KR102460443B1 - 지환성 아크릴유도체의 제조 방법 - Google Patents
지환성 아크릴유도체의 제조 방법 Download PDFInfo
- Publication number
- KR102460443B1 KR102460443B1 KR1020200130995A KR20200130995A KR102460443B1 KR 102460443 B1 KR102460443 B1 KR 102460443B1 KR 1020200130995 A KR1020200130995 A KR 1020200130995A KR 20200130995 A KR20200130995 A KR 20200130995A KR 102460443 B1 KR102460443 B1 KR 102460443B1
- Authority
- KR
- South Korea
- Prior art keywords
- compound
- formula
- alicyclic
- reaction
- present
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/013—Esters of alcohols having the esterified hydroxy group bound to a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109135398A TWI807224B (zh) | 2019-10-14 | 2020-10-13 | 脂環族丙烯酸衍生物的製備方法 |
JP2020173607A JP7183509B2 (ja) | 2019-10-14 | 2020-10-14 | 脂環式アクリル誘導体の製造方法 |
US17/069,937 US20210108009A1 (en) | 2019-10-14 | 2020-10-14 | Method for producing alicyclic acrylate derivative |
CN202011096295.9A CN112724015A (zh) | 2019-10-14 | 2020-10-14 | 脂环族丙烯酸衍生物的制备方法及包括其的组合物 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20190126904 | 2019-10-14 | ||
KR1020190126904 | 2019-10-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20210044161A KR20210044161A (ko) | 2021-04-22 |
KR102460443B1 true KR102460443B1 (ko) | 2022-10-31 |
Family
ID=75731303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020200130995A KR102460443B1 (ko) | 2019-10-14 | 2020-10-12 | 지환성 아크릴유도체의 제조 방법 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102460443B1 (zh) |
TW (1) | TWI807224B (zh) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006104169A (ja) * | 2004-10-08 | 2006-04-20 | Tosoh Corp | 第三級シクロアルキル(メタ)アクリレートの製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4617145A (en) * | 1985-11-21 | 1986-10-14 | International Flavors & Fragrances Inc. | 1-methyl-2(2-methylbutyl) cyclohexanol derivatives and organoleptic uses thereof |
JP6818600B2 (ja) * | 2017-03-15 | 2021-01-20 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
JP7052612B2 (ja) * | 2018-03-27 | 2022-04-12 | 三菱ケミカル株式会社 | (メタ)アクリル酸エステルおよびその製造方法 |
-
2020
- 2020-10-12 KR KR1020200130995A patent/KR102460443B1/ko active IP Right Grant
- 2020-10-13 TW TW109135398A patent/TWI807224B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006104169A (ja) * | 2004-10-08 | 2006-04-20 | Tosoh Corp | 第三級シクロアルキル(メタ)アクリレートの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202116714A (zh) | 2021-05-01 |
KR20210044161A (ko) | 2021-04-22 |
TWI807224B (zh) | 2023-07-01 |
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