KR102482509B1 - 시트 부착 장치 및 부착 방법 - Google Patents

시트 부착 장치 및 부착 방법 Download PDF

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Publication number
KR102482509B1
KR102482509B1 KR1020160137566A KR20160137566A KR102482509B1 KR 102482509 B1 KR102482509 B1 KR 102482509B1 KR 1020160137566 A KR1020160137566 A KR 1020160137566A KR 20160137566 A KR20160137566 A KR 20160137566A KR 102482509 B1 KR102482509 B1 KR 102482509B1
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KR
South Korea
Prior art keywords
sheet
adhesive sheet
cover sheet
pressing
thickness
Prior art date
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KR1020160137566A
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English (en)
Korean (ko)
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KR20170069910A (ko
Inventor
요시아키 스기시타
Original Assignee
린텍 가부시키가이샤
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Application filed by 린텍 가부시키가이샤 filed Critical 린텍 가부시키가이샤
Publication of KR20170069910A publication Critical patent/KR20170069910A/ko
Application granted granted Critical
Publication of KR102482509B1 publication Critical patent/KR102482509B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185—Joining of semiconductor bodies for junction formation
    • H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • H01L2021/60007—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process
    • H01L2021/60022—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process using bump connectors, e.g. for flip chip mounting
    • H01L2021/60097—Applying energy, e.g. for the soldering or alloying process
    • H01L2021/60172—Applying energy, e.g. for the soldering or alloying process using static pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Labeling Devices (AREA)
KR1020160137566A 2015-12-11 2016-10-21 시트 부착 장치 및 부착 방법 KR102482509B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015242711A JP6527817B2 (ja) 2015-12-11 2015-12-11 シート貼付装置および貼付方法
JPJP-P-2015-242711 2015-12-11

Publications (2)

Publication Number Publication Date
KR20170069910A KR20170069910A (ko) 2017-06-21
KR102482509B1 true KR102482509B1 (ko) 2022-12-28

Family

ID=59060037

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160137566A KR102482509B1 (ko) 2015-12-11 2016-10-21 시트 부착 장치 및 부착 방법

Country Status (4)

Country Link
JP (1) JP6527817B2 (ja)
KR (1) KR102482509B1 (ja)
CN (1) CN107017186B (ja)
TW (1) TWI701748B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110562573B (zh) * 2019-08-30 2020-09-11 南京庞瑞科技有限公司 一种高精度自动化单面贴标机构及定位方法
CN113327878B (zh) * 2021-08-03 2021-10-08 四川明泰微电子有限公司 晶圆上料装置及晶圆贴膜装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001326246A (ja) 2000-05-12 2001-11-22 Mitsui Chemicals Inc 半導体チップをプリント配線基板に装着する方法及びその方法の実施に用いる装着用シート
JP2008270448A (ja) 2007-04-19 2008-11-06 Lintec Corp シート貼付装置及び貼付方法
JP2008294026A (ja) 2007-05-22 2008-12-04 Lintec Corp シート貼付装置及び貼付方法
JP2015056613A (ja) 2013-09-13 2015-03-23 リンテック株式会社 シート貼付装置および貼付方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3137322B2 (ja) * 1996-07-12 2001-02-19 富士通株式会社 半導体装置の製造方法及び半導体装置製造用金型及び半導体装置
JP4253393B2 (ja) * 1999-03-10 2009-04-08 Ｔｏｗａ株式会社 半導体ウェーハの樹脂被覆方法及び金型
JP4441451B2 (ja) * 2005-07-07 2010-03-31 リンテック株式会社 シート貼付装置
JP5002267B2 (ja) * 2007-01-15 2012-08-15 株式会社新川 ダイボンダとダイボンダの熱圧着テープ片切り出し及び貼り付け方法及びプログラム
EP2210732B1 (en) * 2007-09-28 2020-01-22 Toray Industries, Inc. Method and device for manufacturing sheet having fine shape transferred thereon
JP5551387B2 (ja) * 2009-07-03 2014-07-16 リンテック株式会社 シート貼付装置および貼付方法
JP2011054939A (ja) * 2009-08-07 2011-03-17 Nitto Denko Corp 半導体ウェハ保持保護用粘着シート及び半導体ウェハの裏面研削方法
JP5412226B2 (ja) * 2009-10-01 2014-02-12 日東電工株式会社 粘着テープ貼付け装置
TWI460075B (zh) * 2010-11-11 2014-11-11 C Sun Mfg Ltd 壓合機

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001326246A (ja) 2000-05-12 2001-11-22 Mitsui Chemicals Inc 半導体チップをプリント配線基板に装着する方法及びその方法の実施に用いる装着用シート
JP2008270448A (ja) 2007-04-19 2008-11-06 Lintec Corp シート貼付装置及び貼付方法
JP2008294026A (ja) 2007-05-22 2008-12-04 Lintec Corp シート貼付装置及び貼付方法
JP2015056613A (ja) 2013-09-13 2015-03-23 リンテック株式会社 シート貼付装置および貼付方法

Also Published As

Publication number Publication date
TWI701748B (zh) 2020-08-11
KR20170069910A (ko) 2017-06-21
JP2017108085A (ja) 2017-06-15
JP6527817B2 (ja) 2019-06-05
CN107017186A (zh) 2017-08-04
CN107017186B (zh) 2022-01-11
TW201725638A (zh) 2017-07-16

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