-12-30 | Nikon Corporation | Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
JP2859095B2 (ja) | 1993-07-30 | 1999-02-17 | 信越化学工業株式会社 | エキシマレーザリソグラフィー用合成石英マスク基板 |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
US5616159A (en) * | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
US6094941A (en) * | 1995-06-06 | 2000-08-01 | Shin-Etsu Quartz Products Co., Ltd. | Process for manufacturing optical member for excimer laser |
JP3674793B2 (ja) | 1995-10-31 | 2005-07-20 | 信越石英株式会社 | 紫外線レーザ用石英ガラス光学部材の製造方法 |
EP0870737B1 (en) | 1997-04-08 | 2002-07-24 | Shin-Etsu Quartz Products Co., Ltd. | Optical synthetic quartz glass, production method thereof, and optical member for excimer laser using the synthetic quartz glass |
US6143676A (en) * | 1997-05-20 | 2000-11-07 | Heraeus Quarzglas Gmbh | Synthetic silica glass used with uv-rays and method producing the same |
-
1998
- 1998-09-18 KR KR1019980038730A patent/KR100554091B1/ko not_active IP Right Cessation
- 1998-09-29 US US09/161,754 patent/US6174830B1/en not_active Expired - Lifetime
- 1998-09-30 CN CN98120822A patent/CN1219515A/zh active Pending
- 1998-10-01 EP EP98118575A patent/EP0921104A1/en not_active Withdrawn
-
2000
- 2000-12-15 US US09/736,279 patent/US6339033B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6174830B1 (en) | 2001-01-16 |
US20010000508A1 (en) | 2001-04-26 |
CN1219515A (zh) | 1999-06-16 |
EP0921104A1 (en) | 1999-06-09 |
KR100554091B1 (ko) | 2006-05-16 |
US6339033B2 (en) | 2002-01-15 |
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