KR102511757B1 - 함불소 화합물, 리빙 중합개시제, 함불소 중합체, 함불소 중합체의 제조 방법 및 레지스트 조성물 - Google Patents

함불소 화합물, 리빙 중합개시제, 함불소 중합체, 함불소 중합체의 제조 방법 및 레지스트 조성물 Download PDF

Info

Publication number
KR102511757B1
KR102511757B1 KR1020187004919A KR20187004919A KR102511757B1 KR 102511757 B1 KR102511757 B1 KR 102511757B1 KR 1020187004919 A KR1020187004919 A KR 1020187004919A KR 20187004919 A KR20187004919 A KR 20187004919A KR 102511757 B1 KR102511757 B1 KR 102511757B1
Authority
KR
South Korea
Prior art keywords
group
acid
meth
acrylate
atom
Prior art date
Application number
KR1020187004919A
Other languages
English (en)
Korean (ko)
Other versions
KR20180035837A (ko
Inventor
료헤이 시미즈
아키라 다카노
Original Assignee
디아이씨 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 디아이씨 가부시끼가이샤 filed Critical 디아이씨 가부시끼가이샤
Publication of KR20180035837A publication Critical patent/KR20180035837A/ko
Application granted granted Critical
Publication of KR102511757B1 publication Critical patent/KR102511757B1/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/14—Preparation of carboxylic acid esters from carboxylic acid halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/63—Halogen-containing esters of saturated acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18—Monomers containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/18—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/40—Redox systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
    • C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/337—Polymers modified by chemical after-treatment with organic compounds containing other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyethers (AREA)
  • Graft Or Block Polymers (AREA)
KR1020187004919A 2015-07-23 2016-07-14 함불소 화합물, 리빙 중합개시제, 함불소 중합체, 함불소 중합체의 제조 방법 및 레지스트 조성물 KR102511757B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015145803 2015-07-23
JPJP-P-2015-145803 2015-07-23
PCT/JP2016/070827 WO2017014145A1 (ja) 2015-07-23 2016-07-14 含フッ素化合物、リビング重合開始剤、含フッ素重合体、含フッ素重合体の製造方法及びレジスト組成物

Publications (2)

Publication Number Publication Date
KR20180035837A KR20180035837A (ko) 2018-04-06
KR102511757B1 true KR102511757B1 (ko) 2023-03-20

Family

ID=57835310

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187004919A KR102511757B1 (ko) 2015-07-23 2016-07-14 함불소 화합물, 리빙 중합개시제, 함불소 중합체, 함불소 중합체의 제조 방법 및 레지스트 조성물

Country Status (5)

Country Link
JP (1) JP6176426B2 (zh)
KR (1) KR102511757B1 (zh)
CN (1) CN107848947A (zh)
TW (1) TWI704167B (zh)
WO (1) WO2017014145A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6497484B2 (ja) * 2017-03-10 2019-04-10 Dic株式会社 含フッ素アセトフェノン誘導体、フッ素系添加剤及びこれを含有する硬化性組成物とその硬化物
JP6389582B1 (ja) * 2017-03-10 2018-09-12 リンテック株式会社 撥液性組成物、撥液性シート及びそれらの製造方法
JP6863123B2 (ja) * 2017-06-21 2021-04-21 Dic株式会社 反射防止塗料組成物及び反射防止フィルム
EP3870664B1 (en) * 2018-10-26 2024-08-07 Solvay Specialty Polymers Italy S.p.A. Polyacrylic pfpe derivatives
WO2020218619A1 (ja) * 2019-04-26 2020-10-29 ダイキン工業株式会社 組成物の製造方法、及び、組成物
WO2021045209A1 (ja) * 2019-09-04 2021-03-11 ダイキン工業株式会社 含フッ素共重合体

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3458423B2 (ja) * 1993-10-20 2003-10-20 三菱化学株式会社 ペリレン系色素
JP4010160B2 (ja) * 2002-03-04 2007-11-21 旭硝子株式会社 レジスト組成物
JP5262677B2 (ja) 2008-12-19 2013-08-14 ダイキン工業株式会社 含フッ素ポリエーテル系ブロック共重合体およびその製造方法
KR20100088531A (ko) * 2009-01-30 2010-08-09 디아이씨 가부시끼가이샤 함불소 라디칼 중합성 공중합체, 그것을 사용한 활성 에너지선 경화형 수지 조성물 및 함불소 라디칼 중합성 공중합체의 제조 방법
TWI464224B (zh) * 2009-05-14 2014-12-11 Dainippon Ink & Chemicals A fluoropolymerizable polymer and an active energy ray hardening type composition using the same
JP2011184517A (ja) * 2010-03-05 2011-09-22 Daikin Industries Ltd 撥液レジスト組成物
JP2013127611A (ja) * 2011-11-14 2013-06-27 Dic Corp カラーレジスト組成物、カラーフィルター、液晶表示装置および有機ｅｌ表示装置
JP6146605B2 (ja) * 2013-03-21 2017-06-14 Dic株式会社 フッ素原子含有樹脂、フッ素系界面活性剤及びポジ型レジスト組成物。
JP6148907B2 (ja) * 2013-06-10 2017-06-14 東京応化工業株式会社 溶剤現像ネガ型レジスト組成物、レジストパターン形成方法
US10259907B2 (en) * 2015-02-20 2019-04-16 Az Electronic Materials (Luxembourg) S.À R.L. Block copolymers with surface-active junction groups, compositions and processes thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Austrian Journal of Chemistry, Vol.65, pp.1186-1190, 2012*

Also Published As

Publication number Publication date
JPWO2017014145A1 (ja) 2017-07-27
KR20180035837A (ko) 2018-04-06
CN107848947A (zh) 2018-03-27
TW201708307A (zh) 2017-03-01
WO2017014145A1 (ja) 2017-01-26
JP6176426B2 (ja) 2017-08-09
TWI704167B (zh) 2020-09-11

Similar Documents

Publication Publication Date Title
KR102511757B1 (ko) 함불소 화합물, 리빙 중합개시제, 함불소 중합체, 함불소 중합체의 제조 방법 및 레지스트 조성물
JP6908020B2 (ja) ランダム共重合体、レジスト組成物、カラーフィルター及びランダム共重合体の製造方法
KR101992866B1 (ko) 착색 감광성 수지 조성물
JP6844121B2 (ja) 着色硬化性樹脂組成物及びその硬化膜
KR100994605B1 (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
JP5566988B2 (ja) 樹脂組成物、硬化物の製造方法、樹脂パターン製造方法、硬化物及び光学部材
KR20150107491A (ko) 착색 감광성 수지 조성물
JP2014005466A (ja) アルカリ可溶性樹脂、それを含む感光性樹脂組成物およびそれを用いたカラーフィルタ
WO2014065352A1 (ja) 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、有機ｅｌ表示装置、液晶表示装置、並びに、タッチパネル表示装置
KR101992867B1 (ko) 착색 감광성 수지 조성물
KR102520617B1 (ko) 함불소 활성 에너지선 경화성 수지, 발액제, 이것을 포함하는 수지 조성물 및 경화막
JP6718940B2 (ja) 着色感光性樹脂組成物、これを用いて製造されたパターン層、および前記パターン層を含むカラーフィルタおよび表示装置
KR101420868B1 (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR20170111133A (ko) 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
KR20070115809A (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한액정표시장치
JP2014026278A (ja) 着色感光性樹脂組成物
KR20140117861A (ko) 착색 감광성 수지 조성물
KR100973644B1 (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한액정표시장치
KR101462275B1 (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR101961959B1 (ko) 착색 감광성 수지 조성물
KR101415398B1 (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR20150109106A (ko) 착색감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR20140112228A (ko) 착색 감광성 수지 조성물 및 컬러 필터
KR20090017340A (ko) 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한액정표시장치
KR20170110335A (ko) 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant